Nanotechnology Now







Heifer International

Wikipedia Affiliate Button


DHgate

Home > Press > SEMATECH and Dai Nippon Printing Collaborate to Develop Advanced Process Technologies at UAlbany NanoCollege

Abstract:
Partnership combines strengths to speed commercialization of mask lithography for semiconductor manufacturing

SEMATECH and Dai Nippon Printing Collaborate to Develop Advanced Process Technologies at UAlbany NanoCollege

Albany, NY and Tokyo, Japan | Posted on August 24th, 2010

SEMATECH, a global consortium of the world's leading chip manufacturers, today announced that it has entered into a partnership to accelerate commercialization of advanced mask lithography technology with Dai Nippon Printing Co., Ltd. (DNP), a leading producer of semiconductor photomasks. SEMATECH and DNP will collaborate at the College of Nanoscale Science and Engineering (CNSE) of the University at Albany on methods for improving mask cleaning processes to reduce overall mask cost of ownership (CoO) and accelerate commercial manufacturing readiness.

Under the terms of the agreement, a team of mask cleaning experts from DNP will work with experts from SEMATECH's Mask Clean program at CNSE's Albany NanoTech Complex to improve the cleaning yield on extreme ultraviolet lithography (EUV) patterned, non-patterned substrates and nanoimprint lithography (NIL) templates. Specifically, the collaborative work will focus on further optimizing the cleaning process to reduce the influence of the cleaning cycle on the critical dimension (CD) of the features on the mask substrates as well as NIL templates, while maintaining the particle removal capability.

"We are very pleased to collaborate with SEMATECH and its leading-edge industry partners on critical mask cleaning technology for next generation lithography processes," said Mr. Naoya Hayashi, research fellow at DNP. "Our partnership will allow DNP to gain knowledge and expertise as we leverage SEMATECH's leadership position within the IC industry, enabling us to lead the way in supporting the industry's ever-growing lithography mask demands."

Preservation of mask cleanliness is essential to avoid the risk of repeated printing of defects. Developing mask cleaning processes capable of removing nanoscale sized particles adhered to the mask surface without damaging the mask is critical to meet high volume manufacturing requirements, as is producing an improved smooth/clean process to dramatically reduce substrate particles. Making defect-free mask blanks in the quantities required for high volume manufacturing is a key technical challenge that must be solved to prepare EUV lithography for cost-effective insertion at the 22 nm half-pitch generation and below.

In a cooperative approach to this challenge, SEMATECH's Mask Clean program provides access to state-of-the-art mask and lithography tools and materials as well as immediate feedback and assistance from SEMATECH engineers and member company assignees.

"This partnership with DNP is a key component of our overall strategy to minimize this technology's time to manufacturing readiness," said John Warlaumont, vice president of advanced technologies at SEMATECH. "The industry must have access to high quality masks in order to stay on its timeline for EUV lithography introduction, and especially with DNP's expertise and new level of engagement, this activity is positioned to ensure the availability of low-cost masks."

"We are pleased to welcome DNP as the newest global corporate partner at the UAlbany NanoCollege to be attracted by the SEMATECH-CNSE partnership," said Richard Brilla, vice president for strategy, alliances and consortia at CNSE. "The addition of DNP will provide critical capabilities to further prepare EUV lithography for commercial manufacturing, serving the needs of our industrial partners and enhancing New York's global leadership in nanotechnology education, innovation and economic development."

####

About SEMATECH
For 20 years, SEMATECH® (www.sematech.org), the international consortium of leading semiconductor manufacturers, has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Today, we continue accelerating the next technology revolution with our nanoelectronics and emerging technology partners.

About Dai Nippon Printing
DNP is a world-class comprehensive printing company with 1.5834 trillion yen in annual sales and approximately 40,000 employees. Based in Tokyo, Japan, DNP offers a broad range of products and services for publishing, commercial printing, smart cards, networking, and electronics components, among others. Its products in the electronics field include color filters and other components for LCDs, photomasks, PCBs and semiconductor-related components. In the photomask market DNP is a world leader, utilizing its time honored printing techniques and know-how in the fabrication of cuttingedge photomasks.

About CNSE
The UAlbany CNSE is the first college in the world dedicated to education, research, development, and deployment in the emerging disciplines of nanoscience, nanoengineering, nanobioscience, and nanoeconomics. CNSE’s Albany NanoTech Complex is the most advanced research enterprise of its kind at any university in the world. With over $5.5 billion in high-tech investments, the 800,000-square-foot complex attracts corporate partners from around the world and offers students a one-of-a-kind academic experience. The UAlbany NanoCollege houses the only fully-integrated, 300mm wafer, computer chip pilot prototyping and demonstration line within 80,000 square feet of Class 1 capable cleanrooms. More than 2,500 scientists, researchers, engineers, students, and faculty work on site at CNSE’s Albany NanoTech, from companies including IBM, AMD, GlobalFoundries, SEMATECH, Toshiba, Applied Materials, Tokyo Electron, ASML, Novellus Systems, Vistec Lithography and Atotech. For more information, visit www.cnse.albany.edu.

For more information, please click here

Contacts:
Erica McGill
SEMATECH | Media Relations
257 Fuller Road | Suite 2200 | Albany, NY | 12203
o: 518-649-1041
m: 518-487-8256

Copyright © SEMATECH

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

New pathway to valleytronics January 27th, 2015

Stomach acid-powered micromotors get their first test in a living animal January 27th, 2015

Entanglement on a chip: Breakthrough promises secure communications and faster computers January 27th, 2015

Engineering self-assembling amyloid fibers January 26th, 2015

Chip Technology

New pathway to valleytronics January 27th, 2015

Entanglement on a chip: Breakthrough promises secure communications and faster computers January 27th, 2015

Electronic circuits with reconfigurable pathways closer to reality January 26th, 2015

The latest fashion: Graphene edges can be tailor-made: Rice University theory shows it should be possible to tune material's properties January 24th, 2015

Nanoelectronics

Electronic circuits with reconfigurable pathways closer to reality January 26th, 2015

Rice-sized laser, powered one electron at a time, bodes well for quantum computing January 15th, 2015

Rapid journey through a crystal lattice: Researchers measure how fast electrons move through single atomic layers January 14th, 2015

A new step towards using graphene in electronic applications January 14th, 2015

Announcements

New pathway to valleytronics January 27th, 2015

Entanglement on a chip: Breakthrough promises secure communications and faster computers January 27th, 2015

Detection of Heavy Metals in Samples with Naked Eye January 26th, 2015

Engineering self-assembling amyloid fibers January 26th, 2015

Alliances/Partnerships/Distributorships

Entanglement on a chip: Breakthrough promises secure communications and faster computers January 27th, 2015

Smart keyboard cleans and powers itself -- and can tell who you are January 21st, 2015

DNA 'glue' could someday be used to build tissues, organs January 14th, 2015

GLOBALFOUNDRIES and Linear Dimensions to Offer Joint Analog Solution For Fast-Growing Wearables and MEMs Sensors Markets January 9th, 2015

Research partnerships

Visualizing interacting electrons in a molecule: Scientists at Aalto University and the University of Zurich have succeeded in directly imaging how electrons interact within a single molecule January 26th, 2015

Promising use of nanodiamonds in delivering cancer drug to kill cancer stem cells: NUS study shows that delivery of Epirubicin by nanodiamonds resulted in a normally lethal dosage of Epirubicin becoming a safe and effective dosage for treatment of liver cancer January 26th, 2015

Wearable sensor clears path to long-term EKG, EMG monitoring January 20th, 2015

Graphene enables all-electrical control of energy flow from light emitters: First signatures of graphene plasmons at telecommunications wavelength revealed January 20th, 2015

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More










ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2015 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE