Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button


DHgate

Home > Press > SEMATECH to Present Advances in Lithography and Demonstrate Leading Edge Technologies at SPIE 2011

Abstract:
Papers showcase technological leadership in enabling EUVL pilot line readiness and metrology techniques for defect inspection and 3D TSVs

SEMATECH to Present Advances in Lithography and Demonstrate Leading Edge Technologies at SPIE 2011

Albany, NY | Posted on February 17th, 2011

SEMATECH experts will present world-leading research and development results on extreme ultraviolet (EUV) manufacturability and extendibility, alternative lithography, and related areas of metrology at the SPIE Advanced Lithography 2011 conferences on February 27 - March 3 at the San Jose Convention Center and Marriott in San Jose, CA.

"We are enthusiastic about sharing our progress on some of the most critical aspects of the development of EUV infrastructure," said Bryan Rice, director of lithography at SEMATECH. "Through intense research and development efforts, SEMATECH continues to produce industry leading results for enabling EUVL pilot line readiness and advancing EUV extendibility and alternative lithography."

SEMATECH engineers will report progress on EUV mask infrastructure, manufacturability, advancing extendibility, alternative lithography, metrology and will showcase some of their findings in over 20 papers demonstrating breakthrough results in exposure tool capability, resist advances, defect-related inspection, reticle handling, and nanoimprint.

More importantly, the results presented will be instrumental in driving timely creation of the remaining infrastructure required to bring EUV to full production. In one area of investigation, technologists from SEMATECH's Mask Blank Development Center will report progress with its multilayer deposition process. Specifically, SEMATECH, in partnership with inspection tool suppliers, has identified defect sources and validation of defect mitigation techniques.

Other SEMATECH papers will showcase advances in metrology techniques, photoresist shrinkage, scatterometry, non-destructive TSV etch depth, CD-SAXS - a possible x-ray metrology CD technique for future nodes - and an optical CD metrology technique under development at NIST, which was a winner of last year's R&D Magazine's R&D 100 award.

"The Advanced Development Metrology Program brings together world-class researchers and engineers along with access to critical laboratory analytical equipment to provide advanced metrology capabilities to our members and the semiconductor community," said Phil Bryson, director of metrology at SEMATECH. "We are excited to share our results with an august community of technologists assembled at SPIE, which plays an increasingly significant role in propelling the semiconductor industry towards future generations."

Among the global semiconductor community's leading gatherings, the SPIE conference series attracts thousands of specialists in various aspects of lithography and related metrology, two of the most challenging areas of advanced microchip production.

For a complete list of SEMATECH presentations at SPIE please visit:

www.sematech.org/corporate/news/features/SPIE/2011/

####

About SEMATECH
For over 20 years, SEMATECH® (www.sematech.org), the international consortium of leading semiconductor manufacturers, has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Today, we continue accelerating the next technology revolution with our nanoelectronics and emerging technology partners.

For more information, please click here

Contacts:
Erica McGill
SEMATECH | Media Relations
257 Fuller Road | Suite 2200 | Albany, NY | 12203
o: 518-649-1041 | m: 518-487-8256

Copyright © SEMATECH

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Electric-car battery materials could harm key soil bacteria February 11th, 2016

Creating a color printer that uses a colorless, non-toxic ink inspired by nature February 11th, 2016

SLAC X-ray laser turns crystal imperfections into better images of important biomolecules: New method could remove major obstacles to studying structures of complex biological machines February 11th, 2016

Nanoparticle reduces targeted cancer drug's toxicity February 11th, 2016

Nanoelectronics

Electron's 1-D metallic surface state observed: A step for the prediction of electronic properties of extremely-fine metal nanowires in next-generation semiconductors February 9th, 2016

The iron stepping stones to better wearable tech without semiconductors February 8th, 2016

Spin dynamics in an atomically thin semi-conductor February 1st, 2016

New type of nanowires, built with natural gas heating: UNIST research team developed a new simple nanowire manufacturing technique February 1st, 2016

Announcements

Research reveals carbon films can give microchips energy storage capability: International team from Drexel University and Paul Sabatier University reveals versatility of carbon films February 11th, 2016

Creating a color printer that uses a colorless, non-toxic ink inspired by nature February 11th, 2016

SLAC X-ray laser turns crystal imperfections into better images of important biomolecules: New method could remove major obstacles to studying structures of complex biological machines February 11th, 2016

Nanoparticle reduces targeted cancer drug's toxicity February 11th, 2016

Events/Classes

Cima NanoTech Debuts Large Interactive Touch Screens with European Customers at ISE 2016: For the first time in Europe, Cima NanoTech’s wide range of high performance, projected capacitive touch modules are showcased February 11th, 2016

Nanotech Security to Present at the Optical Document Security Conference February 11, 2016 February 4th, 2016

New research uses nanotechnology to prevent preterm birth: March of Dimes honors abstract on prematurity at SMFM Annual Meeting February 2nd, 2016

NBC LEARN DEBUTS SIX-PART VIDEO SERIES, “NANOTECHNOLOGY: SUPER SMALL SCIENCE” Produced by NBC Learn in partnership with the National Science Foundation, and narrated by NBC News/MSNBC’s Kate Snow, series highlights leading research in nanotechnology January 25th, 2016

Printing/Lithography/Inkjet/Inks

Creating a color printer that uses a colorless, non-toxic ink inspired by nature February 11th, 2016

Teijin to Participate in Nano Tech 2016 January 21st, 2016

New bimetallic alloy nanoparticles for printed electronic circuits: Production of oxidation-resistant copper alloy nanoparticles by electrical explosion of wire for printed electronics January 5th, 2016

Photonic “sintering” may create new solar, electronics manufacturing technologies December 1st, 2015

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







Car Brands
Buy website traffic