Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > Press > SEMATECH and SUSS MicroTec Collaborate on Next-generation Device Testing Solutions

Abstract:
Partnership to focus on CMOS, Memory, and Emerging Technologies

SEMATECH and SUSS MicroTec Collaborate on Next-generation Device Testing Solutions

Austin, TX and Garching/Munich, Germany | Posted on December 10th, 2009

SEMATECH, a global consortium of chipmakers, announced today that SUSS MicroTec has joined its Front End Processes (FEP) program. As a member of the program, SUSS MicroTec will collaborate with SEMATECH's FEP device and reliability experts to investigate complex semiconductor probing and measurement solutions for next-generation semiconductor and emerging technologies.

To enable advances in conventional and emerging semiconductor devices, SEMATECH's FEP program is researching cutting-edge new materials and device structures. The collaborative work between SUSS MicroTec and SEMATECH's FEP research teams will aim to develop new characterization techniques to enable both CMOS scaling and emerging technologies beyond CMOS. Additionally, as a part of this joint effort, advanced emerging memory and MEMS/NEMS technology characterization methods will also be addressed. SEMATECH will use SUSS MicroTec's probe system and control software to characterize new device processes and designs.

"We are excited to be a part of the SEMATECH FEP program, working with the most advanced technologists to develop and characterize new materials and tools for the continued improvement of semiconductor technologies," said Frank P. Averdung, President and CEO of SUSS MicroTec. "This collaboration represents an innovative blend of SUSS' experience in test solutions for probing and characterization applications and SEMATECH's strengths in the development of fundamental materials
and advanced device technologies."

"This joint research initiative with SUSS MicroTec reinforces SEMATECH's commitment to develop practical solutions for leading-edge technologies that are increasingly relying on new materials and structures for continued performance improvement," said Raj Jammy, vice president of emerging technologies, SEMATECH. "We look forward to working with SUSS MicroTec as an industry key player on innovative ways to characterize and evaluate new materials and processes, that will benefit our members and the industry."

####

About SEMATECH
For 20 years, SEMATECH® has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Today, we continue accelerating the next technology revolution with our nanoelectronics and emerging technology partners.

About SUSS MicroTec

SUSS MicroTec is a leading supplier of process and test solutions for markets such as 3D Integration, Advanced Packaging, MEMS, Nanotechnology and Compound Semiconductor. High-quality solutions enable customers to increase process performance while reducing cost of ownership. SUSS MicroTec supports more than 8,000 installed mask aligners, coaters, bonders and probe systems with a global infrastructure for applications and service. SUSS MicroTec is headquartered in Garching near Munich, Germany. For more information, please visit www.suss.com.

For more information, please click here

Contacts:
SEMATECH Media Contact:
Erica McGill
518-956-7446


SUSS MicroTec Media Contact:
Sabine Radeboldt
+49 (0) 89 32007-395

Copyright © SEMATECH

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

A nano-roundabout for light December 10th, 2016

Keeping electric car design on the right road: A closer look at the life-cycle impacts of lithium-ion batteries and proton exchange membrane fuel cells December 9th, 2016

Further improvement of qubit lifetime for quantum computers: New technique removes quasiparticles from superconducting quantum circuits December 9th, 2016

Scientists track chemical and structural evolution of catalytic nanoparticles in 3-D: Up-close, real-time, chemical-sensitive 3-D imaging offers clues for reducing cost/improving performance of catalysts for fuel-cell-powered vehicles and other applications December 8th, 2016

Chip Technology

A nano-roundabout for light December 10th, 2016

Further improvement of qubit lifetime for quantum computers: New technique removes quasiparticles from superconducting quantum circuits December 9th, 2016

Chemical trickery corrals 'hyperactive' metal-oxide cluster December 8th, 2016

Leti IEDM 2016 Paper Clarifies Correlation between Endurance, Window Margin and Retention in RRAM for First Time: Paper Presented at IEDM 2016 Offers Ways to Reconcile High-cycling Requirements and Instability at High Temperatures in Resistive RAM December 6th, 2016

Nanoelectronics

Chemical trickery corrals 'hyperactive' metal-oxide cluster December 8th, 2016

Leti IEDM 2016 Paper Clarifies Correlation between Endurance, Window Margin and Retention in RRAM for First Time: Paper Presented at IEDM 2016 Offers Ways to Reconcile High-cycling Requirements and Instability at High Temperatures in Resistive RAM December 6th, 2016

Physicists decipher electronic properties of materials in work that may change transistors December 6th, 2016

Journal Nanotechnology Progress International (JONPI) Volume 6, issue 2 coming out soon! December 5th, 2016

Announcements

A nano-roundabout for light December 10th, 2016

Keeping electric car design on the right road: A closer look at the life-cycle impacts of lithium-ion batteries and proton exchange membrane fuel cells December 9th, 2016

Further improvement of qubit lifetime for quantum computers: New technique removes quasiparticles from superconducting quantum circuits December 9th, 2016

Chemical trickery corrals 'hyperactive' metal-oxide cluster December 8th, 2016

Tools

Scientists track chemical and structural evolution of catalytic nanoparticles in 3-D: Up-close, real-time, chemical-sensitive 3-D imaging offers clues for reducing cost/improving performance of catalysts for fuel-cell-powered vehicles and other applications December 8th, 2016

Deep insights from surface reactions: Researchers use Stampede supercomputer to study new chemical sensing methods, desalination and bacterial energy production December 2nd, 2016

Controlled electron pulses November 30th, 2016

Scientists shrink electron gun to matchbox size: Terahertz technology has the potential to enable new applications November 25th, 2016

Alliances/Trade associations/Partnerships/Distributorships

Infrared instrumentation leader secures exclusive use of Vantablack coating December 5th, 2016

Leti and Grenoble Partners Demonstrate World’s 1st Qubit Device Fabricated in CMOS Process: Paper by Leti, Inac and University of Grenoble Alpes Published in Nature Communications November 28th, 2016

Mechanism for sodium storage in 2-D material: Tin selenide is an effective host for storing sodium ions, making it a promising material for sodium ion batteries October 27th, 2016

Enterprise In Space Partners with Sketchfab and 3D Hubs for NewSpace Education October 13th, 2016

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project