Nanotechnology Now

Our NanoNews Digest Sponsors



Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > Press > FSI International Receives Follow-on Order for ORION® Single Wafer Cleaning Technology from Major Semiconductor Manufacturer

Abstract:
New cleaning capability will be integrated into manufacturing for BEOL copper/low-k interconnect fabrication

FSI International Receives Follow-on Order for ORION® Single Wafer Cleaning Technology from Major Semiconductor Manufacturer

Minneapolis, MN | Posted on January 7th, 2009

FSI International, Inc. (Nasdaq: FSII) a leading supplier of wafer processing, cleaning and surface conditioning equipment for semiconductor manufacturing, announced today the receipt of an additional order for its new ORION® single wafer cleaning technology from a major semiconductor manufacturer. The follow-on order provides expanded cleaning capacity and capability beyond the original order, announced on December 23, 2008. The additional purchase was motivated by the excellent on-site performance of the currently installed ORION tool. The ORION system will be used in manufacturing for BEOL fabrication of copper/low-k interconnects.

"This order is especially important to us as it validates the use of our ORION technology in manufacturing," said Don Mitchell, FSI's president and CEO. "This customer had initially evaluated our new single wafer technology for BEOL 32nm processes. Their experience with the ORION system's performance was sufficient for them to extend its value to existing manufacturing. The order reassures us that, even in the current industry downturn, our customers are willing to invest in new technology that delivers superior performance and clear economic benefits."

The ORION system's unique closed-chamber design addresses critical path cleaning issues for both FEOL and BEOL advance manufacturing processes. For more information on the FSI ORION system, visit the FSI web site at www.fsi-intl.com/index.php/index.php/applications-and-products/orion-single-wafer-cleaning-cluster.

####

About FSI International, Inc.
FSI International, Inc. is a global supplier of surface conditioning equipment, technology and support services for microelectronics manufacturing. Using the Company’s broad portfolio of cleaning products, which include batch and single wafer platforms for immersion, spray, vapor and CryoKinetic technologies, customers are able to achieve their process performance, flexibility and productivity goals. The Company’s support services programs provide product and process enhancements to extend the life of installed FSI equipment, enabling worldwide customers to realize a higher return on their capital investment.

For more information, please click here

Contacts:
FSI International, Inc.
Trade Media:
Laurie Walker
952-448-8066
or
Financial Media and Investors:
Benno Sand
952-448-8936

Copyright © Business Wire 2008

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Raman Whispering Gallery Detects Nanoparticles September 1st, 2014

A new, tunable device for spintronics: An international team of scientists including physicist Jairo Sinova from the University of Mainz realises a tunable spin-charge converter made of GaAs August 29th, 2014

Nanoscale assembly line August 29th, 2014

New Vice President Takes Helm at CNSE CMOST: Catherine Gilbert To Lead CNSE Children’s Museum of Science and Technology Through Expansion And Relocation August 29th, 2014

Chip Technology

New analytical technology reveals 'nanomechanical' surface traits August 29th, 2014

Fonon Announces 3D Metal Sintering Technology: Emerging Additive Nano Powder Manufacturing Technology August 28th, 2014

RMIT delivers $30m boost to micro and nano-tech August 26th, 2014

Competition for Graphene: Berkeley Lab Researchers Demonstrate Ultrafast Charge Transfer in New Family of 2D Semiconductors August 26th, 2014

Announcements

Raman Whispering Gallery Detects Nanoparticles September 1st, 2014

Nanoscale assembly line August 29th, 2014

New analytical technology reveals 'nanomechanical' surface traits August 29th, 2014

New Vice President Takes Helm at CNSE CMOST: Catherine Gilbert To Lead CNSE Children’s Museum of Science and Technology Through Expansion And Relocation August 29th, 2014

Tools

Raman Whispering Gallery Detects Nanoparticles September 1st, 2014

New analytical technology reveals 'nanomechanical' surface traits August 29th, 2014

Ultra-Low Frequency Vibration Isolation Stabilizes Scanning Tunneling Microscopy at UCLA’s Nano-Research Group August 28th, 2014

Measure Both Elastic and Viscous Properties with AFM Using Asylum Research’s Exclusive AM-FM Viscoelastic Mapping Mode August 28th, 2014

New-Contracts/Sales/Customers

East China University of Science and Technology Purchases Nanonex Advanced Nanoimprint Tool NX-B200 July 30th, 2014

University of Manchester selects Anasys AFM-IR for coatings and corrosion research July 30th, 2014

STFC takes delivery of the 100th Hitachi Tabletop SEM in the UK July 3rd, 2014

University of Maastricht Adds Complete Correlative Workflow from FEI to its Institute of Nanoscopy June 23rd, 2014

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More














ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE