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Adoption and proliferation of Nanometrics technology continues by leveraging OCD performance combined with thin film capability for best cost of ownership.
Nanometrics Incorporated (Nasdaq: NANO), a leading supplier of advanced process control metrology systems used primarily in the manufacturing and packaging of semiconductors, solar photovoltaics and high-brightness LEDs, today announced a follow-on order for ten of its Atlas® XP metrology systems, as well as industry-leading NanoDiffract™ software, from a leading memory customer. These systems are incremental to systems previously ordered and announced earlier this year. The systems are to be delivered to multiple factories throughout the fourth quarter of 2009 and first quarter of 2010 in support of technology re-tooling for next-generation DRAM and Flash manufacturing.
"We are pleased to announce the selection and continued commitment to Nanometrics' Atlas XP systems for the upcoming manufacturing ramp. By combining the advanced optical critical dimension (OCD) performance of our NanoDiffract software with the thin film metrology capability afforded in every Atlas system, we enable performance and cost of ownership advantages that we believe are superior to other thin film and OCD solutions on the market," commented Michael Fischer, Vice President of Worldwide Sales at Nanometrics. "Our applications team is working closely with our customers to meet critical process control challenges by extending the role of our metrology solutions to improve advanced technology node yields, while simultaneously reducing the overall cost of fab metrology."
Nanometrics' NanoCD™ suite of technologies, which includes the Atlas OCD system, NanoGen™ scalable cluster computing hardware and NanoDiffract software, has become an industry-leading solution for advanced in-device metrology and process control on complex structures. Nanometrics' Atlas systems enable complex structure and process control non-destructively and can be deployed at all key process steps in line for film thickness, profile and critical dimension control.
Forward Looking Statements
This press release contains forward-looking statements including, but not limited to, statements regarding the capabilities of its metrology systems and software, and the expected shipment and qualification of the orders announced in this release. Although Nanometrics believes that the expectations reflected in the forward-looking statements are reasonable, actual results could differ materially from the expectations due to a variety of factors. For additional information and considerations regarding the risks faced by Nanometrics, see its annual report on Form 10-K for the year ended December 27, 2008 as filed with the Securities and Exchange Commission, as well as other periodic reports filed with the SEC from time to time. Nanometrics disclaims any obligation to update information contained in any forward-looking statement.
Nanometrics is a leader in the design, manufacture and marketing of high-performance process control metrology systems used primarily in the manufacturing of semiconductors, advanced wafer-scale packaging, solar photovoltaics and high-brightness LEDs, as well as by customers in the silicon wafer and data storage industries. Nanometrics standalone and integrated metrology systems measure various thin film properties, critical dimensions, overlay control, topography, and optical, electrical and material properties, including the structural composition of silicon, compound semiconductor and photovoltaic devices, during various steps of the manufacturing process, from front end of line substrate manufacturing through die preparation for advanced packaging. These systems enable device manufacturers to improve yields, increase productivity and lower their manufacturing costs. The company maintains its headquarters in Milpitas, California, with sales and service offices worldwide. Nanometrics is traded on NASDAQ Global Market under the symbol NANO.
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