Nanotechnology Now

Our NanoNews Digest Sponsors


Heifer International

Wikipedia Affiliate Button


DHgate

Home > Press > Dai Nippon Printing and Molecular Imprints Team to Accelerate Commercialization of Nanoimprint Lithography

Abstract:
Strategic collaboration agreement to speed development of lower-cost, leading-edge imprint masks using mask replication technology based on Jet and Flash™ Imprint Lithography (J-FIL™)

Dai Nippon Printing and Molecular Imprints Team to Accelerate Commercialization of Nanoimprint Lithography

Austin, TX | Posted on July 1st, 2009

Dai Nippon Printing Co., Ltd. (DNP), a leading producer of semiconductor photomasks, and Molecular Imprints, Inc., a market and technology leader for nanopatterning systems and solutions, today announced that they have entered into a strategic collaboration agreement to speed the commercialization of nanoimprint lithography for high-volume semiconductor device manufacturing.

Under the terms of the agreement, DNP will provide Molecular Imprints with funding and related support for the development of a new mask replication platform designed to significantly lower imprint mask production costs - a substantial step forward in establishing the imprint technology infrastructure needed for volume-production applications.

The mask replication platform development program will utilize Molecular Imprints' innovative Jet and Flash™ Imprint Lithography (J-FIL™) technology to replicate master imprint masks at significantly higher throughputs compared to traditional mask e-beam writers-resulting in significant reductions in total mask costs to levels well below the cost for optical photomasks used today. The goal of the program is to develop mask replication technology that will be ready for commercial deployment for the 22nm half-pitch node.

The advent of current deep sub-wavelength imaging with complex mask techniques, double patterning, and limited mask lifetime due to haze have all contributed to masks becoming a major component of lithography costs for advanced semiconductor manufacturing. Now that DNP has demonstrated that 1X imprint masks can be fabricated with the existing photomask infrastructure, the advantages of low-cost replication can be brought to bear to reduce overall imprint mask cost of ownership (CoO).

The master imprint mask can be faithfully and cost-effectively replicated hundreds of times using the mask replication platform now under development by Molecular Imprints with support from DNP.

"Our industry partnerships allow DNP to gain knowledge and expertise on enabling cutting-edge technologies, which in turn allow us to provide our customers with access to solutions to meet the semiconductor industry's ever-growing lithography mask demands at the earliest possible date," stated Mr. Naoya Hayashi, research fellow at DNP. "This collaboration with Molecular Imprints gives DNP an important advantage in the area of imprint lithography, and will enable us to lead the way in supporting the semiconductor industry's imprint mask needs."

"This partnership with DNP is a key component of our overall strategy to accelerate adoption of our J-FIL technology initially for advanced non-volatile memory production," stated Mark Melliar-Smith, CEO of Molecular Imprints. "DNP is a pioneer in the development and commercialization of sub-30nm half-pitch imprint masks. Through their support of our mask replication development program, DNP is helping to ensure the availability of low-cost imprint masks to address the growing global demand within the semiconductor industry for high-resolution, low cost-of-ownership lithography."

Molecular Imprints' J-FIL technology is built on the semiconductor industry's existing optical lithography infrastructure, using commercially available photomask, exposure source and resist technology. As a result, the company's imprint lithography systems are a drop-in technology suitable for mix-and-match strategies, where their resolution and cost advantages can be deployed on critical layers. Molecular Imprints' J-FIL technology offers 12nm resolution patterning in a single exposure using a simplified design and process. Imprint systems utilizing J-FIL provide a highly extendible, low CoO patterning solution for multiple design generations.

####

About Molecular Imprints
Molecular Imprints, Inc. (MII) is the technology leader for high-resolution, low cost-of-ownership nanopatterning systems and solutions in the hard disk drive (HDD) and semiconductor industries. MII is leveraging its innovative Jet and FlashTM Imprint Lithography (J-FILTM) with IntelliJetTM material application technology to become the worldwide market and technology leader in high-volume patterning solutions for storage and memory devices, while enabling emerging markets in optics, biotechnology, and other industries. MII enables nanoscale patterning by delivering a comprehensive nanopatterning solution that is affordable, compatible and extendible to sub-10-nanometer resolution levels.

About Dai Nippon Printing

DNP is a world-class comprehensive printing company with 1.5848 trillion yen in annual revenues and approximately 40,000 employees. Based in Tokyo, Japan, DNP offers a broad range of products and services for publishing, commercial
printing, smart cards, networking, and electronics components, among others. Its products in the electronics field include color filters and other components for LCDs, photomasks, PCBs and semiconductor-related components. In the photomask market DNP is a world leader, utilizing its time honored printing techniques and know-how in the fabrication of cuttingedge photomasks.

For more information, please click here

Contacts:
Corporate PR Contact
Ken Rygler
Molecular Imprints, Inc.
1-512-339-7760 x313


Agency Contact
David Moreno
MCA
1-650-968-8900 ext. 125

Copyright © Molecular Imprints

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Investments/IPO's/Splits

Nanometrics to Participate in the 8th Annual CEO Investor Summit: Investor Event Held Concurrently with SEMICON West 2016 in San Francisco June 22nd, 2016

Artificial synapse rivals biological ones in energy consumption June 21st, 2016

NanoLabNL boosts quality of research facilities as Dutch Toekomstfonds invests firmly June 10th, 2016

Nanometrics Announces Upcoming Investor Events May 10th, 2016

Chip Technology

New, better way to build circuits for world's first useful quantum computers June 28th, 2016

GraphExeter illuminates bright new future for flexible lighting devices June 23rd, 2016

Soft decoupling of organic molecules on metal June 23rd, 2016

Particle zoo in a quantum computer: First experimental quantum simulation of particle physics phenomena June 23rd, 2016

Announcements

Building a smart cardiac patch: 'Bionic' cardiac patch could one day monitor and respond to cardiac problems June 28th, 2016

New, better way to build circuits for world's first useful quantum computers June 28th, 2016

Yale researchers’ technology turns wasted heat into power June 27th, 2016

FEI Launches Helios G4 DualBeam Series for Materials Science: The Helios G4 DualBeam Series features new capabilities to enable scientists and engineers to answer the most demanding and challenging scientific questions June 27th, 2016

Tools

FEI Launches Helios G4 DualBeam Series for Materials Science: The Helios G4 DualBeam Series features new capabilities to enable scientists and engineers to answer the most demanding and challenging scientific questions June 27th, 2016

Nanoscientists develop the 'ultimate discovery tool': Rapid discovery power is similar to what gene chips offer biology June 25th, 2016

Ultrathin, flat lens resolves chirality and color: Multifunctional lens could replace bulky, expensive machines June 25th, 2016

Researchers discover new chemical sensing technique: Technique allows sharper detail -- and more information -- with near infrared light June 24th, 2016

Alliances/Trade associations/Partnerships/Distributorships

FEI and University of Liverpool Announce QEMSCAN Research Initiative: University of Liverpool will utilize FEI’s QEMSCAN technology to gain a better insight into oil and gas reserves & potentially change the approach to evaluating them June 22nd, 2016

French Research Team Helps Extend MRI Detection of Diseases & Lower Health-Care Costs: CEA, INSERM and G2ELab Brings Grenoble Region’s Expertise In Advanced Medicine & Magnetism Applications to H2020 IDentIFY Project June 21st, 2016

Research showing why hierarchy exists will aid the development of artificial intelligence June 13th, 2016

UK NANOSAFETY GROUP publishes 2nd Edition of guidance to support safe working with nanomaterials May 30th, 2016

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







Car Brands
Buy website traffic