Nanotechnology Now

Our NanoNews Digest Sponsors





Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > Press > Vistec Lithography Presents the Latest Version of Its EBPG Product Line

Abstract:
Vistec's EBPG5200 Features the Most Advanced Electron Beam Lithography Technology for Exposure of Substrates - from Small Fragments to Complete 200mm Substrates.

Vistec Lithography Presents the Latest Version of Its EBPG Product Line

Watervliet, NY | Posted on May 26th, 2009

The Vistec EBPG5200 represents the continued development stage of the successful EBPG product series. With added improvements in resolution, noise reduction, and stability, the Vistec EBPG5200 is even better adapted to the diverse and ever increasing nanotechnology requirements of science and research at universities, academic and industry-related research centers.

The Vistec EBPG5200 enables users to address a multitude of application fields, such as nanotechnology, biotechnology, integrated optics, security, semiconductor research, X-ray optics, MEMS and sensor engineering to name but a few of them.

Vistec EBPG5200 system users benefit from more than thirty years of experience that Vistec has gained in the electron beam lithography business. This is clearly demonstrated by a large established base of EBPG systems currently installed worldwide.

Safe Investment for the Future:
A "modular" concept for functional features and user needs is the heart of the EBPG5200 scheme. The Vistec EBPG5200ES (Entry System) is the cost-efficient basic version of the EBPG5200 series. Upgrading to the full EBPG5200 functionality may be performed at any time, depending on the user's available budget and application requirements.

This highly flexible concept facilitates adaptation to the latest requirements and future application needs while offering various retrofit modules that are affordably priced.

Extended Platform:
The Vistec EBPG5200 is equipped with a modified platform that supports full exposure of substrates to a maximum size of 200mm. Like the previous EBPG tools, it can be used to expose fragments and special substrates in addition to standard substrate types and sizes. Essential design principles of the previous EBPG systems have been incorporated into this new 200mm platform.

Leading Edge Lithography:
With further enhancements in resolution, noise reduction and beam stability, the Vistec EBPG5200 is set to generate structures to less than 8nm on substrates of any size and type. Its electron-optical column (TFE source) is rated for acceleration voltages of 20, 50, and 100kV. With the EBPG5200 Vistec offers true 100kV / 1mm performance under regular electron-optical conditions.
However, what makes Vistec's electron beam lithography of superior standards actually possible is the perfect match of the various system components such as the electron-optical column, the hardware platform, the data processor and the exposure engine working together in a flexible and user friendly system.

One example, how this relates to practice is the structuring of fine gates and coarser connector pads in transistor arrays. By splitting the job into a coarse and fine writing strategy, throughput can be maximized. Such sub-50nm gates can be structured to run at optimum exposure current and the coarser pads exposed with a useful beam current greater than 100nA and a maximum deflection rate of 50MHz in an automatic exposure cycle. Switching between ultra-high resolution and throughput occurs on a floating basis and is fully automated. No manual intervention is required, whether at the electron-optical column or in terms of program sequence.

Simple Operation - Highest Fexibility:
The system incorporates an interactive graphical user interface (GUI) that provides the ease of use for diverse "multi user environments", as often required in the case of large user teams.
The EBPG5200 has a proven and reliable load-lock. With a maximum holding capacity of ten equal or different substrate holders, the load-lock can accomodate a variety of substrate sizes and types as necessary for the particular application task. With this highly automated operation mode, users may also tailor the exposure sequencing to their specific requirements. Furthermore, the system includes LINUX based operational software and the user may choose his preferred data preparation scheme.

For comprehensive information about Vistec Electron Beam Lithography Group or downloads of all media releases and images in print quality please visit the website at www.vistec-semi.com. If you require other formats or images please do not hesitate to contact us.

####

About Vistec Lithography
Vistec Semiconductor Systems is providing key technologies used by all leading
semiconductor manufacturers and many research institutes around the world.

For more information, please click here

Contacts:
Vistec Lithography, Inc.
Ines Stolberg
Manager Strategic Marketing Litho
Tel.: +49(0)3641/651955
Fax: +49(0)3641/651922

www.vistec-semi.com
or
PR Agency
Tower PR
Tel.: +49(0)3641/507081

www.tower-pr.com

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Special UO microscope captures defects in nanotubes: University of Oregon chemists provide a detailed view of traps that disrupt energy flow, possibly pointing toward improved charge-carrying devices October 21st, 2014

Super stable garnet ceramics may be ideal for high-energy lithium batteries October 21st, 2014

Could I squeeze by you? Ames Laboratory scientists model molecular movement within narrow channels of mesoporous nanoparticles October 21st, 2014

Detecting Cancer Earlier is Goal of Rutgers-Developed Medical Imaging Technology: Rare earth nanocrystals and infrared light can reveal small cancerous tumors and cardiovascular lesions October 21st, 2014

MEMS

IEEE International Electron Devices Meeting To Celebrate 60th Anniversary as The Leading Technical Conference for Advanced Semiconductor Devices September 18th, 2014

Carbyne morphs when stretched: Rice University calculations show carbon-atom chain would go metal to semiconductor July 21st, 2014

Leti to Present Technological Platforms Targeting Industry’s Needs for the Future at Semicon West Workshop: Presentation at STS Session to Focus on Leti Advanced Lithography Programs for 1x Nodes and on Silicon Photonics at TechXPot June 25th, 2014

Mirrorcle Technologies Opens New Company Headquarters May 27th, 2014

Chip Technology

Nitrogen Doped Graphene Characterized by Iranian, Russian, German Scientists October 21st, 2014

Crystallizing the DNA nanotechnology dream: Scientists have designed the first large DNA crystals with precisely prescribed depths and complex 3D features, which could create revolutionary nanodevices October 20th, 2014

Imaging electric charge propagating along microbial nanowires October 20th, 2014

Superconducting circuits, simplified: New circuit design could unlock the power of experimental superconducting computer chips October 18th, 2014

Announcements

Special UO microscope captures defects in nanotubes: University of Oregon chemists provide a detailed view of traps that disrupt energy flow, possibly pointing toward improved charge-carrying devices October 21st, 2014

Super stable garnet ceramics may be ideal for high-energy lithium batteries October 21st, 2014

Could I squeeze by you? Ames Laboratory scientists model molecular movement within narrow channels of mesoporous nanoparticles October 21st, 2014

Detecting Cancer Earlier is Goal of Rutgers-Developed Medical Imaging Technology: Rare earth nanocrystals and infrared light can reveal small cancerous tumors and cardiovascular lesions October 21st, 2014

Tools

Special UO microscope captures defects in nanotubes: University of Oregon chemists provide a detailed view of traps that disrupt energy flow, possibly pointing toward improved charge-carrying devices October 21st, 2014

Super stable garnet ceramics may be ideal for high-energy lithium batteries October 21st, 2014

Detecting Cancer Earlier is Goal of Rutgers-Developed Medical Imaging Technology: Rare earth nanocrystals and infrared light can reveal small cancerous tumors and cardiovascular lesions October 21st, 2014

New Grand ARM Transmission Electron Microscope Offers Highest Commercially-Available Atomic Resolution of 63 Picometers October 17th, 2014

NanoNews-Digest
The latest news from around the world, FREE





  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More














ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE