Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > Press > IMEC launches EUV mask cleaning program

Abstract:
IMEC today announced that it is extending its EUV (extreme ultra-violet) lithography research program with a parallel dedicated EUV mask cleaning research program.

IMEC launches EUV mask cleaning program

Leuven, Belgium | Posted on July 14th, 2009

The program will build on a new collaboration between IMEC and HamaTech APE GmbH & Co. KG. HamaTech's MaskTrack ProR photomask processing system has been selected as the cleaning tool of record and will be installed at IMEC's 300mm clean room where the companies will perform collaborative research to reach the stringent mask integrity requirements of EUV lithography. This collaboration enables IMEC to offer interested partners innovative mask cleaning technology to develop processes of record (PORs) to extend their EUV lithography research.

Unlike photomasks used in optical lithography today, EUV masks will most likely not have pellicles making the mask sensitive to particle and organic contamination. Consequently, cleaning EUV masks close to Point-of-Exposure in the wafer fab reduces the risk of yield loss due to added particles or organic contamination growth.

IMEC's mask cleaning program will develop processes of record (PORs) for EUV mask cleaning that are effective in removing the contamination of interest yet are gentle enough to be applied repeatedly without reducing mask lifetime. Additional investigation and optimization of EUV reticle back-side cleaning processes which do not influence the front-side will, as part of
the overall mask cleaning program, assist to keep the overlay performance of the EUV scanner in spec.

Kurt Ronse, program director advanced lithography at IMEC said, "Over the last year, we achieved major progress on resist for EUV but pristine, defect-free masks at point-of-exposure have become an increasing concern in advancing EUV towards pilot production in 2010. Therefore, we will extend
our program with mask cleaning research to offer our partners advanced research on one of the critical EUV mask related issues in EUV lithography. The installation of the MaskTrack Pro and our on-going collaborative research efforts with the HamaTech team ensures that a complete mask
integrity infrastructure is available for interested partners at IMEC's 300mm research facility before end 2009."

MaskTrack Pro combines the performance of the MaskTrack tool with innovative cleaning technology and a sophisticated system design for a holistic approach of mask integrity, focused on 193i 22nm half pitch double patterning, EUV and Nano-Imprint lithography technologies. The system features Focused Spot CleaningTM for precise removal of particles in defined areas of the mask, saving significant time after repair and eliminating the toughest overlay issues caused by backside contamination. A unique combination of physical and chemical cleaning technologies have demonstrated a highly-effective removal of organic and inorganic contamination without damage to the vulnerable absorber and capping layer (SPIE, March 2009). MaskTrack Pro's holistic approach to mask integrity ensures that the reticle is defect-free at exposure, offering customers a dramatic increase in exposure tool availability and uptime.

"We are very pleased to collaborate with IMEC on critical mask cleaning technology for next generation lithography processes," said Wilma Koolen-Hermkens, CEO of HamaTech APE. "The MaskTrack Pro, is the first system in the industry that can address EUVL zero tolerance levels for
particles and defects on the mask prior to exposure. With a world class design, the MaskTrack Pro allows clustering of metrology systems and pod-in-pod stocking for a holistic mask management approach throughout the life of the mask. IMEC is our partner of choice to jointly develop the necessary PORs for our valued customers."

####

About IMEC
IMEC is a world-leading independent research center in nanoelectronics and nanotechnology. IMEC vzw is headquartered in Leuven, Belgium, has a sister company in the Netherlands, IMEC-NL, offices in the US, China and Taiwan, and representatives in Japan. Its staff of more than 1650 people includes about 550 industrial residents and guest researchers. In 2008, its revenue (P&L) was EUR 270 million.

IMEC's More Moore research aims at semiconductor scaling towards sub-32nm nodes. With its More than Moore research, IMEC looks into technologies for nomadic embedded systems, wireless autonomous transducer solutions, biomedical electronics, photovoltaics, organic electronics and GaN power electronics.

IMEC's research bridges the gap between fundamental research at universities and technology development in industry. Its unique balance of processing and system know-how, intellectual property portfolio, state-of-the-art infrastructure and its strong network worldwide position IMEC as a key partner for shaping technologies for future systems.

About HamaTech APE

HamaTech is an established leader of semiconductor equipment. At HamaTech we combine the latest technology with extensive know-how to provide systems that are future-compliant. HamaTech APE GmbH & Co. KG is a wholly-owned subsidiary of SINGULS TECHNOLOGIES AG, Kahl/Main.

Short profile SINGULUS TECHNOLOGIES

SINGULUS TECHNOLOGIES, the world leader in High Volume Manufacturing equipment for Optical Discs CD/DVD/Blu-ray, acquired STANGL to focus on the photovoltaic market and successfully entered the solar equipment market. The new business area "Solar" will be expanded in the next years.

While STANGL specializes in wet-chemical processes, SINGULUS' core competence is physical coating and atomization technology. SINGULUS' extensive know-how forms the optimum base for development of highly cost-efficient and fully-automated production lines.

Through its daughter company HamaTech APE GmbH & Co. KG the Semiconductor and Magnetic Storage Industries are served. For well over 20 years, HamaTech APE is the acknowledged world market leader for Photomask cleaning, bake and develop.

For more information, please click here

Contacts:
Katrien Marent, Director of External Communications, T: +32 16 28 18
80, Mobile : +32 474 30 28 66,

Copyright © IMEC

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Chip Technology

Novel 'converter' heralds breakthrough in ultra-fast data processing at nanoscale: Invention bagged four patents and could potentially make microprocessor chips work 1,000 times faster October 20th, 2017

MIPT scientists revisit optical constants of ultrathin gold films October 20th, 2017

Bringing the atomic world into full color: Researchers turn atomic force microscope measurements into color images October 19th, 2017

Spin current detection in quantum materials unlocks potential for alternative electronics October 15th, 2017

Nanoelectronics

Nanometrics Announces Preliminary Results for the Third Quarter of 2017: Quarterly Results Impacted by Delays in Revenue Recognition on Multiple Systems into Japan October 12th, 2017

Seeing the next dimension of computer chips: Researchers image perfectly smooth side-surfaces of 3-D silicon crystals with a scanning tunneling microscope, paving the way for smaller and faster computing devices October 11th, 2017

Columbia engineers invent breakthrough millimeter-wave circulator IC October 6th, 2017

Tungsten offers nano-interconnects a path of least resistance: Crystalline tungsten shows insight and promise in addressing the challenges of electrical interconnects that have high resistivity at the nanoscale October 4th, 2017

Announcements

A step closer to understanding quantum mechanics: Swansea Universityís physicists develop a new quantum simulation protocol October 22nd, 2017

Creation of coherent states in molecules by incoherent electrons October 21st, 2017

Strange but true: turning a material upside down can sometimes make it softer October 20th, 2017

Leti Coordinating Project to Develop Innovative Drivetrains for 3rd-generation Electric Vehicles: CEA Techís Contribution Includes Litenís Knowhow in Magnetic Materials and Simulation And Letiís Expertise in Wide-bandgap Semiconductors October 20th, 2017

Tools

Creation of coherent states in molecules by incoherent electrons October 21st, 2017

Bringing the atomic world into full color: Researchers turn atomic force microscope measurements into color images October 19th, 2017

Nanometrics Announces Preliminary Results for the Third Quarter of 2017: Quarterly Results Impacted by Delays in Revenue Recognition on Multiple Systems into Japan October 12th, 2017

Seeing the next dimension of computer chips: Researchers image perfectly smooth side-surfaces of 3-D silicon crystals with a scanning tunneling microscope, paving the way for smaller and faster computing devices October 11th, 2017

Events/Classes

Nanometrics Announces Preliminary Results for the Third Quarter of 2017: Quarterly Results Impacted by Delays in Revenue Recognition on Multiple Systems into Japan October 12th, 2017

More 22 of 59,885 Print all In new window Leti to Present Update of CoolCube/3DVLSI Technologies Development at 2017 IEEE S3S: Future Developments and Tape-Out Vehicles to Be Presented during Oct. 17 Workshop October 12th, 2017

Arrowhead Pharmaceuticals to Present Preclinical Data on ARO-AAT at The Liver Meeting(R) October 10th, 2017

Arrowhead to Present at Chardan Gene Therapy Conference October 3rd, 2017

Printing/Lithography/Inkjet/Inks/Bio-printing

Creation of coherent states in molecules by incoherent electrons October 21st, 2017

Graphene based terahertz absorbers: Printable graphene inks enable ultrafast lasers in the terahertz range September 13th, 2017

Researchers printed graphene-like materials with inkjet August 17th, 2017

Simultaneous Design and Nanomanufacturing Speeds Up Fabrication: Method enhances broadband light absorption in solar cells August 5th, 2017

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project