Nanotechnology Now

Our NanoNews Digest Sponsors





Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > Press > SEMATECH to Present Advances in Lithography and Demonstrate Leading Edge Technologies at SPIE 2011

Abstract:
Papers showcase technological leadership in enabling EUVL pilot line readiness and metrology techniques for defect inspection and 3D TSVs

SEMATECH to Present Advances in Lithography and Demonstrate Leading Edge Technologies at SPIE 2011

Albany, NY | Posted on February 17th, 2011

SEMATECH experts will present world-leading research and development results on extreme ultraviolet (EUV) manufacturability and extendibility, alternative lithography, and related areas of metrology at the SPIE Advanced Lithography 2011 conferences on February 27 - March 3 at the San Jose Convention Center and Marriott in San Jose, CA.

"We are enthusiastic about sharing our progress on some of the most critical aspects of the development of EUV infrastructure," said Bryan Rice, director of lithography at SEMATECH. "Through intense research and development efforts, SEMATECH continues to produce industry leading results for enabling EUVL pilot line readiness and advancing EUV extendibility and alternative lithography."

SEMATECH engineers will report progress on EUV mask infrastructure, manufacturability, advancing extendibility, alternative lithography, metrology and will showcase some of their findings in over 20 papers demonstrating breakthrough results in exposure tool capability, resist advances, defect-related inspection, reticle handling, and nanoimprint.

More importantly, the results presented will be instrumental in driving timely creation of the remaining infrastructure required to bring EUV to full production. In one area of investigation, technologists from SEMATECH's Mask Blank Development Center will report progress with its multilayer deposition process. Specifically, SEMATECH, in partnership with inspection tool suppliers, has identified defect sources and validation of defect mitigation techniques.

Other SEMATECH papers will showcase advances in metrology techniques, photoresist shrinkage, scatterometry, non-destructive TSV etch depth, CD-SAXS - a possible x-ray metrology CD technique for future nodes - and an optical CD metrology technique under development at NIST, which was a winner of last year's R&D Magazine's R&D 100 award.

"The Advanced Development Metrology Program brings together world-class researchers and engineers along with access to critical laboratory analytical equipment to provide advanced metrology capabilities to our members and the semiconductor community," said Phil Bryson, director of metrology at SEMATECH. "We are excited to share our results with an august community of technologists assembled at SPIE, which plays an increasingly significant role in propelling the semiconductor industry towards future generations."

Among the global semiconductor community's leading gatherings, the SPIE conference series attracts thousands of specialists in various aspects of lithography and related metrology, two of the most challenging areas of advanced microchip production.

For a complete list of SEMATECH presentations at SPIE please visit:

www.sematech.org/corporate/news/features/SPIE/2011/

####

About SEMATECH
For over 20 years, SEMATECH® (www.sematech.org), the international consortium of leading semiconductor manufacturers, has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Today, we continue accelerating the next technology revolution with our nanoelectronics and emerging technology partners.

For more information, please click here

Contacts:
Erica McGill
SEMATECH | Media Relations
257 Fuller Road | Suite 2200 | Albany, NY | 12203
o: 518-649-1041 | m: 518-487-8256

Copyright © SEMATECH

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Scientists Test Nanoparticle "Alarm Clock" to Awaken Immune Systems Put to Sleep by Cancer July 25th, 2014

A*STAR and industry form S$200M semiconductor R&D July 25th, 2014

Silicene Labs Announces the Launch of Patent-Pending, 2D Materials Composite Index™ : The Initial 2D Materials Composite Index™ for Q2 2014 Is: 857.3; Founders Include World-Renowned Physicist and Seasoned Business and IP Professionals July 24th, 2014

Iranian Scientists Produce Transparent Nanocomposite Coatings with Longer Lifetime July 24th, 2014

Nanoelectronics

A*STAR and industry form S$200M semiconductor R&D July 25th, 2014

A Crystal Wedding in the Nanocosmos July 23rd, 2014

3-D nanostructure could benefit nanoelectronics, gas storage: Rice U. researchers predict functional advantages of 3-D boron nitride July 15th, 2014

IBM Announces $3 Billion Research Initiative to Tackle Chip Grand Challenges for Cloud and Big Data Systems: Scientists and engineers to push limits of silicon technology to 7 nanometers and below and create post-silicon future July 10th, 2014

Announcements

Scientists Test Nanoparticle "Alarm Clock" to Awaken Immune Systems Put to Sleep by Cancer July 25th, 2014

A*STAR and industry form S$200M semiconductor R&D July 25th, 2014

Silicene Labs Announces the Launch of Patent-Pending, 2D Materials Composite Index™ : The Initial 2D Materials Composite Index™ for Q2 2014 Is: 857.3; Founders Include World-Renowned Physicist and Seasoned Business and IP Professionals July 24th, 2014

Iranian Scientists Produce Transparent Nanocomposite Coatings with Longer Lifetime July 24th, 2014

Events/Classes

NNCO Announces an Interactive Webinar: Progress Review on the Coordinated Implementation of the National Nanotechnology Initiative 2011 Environmental, Health, and Safety Research Strategy July 23rd, 2014

Harris & Harris Group to Host Conference Call on Second-Quarter 2014 Financial Results on August 15, 2014 July 23rd, 2014

Deadline Announced for Registration in 7th Int'l Nanotechnology Festival in Iran July 23rd, 2014

Iran to Hold 3rd Int'l Forum on Nanotechnology Economy July 22nd, 2014

Printing/Lithography/Inkjet/Inks

Martini Tech Inc. becomes the exclusive distributor for Yoshioka Seiko Co. porous chucks for Europe and North America July 20th, 2014

University of Illinois researchers demonstrate novel, tunable nanoantennas July 14th, 2014

Haydale Announces Collaboration Agreement with Swansea University’s Welsh Centre for Printing and Coatings (WCPC) July 12th, 2014

Leti to Present Technological Platforms Targeting Industry’s Needs for the Future at Semicon West Workshop: Presentation at STS Session to Focus on Leti Advanced Lithography Programs for 1x Nodes and on Silicon Photonics at TechXPot June 25th, 2014

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More














ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE