Nanotechnology Now - Press Release: "First Nano – A Division of CVD Equipment Corporation Announces Participation in Two Industry Conferences / Trade Shows in April "

Home > Press > First Nano – A Division of CVD Equipment Corporation Announces Participation in Two Industry Conferences / Trade Shows in April

Abstract:
First Nano, a division of CVD Equipment Corporation (NASDAQ: CVV), announced today that it will exhibit at the 7th Annual Nano Technology for Defense Conference, 6 - 9 April 2009 in Burlingame, CA and the Materials Research Society - MRS Spring, 13 - 17 April, 2009 in San Francisco, CA, Moscone West | San Francisco Marriott.

First Nano – A Division of CVD Equipment Corporation Announces Participation in Two Industry Conferences / Trade Shows in April

Ronkonkoma, NY | Posted on April 8th, 2009

The Nano Technology for Defense Conference is sponsored by the tri-service research organizations [Air Force Research Laboratory (AFRL), Army Research Laboratory (ARL), and the Office of Naval Research (ONR)], as well as the Defense Threat Reduction Agency (DTRA) and Defense Advanced Research Projects Agency (DARPA).

Dr. Yi Tu, Senior Research Scientist, First Nano will be presenting "Progress in Carbon Nanotube and Semiconducting Nanowire Synthesis". Y. Tu1, C. Jensen1, T. Salagaj1, K. Strobl1, M. Schulz2, V. Shanov2, K. Shum3.

1. First Nano, a Division of CVD Equipment Corporation, 2. University of Cincinnati, 3.Brooklyn College of the City University of New York.

During the MRS Spring Show First Nano will be sponsoring the MRS Symposium AA: Semiconductor Nanowires Session. During this session Brooklyn University will be presenting three papers. ZnO nanostructures epitaxially grown on ZnO seeded Si (100) substrates by chemical vapor deposition Zhuo Chen1, T. Salagaj2, C. Jensen2, K. Strobl2, Mim Nakarmi1, and Kai Shum1, a , two-photon absorption induced photoluminescence in a ZnO nanostructure Zhuo Chen1, T. Salagaj2, C. Jensen2, K. Strobl2, V. Hongpinyo3, Boon Ooi3, Mim Nakarmi1, and Kai Shum1, and ZnO thin film deposition on sapphire substrates by chemical vapor deposition Zhuo Chen1, T. Salagaj2, C. Jensen2, K. Strobl2, Mim Nakarmi1, and Kai Shum1.

1. Physics Department, Brooklyn College of the City University of New York, 2900 Bedford Avenue, Brooklyn, NY 11210, USA 2. First Nano, a division of CVD Equipment Corporation, 1860 Smithtown Avenue, Ronkonkoma, NY 11779, email,

The Private Securities Litigation Reform Act of 1995 provides a "safe harbor" for forward-looking statements. Certain information included in this press release (as well as information included in oral statements or other written statements made or to be made by CVD Equipment Corporation) contains statements that are forward-looking. All statements other than statements of historical fact are hereby identified as "forward-looking statements, "as such term is defined in Section 27A of the Securities Exchange Act of 1933, as amended, and Section 21E of the Securities Exchange Act of 1934, as amended. Such forward looking information involves a number of known and unknown risks and uncertainties that could cause actual results to differ materially from those discussed or anticipated by management. Potential risks and uncertainties include, among other factors, conditions, success of CVD Equipment Corporation's growth and sales strategies, the possibility of customer changes in delivery schedules, cancellation of orders, potential delays in product shipments, delays in obtaining inventory parts from suppliers and failure to satisfy customer acceptance requirements.

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About First Nano
First Nano provides turn-key solutions including deposition equipment, support equipment and processes for a variety of nanomaterials synthesis including SWNT, MWNT, Graphene, Boron Nitride Nanotube, Si nanowire, ZnO and GaN nanowire. We are also work on scaling up processes for large area continuous production of nanomaterials for commercial applications and to accelerate the commercialization of these technologies of tomorrow.

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Contacts:
CVD Equipment Corporation, Investor Relations
Phone: 631 981-7081
Fax: 631 981-7095

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