Nanotechnology Now

Our NanoNews Digest Sponsors





Heifer International

Wikipedia Affiliate Button


DHgate

Home > Press > Vistec Lithography Presents the Latest Version of Its EBPG Product Line

Abstract:
Vistec's EBPG5200 Features the Most Advanced Electron Beam Lithography Technology for Exposure of Substrates - from Small Fragments to Complete 200mm Substrates.

Vistec Lithography Presents the Latest Version of Its EBPG Product Line

Watervliet, NY | Posted on May 26th, 2009

The Vistec EBPG5200 represents the continued development stage of the successful EBPG product series. With added improvements in resolution, noise reduction, and stability, the Vistec EBPG5200 is even better adapted to the diverse and ever increasing nanotechnology requirements of science and research at universities, academic and industry-related research centers.

The Vistec EBPG5200 enables users to address a multitude of application fields, such as nanotechnology, biotechnology, integrated optics, security, semiconductor research, X-ray optics, MEMS and sensor engineering to name but a few of them.

Vistec EBPG5200 system users benefit from more than thirty years of experience that Vistec has gained in the electron beam lithography business. This is clearly demonstrated by a large established base of EBPG systems currently installed worldwide.

Safe Investment for the Future:
A "modular" concept for functional features and user needs is the heart of the EBPG5200 scheme. The Vistec EBPG5200ES (Entry System) is the cost-efficient basic version of the EBPG5200 series. Upgrading to the full EBPG5200 functionality may be performed at any time, depending on the user's available budget and application requirements.

This highly flexible concept facilitates adaptation to the latest requirements and future application needs while offering various retrofit modules that are affordably priced.

Extended Platform:
The Vistec EBPG5200 is equipped with a modified platform that supports full exposure of substrates to a maximum size of 200mm. Like the previous EBPG tools, it can be used to expose fragments and special substrates in addition to standard substrate types and sizes. Essential design principles of the previous EBPG systems have been incorporated into this new 200mm platform.

Leading Edge Lithography:
With further enhancements in resolution, noise reduction and beam stability, the Vistec EBPG5200 is set to generate structures to less than 8nm on substrates of any size and type. Its electron-optical column (TFE source) is rated for acceleration voltages of 20, 50, and 100kV. With the EBPG5200 Vistec offers true 100kV / 1mm performance under regular electron-optical conditions.
However, what makes Vistec's electron beam lithography of superior standards actually possible is the perfect match of the various system components such as the electron-optical column, the hardware platform, the data processor and the exposure engine working together in a flexible and user friendly system.

One example, how this relates to practice is the structuring of fine gates and coarser connector pads in transistor arrays. By splitting the job into a coarse and fine writing strategy, throughput can be maximized. Such sub-50nm gates can be structured to run at optimum exposure current and the coarser pads exposed with a useful beam current greater than 100nA and a maximum deflection rate of 50MHz in an automatic exposure cycle. Switching between ultra-high resolution and throughput occurs on a floating basis and is fully automated. No manual intervention is required, whether at the electron-optical column or in terms of program sequence.

Simple Operation - Highest Fexibility:
The system incorporates an interactive graphical user interface (GUI) that provides the ease of use for diverse "multi user environments", as often required in the case of large user teams.
The EBPG5200 has a proven and reliable load-lock. With a maximum holding capacity of ten equal or different substrate holders, the load-lock can accomodate a variety of substrate sizes and types as necessary for the particular application task. With this highly automated operation mode, users may also tailor the exposure sequencing to their specific requirements. Furthermore, the system includes LINUX based operational software and the user may choose his preferred data preparation scheme.

For comprehensive information about Vistec Electron Beam Lithography Group or downloads of all media releases and images in print quality please visit the website at www.vistec-semi.com. If you require other formats or images please do not hesitate to contact us.

####

About Vistec Lithography
Vistec Semiconductor Systems is providing key technologies used by all leading
semiconductor manufacturers and many research institutes around the world.

For more information, please click here

Contacts:
Vistec Lithography, Inc.
Ines Stolberg
Manager Strategic Marketing Litho
Tel.: +49(0)3641/651955
Fax: +49(0)3641/651922

www.vistec-semi.com
or
PR Agency
Tower PR
Tel.: +49(0)3641/507081

www.tower-pr.com

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Nanofiltration Membrane Market 2015 - Global Industry Survey, Analysis, Size, Share, Outlook and Forecast to 2020 July 31st, 2015

Nanozirconia Market 2015 - Global Industry Survey, Analysis, Size, Share, Outlook and Forecast to 2020 July 31st, 2015

Self-Healing Nano Anti-rust Coatings Market 2015 - Global Industry Survey, Analysis, Size, Share, Outlook and Forecast to 2020 July 31st, 2015

Nano Spray Instrument Market 2015 - Global Industry Survey, Analysis, Size, Share, Outlook and Forecast to 2020 July 31st, 2015

MEMS

Iranian Scientists Create Best Conditions for Synthesis of Gold Nanolayers July 23rd, 2015

Robust new process forms 3-D shapes from flat sheets of graphene June 23rd, 2015

Slip sliding away: Graphene and diamonds prove a slippery combination June 10th, 2015

MEMS Industry Group Hosts Its First MEMS/Sensors Conference Session at Transducers 2015: MIG Speakers Will Explore Technology Transfer, Emerging MEMS/Sensors, Manufacturing Infrastructure and Process Technology, June 23 in Anchorage June 3rd, 2015

Chip Technology

This could replace your silicon computer chips: A new semiconductor material made from black phosphorus may be a candidate to replace silicon in future tech July 30th, 2015

March 2016; 6th Int'l Conference on Nanostructures in Iran July 29th, 2015

Meet the high-performance single-molecule diode: Major milestone in molecular electronics scored by Berkeley Lab and Columbia University team July 29th, 2015

Short wavelength plasmons observed in nanotubes: Berkeley Lab researchers create Ludinger liquid plasmons in metallic SWNTs July 28th, 2015

Announcements

Nano Spray Instrument Market 2015 - Global Industry Survey, Analysis, Size, Share, Outlook and Forecast to 2020 July 31st, 2015

Nanocellulose Market 2015 - Global Industry Survey, Analysis, Size, Share, Outlook and Forecast to 2020 July 31st, 2015

Heating and cooling with light leads to ultrafast DNA diagnostics July 31st, 2015

Theoretical Physicists at Freie Universitšt Berlin Develop New Insights into Interface between Classical and Quantum Worlds July 31st, 2015

Tools

Heating and cooling with light leads to ultrafast DNA diagnostics July 31st, 2015

Take a trip through the brain July 30th, 2015

Publication on Atomic Force Microscopy based nanoscale IR Spectroscopy (AFM-IR) persists as a 2015 top downloaded paper July 29th, 2015

Nanometrics Announces Upcoming Investor Events July 28th, 2015

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project