Nanotechnology Now







Heifer International

Wikipedia Affiliate Button


DHgate

Home > Press > Nanometrics Introduces Next Generation NanoCD™ Suite Advanced Turnkey Solution for OCD Measurement Capability

Abstract:
Nanometrics Incorporated (Nasdaq: NANO), a leading supplier of advanced process control metrology equipment, today announced the release of its latest NanoCD Suite of solutions for optical critical dimension (OCD) metrology. The new NanoCD Suite Version 2.0 greatly enhances the power of OCD analysis for the most demanding process control applications.

Nanometrics Introduces Next Generation NanoCD™ Suite Advanced Turnkey Solution for OCD Measurement Capability

MILPITAS, CA | Posted on March 11th, 2009

The NanoCD Suite Version 2.0 is composed of key components enabling scalable fab-wide OCD metrology solutions, including the NanoGen, NanoMatch, NanoStation, and NanoDiffract. The suite offers industry-proven modeling methods, as well as a next-generation run time engine, comprehensive offline analysis tools and an intuitive user interface for structure definition and modeling. The NanoGen enterprise class server includes scalable resources that can be deployed and shared between numerous users and systems across the NanoCD Suite environment.

Each component of the NanoCD Suite is designed to take full advantage of the inherent connectivity between Nanometrics' wide metrology product portfolio, including standalone Atlas XP and Atlas-M systems for wafer and reticle metrology, as well as the IMPULSE/9010 integrated metrology product portfolio. When combined with the NanoCD Suite, Nanometrics systems have the broadest scatterometry metrology solution for today's semiconductor factories.

"By continually extending our modeling and analysis performance with innovative application methods, we enable our customers to actively control their most critical processing steps," commented Nagesh Avadhany, Vice President of Applications at Nanometrics. "Additionally, demand for applications support is growing beyond traditional CD measurements and now includes measurements on complex structures including films, coatings, epitaxial fill and post-CMP metal damascene structures. Many customers are applying our NanoCD technology for measurements in every sector of the fab, including thin film, CMP, advanced lithography and etch applications on complex 32nm and 22nm node test structures."

Enhancements in NanoDiffract allow users to control their process based on measurements of key parameters directly on DRAM, Flash, and SRAM cells. This measurement capability, along with new development tools, enable process engineers to optimize their metrology recipe and determine sensitivity even before initial wafers are processed. This highly optimized workflow for OCD applications development results in much faster time to results leading to rapid production deployment, higher productivity and lower cost of ownership.

####

About Nanometrics Incorporated
Nanometrics is a leader in the design, manufacture and marketing of high-performance process control metrology systems used primarily in the manufacturing of semiconductors, solar photovoltaics and high-brightness LEDs, as well as by customers in the silicon wafer and data storage industries. Nanometrics’ standalone and integrated metrology systems measure various thin film properties, critical dimensions, overlay control and optical, electrical and material properties, including the structural composition of silicon, compound semiconductor and photovoltaic devices, during various steps of the manufacturing process. These systems enable device manufacturers to improve yields, increase productivity and lower their manufacturing costs. The company maintains its headquarters in Milpitas, California, with sales and service offices worldwide. Nanometrics is traded on NASDAQ Global Market under the symbol NANO.

For more information, please click here

Contacts:
Company Contact:
Kevin Heidrich
408-545-6000 tel
408-232-5910 fax

Copyright © Nanometrics Incorporated

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Software

NanoTecNexus Launches New App for Learning About Nanotechnology—STEM Education Project Spearheaded by Interns February 26th, 2015

News and information

Maximum Precision in 3D Printing: New complete solution makes additive manufacturing standard for microfabrication February 26th, 2015

Real-time observation of bond formation by using femtosecond X-ray liquidography February 26th, 2015

Bruker-Sponsored Sixth AFM BioMed Conference Highlights Increasing Impact of AFM in Biological Applications February 26th, 2015

Graphene shows potential as novel anti-cancer therapeutic strategy: University of Manchester scientists have used graphene to target and neutralise cancer stem cells while not harming other cells February 26th, 2015

Chip Technology

New nanowire structure absorbs light efficiently: Dual-type nanowire arrays can be used in applications such as LEDs and solar cells February 25th, 2015

SUNY Poly CNSE Researchers and Corporate Partners to Present Forty Papers at Globally Recognized Lithography Conference: SUNY Poly CNSE Research Group Awarded Both ‘Best Research Paper’ and ‘Best Research Poster’ at SPIE Advanced Lithography 2015 forum February 25th, 2015

Ultra-thin nanowires can trap electron 'twisters' that disrupt superconductors February 24th, 2015

Silicon Catalyst Announces Partnership With imec to Support Semiconductor Start-Ups February 23rd, 2015

Announcements

Maximum Precision in 3D Printing: New complete solution makes additive manufacturing standard for microfabrication February 26th, 2015

Real-time observation of bond formation by using femtosecond X-ray liquidography February 26th, 2015

Bruker-Sponsored Sixth AFM BioMed Conference Highlights Increasing Impact of AFM in Biological Applications February 26th, 2015

Graphene shows potential as novel anti-cancer therapeutic strategy: University of Manchester scientists have used graphene to target and neutralise cancer stem cells while not harming other cells February 26th, 2015

Tools

Renishaw and Bruker team up for a workshop on TERS and co-localised AFM Raman February 26th, 2015

Maximum Precision in 3D Printing: New complete solution makes additive manufacturing standard for microfabrication February 26th, 2015

Real-time observation of bond formation by using femtosecond X-ray liquidography February 26th, 2015

Bruker-Sponsored Sixth AFM BioMed Conference Highlights Increasing Impact of AFM in Biological Applications February 26th, 2015

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More










ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2015 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE