Nanotechnology Now

Our NanoNews Digest Sponsors



Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > Press > Nanometrics Introduces Next Generation NanoCD™ Suite Advanced Turnkey Solution for OCD Measurement Capability

Abstract:
Nanometrics Incorporated (Nasdaq: NANO), a leading supplier of advanced process control metrology equipment, today announced the release of its latest NanoCD Suite of solutions for optical critical dimension (OCD) metrology. The new NanoCD Suite Version 2.0 greatly enhances the power of OCD analysis for the most demanding process control applications.

Nanometrics Introduces Next Generation NanoCD™ Suite Advanced Turnkey Solution for OCD Measurement Capability

MILPITAS, CA | Posted on March 11th, 2009

The NanoCD Suite Version 2.0 is composed of key components enabling scalable fab-wide OCD metrology solutions, including the NanoGen, NanoMatch, NanoStation, and NanoDiffract. The suite offers industry-proven modeling methods, as well as a next-generation run time engine, comprehensive offline analysis tools and an intuitive user interface for structure definition and modeling. The NanoGen enterprise class server includes scalable resources that can be deployed and shared between numerous users and systems across the NanoCD Suite environment.

Each component of the NanoCD Suite is designed to take full advantage of the inherent connectivity between Nanometrics' wide metrology product portfolio, including standalone Atlas XP and Atlas-M systems for wafer and reticle metrology, as well as the IMPULSE/9010 integrated metrology product portfolio. When combined with the NanoCD Suite, Nanometrics systems have the broadest scatterometry metrology solution for today's semiconductor factories.

"By continually extending our modeling and analysis performance with innovative application methods, we enable our customers to actively control their most critical processing steps," commented Nagesh Avadhany, Vice President of Applications at Nanometrics. "Additionally, demand for applications support is growing beyond traditional CD measurements and now includes measurements on complex structures including films, coatings, epitaxial fill and post-CMP metal damascene structures. Many customers are applying our NanoCD technology for measurements in every sector of the fab, including thin film, CMP, advanced lithography and etch applications on complex 32nm and 22nm node test structures."

Enhancements in NanoDiffract allow users to control their process based on measurements of key parameters directly on DRAM, Flash, and SRAM cells. This measurement capability, along with new development tools, enable process engineers to optimize their metrology recipe and determine sensitivity even before initial wafers are processed. This highly optimized workflow for OCD applications development results in much faster time to results leading to rapid production deployment, higher productivity and lower cost of ownership.

####

About Nanometrics Incorporated
Nanometrics is a leader in the design, manufacture and marketing of high-performance process control metrology systems used primarily in the manufacturing of semiconductors, solar photovoltaics and high-brightness LEDs, as well as by customers in the silicon wafer and data storage industries. Nanometrics’ standalone and integrated metrology systems measure various thin film properties, critical dimensions, overlay control and optical, electrical and material properties, including the structural composition of silicon, compound semiconductor and photovoltaic devices, during various steps of the manufacturing process. These systems enable device manufacturers to improve yields, increase productivity and lower their manufacturing costs. The company maintains its headquarters in Milpitas, California, with sales and service offices worldwide. Nanometrics is traded on NASDAQ Global Market under the symbol NANO.

For more information, please click here

Contacts:
Company Contact:
Kevin Heidrich
408-545-6000 tel
408-232-5910 fax

Copyright © Nanometrics Incorporated

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

SEMATECH to Showcase Innovation and Advances in Manufacturing at SEMICON Japan 2014: SEMATECH experts will share the latest techniques, emerging trends and best practices in advanced manufacturing strategies and methodologies November 26th, 2014

Australian startup creates world’s first 100% cotton hydrophobic T-Shirts November 26th, 2014

The mysterious 'action at a distance' between liquid containers November 26th, 2014

'Giant' charge density disturbances discovered in nanomaterials: Juelich researchers amplify Friedel oscillations in thin metallic films November 26th, 2014

Software

Spectral Surface Mapping with Microscopic Resolution: CRAIC Technologies introduces Spectral Surface Mapping™ (S2M™) software November 18th, 2014

FEI Releases New Electronics Failure Analysis Applications for Helios NanoLab DualBeam Portfolio: Dx gas chemistry enables rapid delayering of ICs, while AutoLX advanced automation simplifies sample preparation for transmission electron microscopy November 3rd, 2014

QuantumWise guides the semiconductor industry towards the atomic scale October 24th, 2014

Strengthening thin-film bonds with ultrafast data collection October 23rd, 2014

Chip Technology

SEMATECH to Showcase Innovation and Advances in Manufacturing at SEMICON Japan 2014: SEMATECH experts will share the latest techniques, emerging trends and best practices in advanced manufacturing strategies and methodologies November 26th, 2014

'Giant' charge density disturbances discovered in nanomaterials: Juelich researchers amplify Friedel oscillations in thin metallic films November 26th, 2014

Nanometrics Announces Upcoming Investor Events November 19th, 2014

A novel method for identifying the body’s ‘noisiest’ networks November 19th, 2014

Announcements

SEMATECH to Showcase Innovation and Advances in Manufacturing at SEMICON Japan 2014: SEMATECH experts will share the latest techniques, emerging trends and best practices in advanced manufacturing strategies and methodologies November 26th, 2014

Australian startup creates world’s first 100% cotton hydrophobic T-Shirts November 26th, 2014

The mysterious 'action at a distance' between liquid containers November 26th, 2014

'Giant' charge density disturbances discovered in nanomaterials: Juelich researchers amplify Friedel oscillations in thin metallic films November 26th, 2014

Tools

Renishaw receives Queen's Award for spectroscopy developments November 25th, 2014

JPK reports on the use of AFM and the CellHesion module to study plant cells at the University of Queensland November 25th, 2014

A*STAR SIMTech wins international award for breaking new ground in actuators: SIMTech invention can be used in an array of industries, and is critical for next generation ultra-precision systems November 24th, 2014

Professional AFM Images with a Three Step Click SmartScan by Park Systems Revolutionizes Atomic Force Microscopy by Automatizing the Imaging Process November 24th, 2014

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More












ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE