Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > Press > Vistec Lithography Presents the Latest Version of Its EBPG Product Line

Vistec's EBPG5200 Features the Most Advanced Electron Beam Lithography Technology for Exposure of Substrates - from Small Fragments to Complete 200mm Substrates.

Vistec Lithography Presents the Latest Version of Its EBPG Product Line

Watervliet, NY | Posted on May 26th, 2009

The Vistec EBPG5200 represents the continued development stage of the successful EBPG product series. With added improvements in resolution, noise reduction, and stability, the Vistec EBPG5200 is even better adapted to the diverse and ever increasing nanotechnology requirements of science and research at universities, academic and industry-related research centers.

The Vistec EBPG5200 enables users to address a multitude of application fields, such as nanotechnology, biotechnology, integrated optics, security, semiconductor research, X-ray optics, MEMS and sensor engineering to name but a few of them.

Vistec EBPG5200 system users benefit from more than thirty years of experience that Vistec has gained in the electron beam lithography business. This is clearly demonstrated by a large established base of EBPG systems currently installed worldwide.

Safe Investment for the Future:
A "modular" concept for functional features and user needs is the heart of the EBPG5200 scheme. The Vistec EBPG5200ES (Entry System) is the cost-efficient basic version of the EBPG5200 series. Upgrading to the full EBPG5200 functionality may be performed at any time, depending on the user's available budget and application requirements.

This highly flexible concept facilitates adaptation to the latest requirements and future application needs while offering various retrofit modules that are affordably priced.

Extended Platform:
The Vistec EBPG5200 is equipped with a modified platform that supports full exposure of substrates to a maximum size of 200mm. Like the previous EBPG tools, it can be used to expose fragments and special substrates in addition to standard substrate types and sizes. Essential design principles of the previous EBPG systems have been incorporated into this new 200mm platform.

Leading Edge Lithography:
With further enhancements in resolution, noise reduction and beam stability, the Vistec EBPG5200 is set to generate structures to less than 8nm on substrates of any size and type. Its electron-optical column (TFE source) is rated for acceleration voltages of 20, 50, and 100kV. With the EBPG5200 Vistec offers true 100kV / 1mm performance under regular electron-optical conditions.
However, what makes Vistec's electron beam lithography of superior standards actually possible is the perfect match of the various system components such as the electron-optical column, the hardware platform, the data processor and the exposure engine working together in a flexible and user friendly system.

One example, how this relates to practice is the structuring of fine gates and coarser connector pads in transistor arrays. By splitting the job into a coarse and fine writing strategy, throughput can be maximized. Such sub-50nm gates can be structured to run at optimum exposure current and the coarser pads exposed with a useful beam current greater than 100nA and a maximum deflection rate of 50MHz in an automatic exposure cycle. Switching between ultra-high resolution and throughput occurs on a floating basis and is fully automated. No manual intervention is required, whether at the electron-optical column or in terms of program sequence.

Simple Operation - Highest Fexibility:
The system incorporates an interactive graphical user interface (GUI) that provides the ease of use for diverse "multi user environments", as often required in the case of large user teams.
The EBPG5200 has a proven and reliable load-lock. With a maximum holding capacity of ten equal or different substrate holders, the load-lock can accomodate a variety of substrate sizes and types as necessary for the particular application task. With this highly automated operation mode, users may also tailor the exposure sequencing to their specific requirements. Furthermore, the system includes LINUX based operational software and the user may choose his preferred data preparation scheme.

For comprehensive information about Vistec Electron Beam Lithography Group or downloads of all media releases and images in print quality please visit the website at If you require other formats or images please do not hesitate to contact us.


About Vistec Lithography
Vistec Semiconductor Systems is providing key technologies used by all leading
semiconductor manufacturers and many research institutes around the world.

For more information, please click here

Vistec Lithography, Inc.
Ines Stolberg
Manager Strategic Marketing Litho
Tel.: +49(0)3641/651955
Fax: +49(0)3641/651922
PR Agency
Tower PR
Tel.: +49(0)3641/507081

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Scientists change properties of zeolites to improve hemodialysis July 29th, 2016

Novel state of matter: Observation of a quantum spin liquid July 29th, 2016

A new type of quantum bits July 29th, 2016

Lonely atoms, happily reunited July 29th, 2016


Integration of novel materials with silicon chips makes new 'smart' devices possible July 25th, 2016

New research unveils graphene 'moth eyes' to power future smart technologies: New ultra-thin, patterned graphene sheets will be essential in designing future technologies such as 'smart wallpaper' and Internet-of-things applications March 1st, 2016

Vesper Collaborates with GLOBALFOUNDRIES to Deliver First Piezoelectric MEMS Microphones: Acoustic sensing company works with top foundry to support mass-market consumer products January 21st, 2016

MEMS & Sensors Industry Group Previews “Internet of MEMS & Sensors” at CES 2016 -- Global industry association invites CE OEMS/integrators to conference track on January 7 January 6th, 2016

Chip Technology

Novel state of matter: Observation of a quantum spin liquid July 29th, 2016

A new type of quantum bits July 29th, 2016

Beating the heat a challenge at the nanoscale: Rice University scientists detect thermal boundary that hinders ultracold experiments July 28th, 2016

New nontoxic process promises larger ultrathin sheets of 2-D nanomaterials July 27th, 2016


Scientists change properties of zeolites to improve hemodialysis July 29th, 2016

Novel state of matter: Observation of a quantum spin liquid July 29th, 2016

A new type of quantum bits July 29th, 2016

Lonely atoms, happily reunited July 29th, 2016


Lonely atoms, happily reunited July 29th, 2016

Pixel-array quantum cascade detector paves the way for portable thermal imaging devices: Research team from TU-Wien Center for Micro- and Nanostructures have developed a new 'cooler' sensing instrument thereby increasing energy-efficiency and enhancing mobility for diagnostic tes July 28th, 2016

WSU researchers 'watch' crystal structure change in real time: Breakthrough made possible by new Argonne facility July 27th, 2016

Enhancing molecular imaging with light: New technology platform increases spectroscopic resolution by 4 fold July 27th, 2016

The latest news from around the world, FREE

  Premium Products
Only the news you want to read!
 Learn More
University Technology Transfer & Patents
 Learn More
Full-service, expert consulting
 Learn More

Nanotechnology Now Featured Books


The Hunger Project

Car Brands
Buy website traffic