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Home > News > Toshiba photoresist at 20nm scale

November 19th, 2009

Toshiba photoresist at 20nm scale

Abstract:
Toshiba has developed a photoresist, or photo-sensitive film, for use with EUV (extreme ultraviolet) lithography equipment used in semiconductor fabrication and proved its viability in a 20nm-scale manufacturing process.

Source:
theengineer.co.uk

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