Home > Press > Dai Nippon Printing and Molecular Imprints Team to Accelerate Commercialization of Nanoimprint Lithography
Strategic collaboration agreement to speed development of lower-cost, leading-edge imprint masks using mask replication technology based on Jet and Flash™ Imprint Lithography (J-FIL™)
Dai Nippon Printing and Molecular Imprints Team to Accelerate Commercialization of Nanoimprint Lithography
Austin, TX | Posted on July 1st, 2009
Dai Nippon Printing Co., Ltd. (DNP), a leading producer of semiconductor photomasks, and Molecular Imprints, Inc., a market and technology leader for nanopatterning systems and solutions, today announced that they have entered into a strategic collaboration agreement to speed the commercialization of nanoimprint lithography for high-volume semiconductor device manufacturing.
Under the terms of the agreement, DNP will provide Molecular Imprints with funding and related support for the development of a new mask replication platform designed to significantly lower imprint mask production costs - a substantial step forward in establishing the imprint technology infrastructure needed for volume-production applications.
The mask replication platform development program will utilize Molecular Imprints' innovative Jet and Flash™ Imprint Lithography (J-FIL™) technology to replicate master imprint masks at significantly higher throughputs compared to traditional mask e-beam writers-resulting in significant reductions in total mask costs to levels well below the cost for optical photomasks used today. The goal of the program is to develop mask replication technology that will be ready for commercial deployment for the 22nm half-pitch node.
The advent of current deep sub-wavelength imaging with complex mask techniques, double patterning, and limited mask lifetime due to haze have all contributed to masks becoming a major component of lithography costs for advanced semiconductor manufacturing. Now that DNP has demonstrated that 1X imprint masks can be fabricated with the existing photomask infrastructure, the advantages of low-cost replication can be brought to bear to reduce overall imprint mask cost of ownership (CoO).
The master imprint mask can be faithfully and cost-effectively replicated hundreds of times using the mask replication platform now under development by Molecular Imprints with support from DNP.
"Our industry partnerships allow DNP to gain knowledge and expertise on enabling cutting-edge technologies, which in turn allow us to provide our customers with access to solutions to meet the semiconductor industry's ever-growing lithography mask demands at the earliest possible date," stated Mr. Naoya Hayashi, research fellow at DNP. "This collaboration with Molecular Imprints gives DNP an important advantage in the area of imprint lithography, and will enable us to lead the way in supporting the semiconductor industry's imprint mask needs."
"This partnership with DNP is a key component of our overall strategy to accelerate adoption of our J-FIL technology initially for advanced non-volatile memory production," stated Mark Melliar-Smith, CEO of Molecular Imprints. "DNP is a pioneer in the development and commercialization of sub-30nm half-pitch imprint masks. Through their support of our mask replication development program, DNP is helping to ensure the availability of low-cost imprint masks to address the growing global demand within the semiconductor industry for high-resolution, low cost-of-ownership lithography."
Molecular Imprints' J-FIL technology is built on the semiconductor industry's existing optical lithography infrastructure, using commercially available photomask, exposure source and resist technology. As a result, the company's imprint lithography systems are a drop-in technology suitable for mix-and-match strategies, where their resolution and cost advantages can be deployed on critical layers. Molecular Imprints' J-FIL technology offers 12nm resolution patterning in a single exposure using a simplified design and process. Imprint systems utilizing J-FIL provide a highly extendible, low CoO patterning solution for multiple design generations.
About Molecular Imprints
Molecular Imprints, Inc. (MII) is the technology leader for high-resolution, low cost-of-ownership nanopatterning systems and solutions in the hard disk drive (HDD) and semiconductor industries. MII is leveraging its innovative Jet and FlashTM Imprint Lithography (J-FILTM) with IntelliJetTM material application technology to become the worldwide market and technology leader in high-volume patterning solutions for storage and memory devices, while enabling emerging markets in optics, biotechnology, and other industries. MII enables nanoscale patterning by delivering a comprehensive nanopatterning solution that is affordable, compatible and extendible to sub-10-nanometer resolution levels.
About Dai Nippon Printing
DNP is a world-class comprehensive printing company with 1.5848 trillion yen in annual revenues and approximately 40,000 employees. Based in Tokyo, Japan, DNP offers a broad range of products and services for publishing, commercial
printing, smart cards, networking, and electronics components, among others. Its products in the electronics field include color filters and other components for LCDs, photomasks, PCBs and semiconductor-related components. In the photomask market DNP is a world leader, utilizing its time honored printing techniques and know-how in the fabrication of cuttingedge photomasks.
For more information, please click here
Corporate PR Contact
Molecular Imprints, Inc.
1-650-968-8900 ext. 125
Copyright © Molecular Imprints
If you have a comment, please Contact
Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.
TARA Biosystems and Harris & Harris Group Form Company to Improve Safety and Efficacy of New Therapies October 22nd, 2014
Arrowhead Issues Open Letter to Shareholders October 9th, 2014
PEN Inc. Announces New Trading Symbol: PENC: Stock Continues Trading on the OTCQB September 3rd, 2014
Aspen Aerogels, Inc. to Present at Barclays CEO Energy-Power Conference August 27th, 2014
Sussex physicists find simple solution for quantum technology challenge October 28th, 2014
Watching the hidden life of materials: Ultrafast electron diffraction experiments open a new window on the microscopic world October 27th, 2014
Breakthrough in molecular electronics paves the way for DNA-based computer circuits in the future: DNA-based programmable circuits could be more sophisticated, cheaper and simpler to make October 27th, 2014
QuantumWise guides the semiconductor industry towards the atomic scale October 24th, 2014
First Observation of Electronic Structure in Ag-Rh Alloy Nanoparticles Having Hydrogen Absorbing: Storage Property –Attempting to solve the mystery of why Ag-Rh alloy nanoparticles have a similar property to Pd– October 30th, 2014
Iranians Present Model to Predict Photocatalytic Process in Removal of Pollutants October 30th, 2014
Production of Biocompatible Polymers in Iran October 30th, 2014
Amorphous Coordination Polymer Particles as alternative to classical nanoplatforms for nanomedicine October 30th, 2014
A new cheap and efficient method to improve SERS, an ultra-sensitive chemical detection technique October 28th, 2014
New Compact SIMS at 61st AVS | Visit us on Booth 311 October 28th, 2014
New nanodevice to improve cancer treatment monitoring October 27th, 2014
Haydale Secures Exclusive Development and Supply Agreement with Tantec A/S: New reactors to be built and commissioned by Tantec A/S represent another step forward towards the commercialisation of graphene October 24th, 2014
'Electronic skin' could improve early breast cancer detection October 29th, 2014
European Commission opens the gate towards the implementation of Nanomedicine Translation Hub October 16th, 2014
IRLYNX and CEA-Leti to Streamline New CMOS-based Infrared Sensing Modules Dedicated to Human-activities Characterization October 15th, 2014
New VDMA Association "Electronics, Micro and Nano Technologies" founded: Inaugural Meeting in Frankfurt/Main, Germany October 15th, 2014