Nanotechnology Now

Our NanoNews Digest Sponsors



Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > Press > Dai Nippon Printing and Molecular Imprints Team to Accelerate Commercialization of Nanoimprint Lithography

Abstract:
Strategic collaboration agreement to speed development of lower-cost, leading-edge imprint masks using mask replication technology based on Jet and Flash™ Imprint Lithography (J-FIL™)

Dai Nippon Printing and Molecular Imprints Team to Accelerate Commercialization of Nanoimprint Lithography

Austin, TX | Posted on July 1st, 2009

Dai Nippon Printing Co., Ltd. (DNP), a leading producer of semiconductor photomasks, and Molecular Imprints, Inc., a market and technology leader for nanopatterning systems and solutions, today announced that they have entered into a strategic collaboration agreement to speed the commercialization of nanoimprint lithography for high-volume semiconductor device manufacturing.

Under the terms of the agreement, DNP will provide Molecular Imprints with funding and related support for the development of a new mask replication platform designed to significantly lower imprint mask production costs - a substantial step forward in establishing the imprint technology infrastructure needed for volume-production applications.

The mask replication platform development program will utilize Molecular Imprints' innovative Jet and Flash™ Imprint Lithography (J-FIL™) technology to replicate master imprint masks at significantly higher throughputs compared to traditional mask e-beam writers-resulting in significant reductions in total mask costs to levels well below the cost for optical photomasks used today. The goal of the program is to develop mask replication technology that will be ready for commercial deployment for the 22nm half-pitch node.

The advent of current deep sub-wavelength imaging with complex mask techniques, double patterning, and limited mask lifetime due to haze have all contributed to masks becoming a major component of lithography costs for advanced semiconductor manufacturing. Now that DNP has demonstrated that 1X imprint masks can be fabricated with the existing photomask infrastructure, the advantages of low-cost replication can be brought to bear to reduce overall imprint mask cost of ownership (CoO).

The master imprint mask can be faithfully and cost-effectively replicated hundreds of times using the mask replication platform now under development by Molecular Imprints with support from DNP.

"Our industry partnerships allow DNP to gain knowledge and expertise on enabling cutting-edge technologies, which in turn allow us to provide our customers with access to solutions to meet the semiconductor industry's ever-growing lithography mask demands at the earliest possible date," stated Mr. Naoya Hayashi, research fellow at DNP. "This collaboration with Molecular Imprints gives DNP an important advantage in the area of imprint lithography, and will enable us to lead the way in supporting the semiconductor industry's imprint mask needs."

"This partnership with DNP is a key component of our overall strategy to accelerate adoption of our J-FIL technology initially for advanced non-volatile memory production," stated Mark Melliar-Smith, CEO of Molecular Imprints. "DNP is a pioneer in the development and commercialization of sub-30nm half-pitch imprint masks. Through their support of our mask replication development program, DNP is helping to ensure the availability of low-cost imprint masks to address the growing global demand within the semiconductor industry for high-resolution, low cost-of-ownership lithography."

Molecular Imprints' J-FIL technology is built on the semiconductor industry's existing optical lithography infrastructure, using commercially available photomask, exposure source and resist technology. As a result, the company's imprint lithography systems are a drop-in technology suitable for mix-and-match strategies, where their resolution and cost advantages can be deployed on critical layers. Molecular Imprints' J-FIL technology offers 12nm resolution patterning in a single exposure using a simplified design and process. Imprint systems utilizing J-FIL provide a highly extendible, low CoO patterning solution for multiple design generations.

####

About Molecular Imprints
Molecular Imprints, Inc. (MII) is the technology leader for high-resolution, low cost-of-ownership nanopatterning systems and solutions in the hard disk drive (HDD) and semiconductor industries. MII is leveraging its innovative Jet and FlashTM Imprint Lithography (J-FILTM) with IntelliJetTM material application technology to become the worldwide market and technology leader in high-volume patterning solutions for storage and memory devices, while enabling emerging markets in optics, biotechnology, and other industries. MII enables nanoscale patterning by delivering a comprehensive nanopatterning solution that is affordable, compatible and extendible to sub-10-nanometer resolution levels.

About Dai Nippon Printing

DNP is a world-class comprehensive printing company with 1.5848 trillion yen in annual revenues and approximately 40,000 employees. Based in Tokyo, Japan, DNP offers a broad range of products and services for publishing, commercial
printing, smart cards, networking, and electronics components, among others. Its products in the electronics field include color filters and other components for LCDs, photomasks, PCBs and semiconductor-related components. In the photomask market DNP is a world leader, utilizing its time honored printing techniques and know-how in the fabrication of cuttingedge photomasks.

For more information, please click here

Contacts:
Corporate PR Contact
Ken Rygler
Molecular Imprints, Inc.
1-512-339-7760 x313


Agency Contact
David Moreno
MCA
1-650-968-8900 ext. 125

Copyright © Molecular Imprints

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Investments/IPO's/Splits

PEN Inc. Announces New Trading Symbol: PENC: Stock Continues Trading on the OTCQB September 3rd, 2014

Aspen Aerogels, Inc. to Present at Barclays CEO Energy-Power Conference August 27th, 2014

Harris & Harris Group Letter to Shareholders on Website August 19th, 2014

Harris & Harris Group to Host Conference Call on Second-Quarter 2014 Financial Results on August 15, 2014 August 12th, 2014

Chip Technology

‘Small’ transformation yields big changes September 16th, 2014

UT Arlington research uses nanotechnology to help cool electrons with no external sources September 11th, 2014

Excitonic Dark States Shed Light on TMDC Atomic Layers: Berkeley Lab Discovery Holds Promise for Nanoelectronic and Photonic Applications September 11th, 2014

Researchers Create World’s Largest DNA Origami September 11th, 2014

Announcements

Carbon Sciences Developing Breakthrough Technology to Mass-Produce Graphene -- the New Miracle Material: Company Enters Into an Agreement With the University of California, Santa Barbara (UCSB) to Fund the Further Development of a New Graphene Process September 16th, 2014

Nanoribbon film keeps glass ice-free: Rice University lab refines deicing film that allows radio frequencies to pass September 16th, 2014

Effective Nanotechnology Innovations to Receive Mustafa Prize September 16th, 2014

‘Small’ transformation yields big changes September 16th, 2014

Tools

Advanced Light Source Sets Microscopy Record| Berkeley Lab Researchers Achieve Highest Resolution Ever with X-ray Microscopy September 11th, 2014

Researchers Create World’s Largest DNA Origami September 11th, 2014

Development of Algorithm for Accurate Calculation of Average Distance Travelled by Low-Speed Electrons without Energy Loss that Are Sensitive to Surface Structure September 11th, 2014

How skin falls apart: The pathology of autoimmune skin disease is revealed at the nanoscale September 10th, 2014

Alliances/Partnerships/Distributorships

NEI Corporation and PneumatiCoat Technologies Sign Agreement to Jointly Develop and Market New Materials for Lithium-ion Batteries September 12th, 2014

Handheld scanner could make brain tumor removal more complete, reducing recurrence September 3rd, 2014

Leading European communications companies and research organizations have launched an EU project developing the future 5th Generation cellular mobile networks August 28th, 2014

JPK expands availability of instrumentation in the USA – appointing new distributors – launched a new web site to support the US market - AFM now available to US users August 26th, 2014

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More














ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE