Nanotechnology Now

Our NanoNews Digest Sponsors


Heifer International

Wikipedia Affiliate Button


DHgate

Home > Press > SEMATECH to Present Advances in Lithography and Demonstrate Leading Edge Technologies at SPIE 2011

Abstract:
Papers showcase technological leadership in enabling EUVL pilot line readiness and metrology techniques for defect inspection and 3D TSVs

SEMATECH to Present Advances in Lithography and Demonstrate Leading Edge Technologies at SPIE 2011

Albany, NY | Posted on February 17th, 2011

SEMATECH experts will present world-leading research and development results on extreme ultraviolet (EUV) manufacturability and extendibility, alternative lithography, and related areas of metrology at the SPIE Advanced Lithography 2011 conferences on February 27 - March 3 at the San Jose Convention Center and Marriott in San Jose, CA.

"We are enthusiastic about sharing our progress on some of the most critical aspects of the development of EUV infrastructure," said Bryan Rice, director of lithography at SEMATECH. "Through intense research and development efforts, SEMATECH continues to produce industry leading results for enabling EUVL pilot line readiness and advancing EUV extendibility and alternative lithography."

SEMATECH engineers will report progress on EUV mask infrastructure, manufacturability, advancing extendibility, alternative lithography, metrology and will showcase some of their findings in over 20 papers demonstrating breakthrough results in exposure tool capability, resist advances, defect-related inspection, reticle handling, and nanoimprint.

More importantly, the results presented will be instrumental in driving timely creation of the remaining infrastructure required to bring EUV to full production. In one area of investigation, technologists from SEMATECH's Mask Blank Development Center will report progress with its multilayer deposition process. Specifically, SEMATECH, in partnership with inspection tool suppliers, has identified defect sources and validation of defect mitigation techniques.

Other SEMATECH papers will showcase advances in metrology techniques, photoresist shrinkage, scatterometry, non-destructive TSV etch depth, CD-SAXS - a possible x-ray metrology CD technique for future nodes - and an optical CD metrology technique under development at NIST, which was a winner of last year's R&D Magazine's R&D 100 award.

"The Advanced Development Metrology Program brings together world-class researchers and engineers along with access to critical laboratory analytical equipment to provide advanced metrology capabilities to our members and the semiconductor community," said Phil Bryson, director of metrology at SEMATECH. "We are excited to share our results with an august community of technologists assembled at SPIE, which plays an increasingly significant role in propelling the semiconductor industry towards future generations."

Among the global semiconductor community's leading gatherings, the SPIE conference series attracts thousands of specialists in various aspects of lithography and related metrology, two of the most challenging areas of advanced microchip production.

For a complete list of SEMATECH presentations at SPIE please visit:

www.sematech.org/corporate/news/features/SPIE/2011/

####

About SEMATECH
For over 20 years, SEMATECH® (www.sematech.org), the international consortium of leading semiconductor manufacturers, has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Today, we continue accelerating the next technology revolution with our nanoelectronics and emerging technology partners.

For more information, please click here

Contacts:
Erica McGill
SEMATECH | Media Relations
257 Fuller Road | Suite 2200 | Albany, NY | 12203
o: 518-649-1041 | m: 518-487-8256

Copyright © SEMATECH

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Tiny packages may pack powerful treatment for brain tumors: Nanocarrier provides efficient delivery of chemotherapeutic drug May 23rd, 2016

Two-stage nanoparticle delivery of piperlongumine and TRAIL anti-cancer therapy May 23rd, 2016

Rice de-icer gains anti-icing properties: Dual-function, graphene-based material good for aircraft, extreme environments May 23rd, 2016

Graphene makes rubber more rubbery May 23rd, 2016

Nanoelectronics

Researchers demonstrate size quantization of Dirac fermions in graphene: Characterization of high-quality material reveals important details relevant to next generation nanoelectronic devices May 20th, 2016

Graphene: A quantum of current - When current comes in discrete packages: Viennese scientists unravel the quantum properties of the carbon material graphene May 20th, 2016

New type of graphene-based transistor will increase the clock speed of processors: Scientists have developed a new type of graphene-based transistor and using modeling they have demonstrated that it has ultralow power consumption compared with other similar transistor devices May 19th, 2016

Self-healing, flexible electronic material restores functions after many breaks May 17th, 2016

Announcements

Physicists create first metamaterial with rewritable magnetic ordering May 23rd, 2016

Tiny packages may pack powerful treatment for brain tumors: Nanocarrier provides efficient delivery of chemotherapeutic drug May 23rd, 2016

Two-stage nanoparticle delivery of piperlongumine and TRAIL anti-cancer therapy May 23rd, 2016

Rice de-icer gains anti-icing properties: Dual-function, graphene-based material good for aircraft, extreme environments May 23rd, 2016

Events/Classes

Novel gene therapy shows potential for lung repair in asthma May 18th, 2016

Arrowhead Pharmaceuticals' Preclinical Candidate ARC-LPA Achieves 98% Knockdown and Long Duration of Effect after Subcutaneous Administration May 10th, 2016

Nanometrics Announces Upcoming Investor Events May 10th, 2016

Oxford Instruments Asylum Research and McGill University Announce the McGill AFM Summer School and Workshop, May 12-13, 2016 May 4th, 2016

Printing/Lithography/Inkjet/Inks

Physicists create first metamaterial with rewritable magnetic ordering May 23rd, 2016

Electrically Conductive Graphene Ink Enables Printing of Biosensors April 23rd, 2016

Highlights from the Graphene Flagship April 22nd, 2016

Penn engineers develop first transistors made entirely of nanocrystal 'inks April 11th, 2016

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







Car Brands
Buy website traffic