Nanotechnology Now

Our NanoNews Digest Sponsors





Heifer International

Wikipedia Affiliate Button


DHgate

Home > Press > Cadence Custom Lithography Technology Addresses 22-Nanometer Semiconductor Manufacturing: Custom Source Mask Optimization Solution Delivers Superior P

Abstract:
Cadence Design Systems, Inc. (NASDAQ: CDNS), the leader in global electronic design innovation, today announced the availability of software that optimizes custom lithographic source illumination, a new capability in its integrated source mask optimization (SMO) technology family for IC manufacturing at 22 nanometers and beyond. Optimized custom litho source illumination delivers the superior process window and improved two-dimensional image fidelity required for 22-nanometer semiconductor manufacturing.

Cadence Custom Lithography Technology Addresses 22-Nanometer Semiconductor Manufacturing: Custom Source Mask Optimization Solution Delivers Superior P

San Jose, CA | Posted on October 8th, 2008

Cadence® collaborated with Tessera Technologies, Inc. (NASDAQ: TSRA) to incorporate the custom source illumination manufacturing awareness into its SMO software technology family. The new capability is integrated into the Cadence resolution enhancement technology (RET) flow for both single- and double-patterning lithography, and it delivers exceptional ease of use and automation to accelerate both technology development and production ramps.

"The flexibility to take full advantage of diffractive optical elements is essential to achieving high yields at the 22nm node," said Michael Bereziuk, executive vice president of Imaging & Optics at Tessera. "Tessera is pleased to work with Cadence to provide solutions to the SMO challenge that utilize our full design expertise and ten years of experience with off-axis illumination."

The collaboration between Cadence and Tessera focuses on Tessera's DigitalOptics™ technologies, which enable one of the broadest range of control available today, providing conventional, gray-tone, and free-form litho source illumination. Effective source mask optimization requires that the full degrees of freedom and actual constraints of the illumination design are incorporated into the design algorithms. Incorporating these more advanced models into the Cadence SMO software provides powerful new capabilities to the entire user community.

At 22 nanometers and below, conventional computational lithography techniques such as model-based OPC and the existing range of RETs are not sufficient to deliver the required silicon pattern fidelity. The Cadence source mask optimization technology enables more accurate computational lithography assessments and tradeoffs that improve pattern fidelity and enable increased product yield. This is accomplished by taking into account the RET/OPC recipes and models, mask manufacturability rules, polarization pattern in the lens pupil, Jones matrix of the projection lens, optical parameters of the resist stack, resist diffusion, and other key factors.

A key differentiation of the Cadence technology is its ability to optimize the litho source illumination based on the printability of two-dimensional layout structures through a process window, rather than just through critical dimension (CD) requirements of the design. The Cadence source mask optimization solution is also applicable to both conventional and free-form illumination patterns.

"We're going beyond traditional DFM to a co-optimized design and manufacturing approach with this collaboration," said Dr. Dipu Pramanik, vice president of silicon signoff and optimization at Cadence. "This collaboration with Tessera will help our customers quickly achieve their computational lithography implementation and technology entitlement goals thereby reducing their overall cost of ownership."

####

About Cadence Design Systems, Inc.
Cadence enables global electronic design innovation and plays an essential role in the creation of today's integrated circuits and electronics. Customers use Cadence software and hardware, methodologies, and services to design and verify advanced semiconductors, consumer electronics, networking and telecommunications equipment, and computer systems. Cadence reported 2007 revenues of approximately $1.6 billion, and has approximately 5,100 employees. The company is headquartered in San Jose, Calif., with sales offices, design centers, and research facilities around the world to serve the global electronics industry.

Cadence is a registered trademark and the Cadence logo is a trademark of Cadence Design Systems, Inc. in the United States and other countries. DigitalOptics is a trademark of Tessera Inc. All other trademarks are the property of their respective owners.

For more information, please click here

Contacts:
Dan Holden
Cadence Design Systems, Inc.
408-944-7457

Copyright © Marketwire

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Multi-million pound project to use nanotechnology to improve safety September 4th, 2015

Magnetic wormhole connecting 2 regions of space created for the first time: The device could have applications in medicine, opening up ways to make MRIs more comfortable for patients September 4th, 2015

Tongfang Global and QD Vision Partner to Bring Wide Color Gamut to Global Television Lines: Color IQTM quantum dots help boost company’s focus on superior color reproduction September 3rd, 2015

QEOS and GLOBALFOUNDRIES to Offer Industry’s First CMOS Platform for MillimeterWave Markets: GLOBALSOLUTIONSSM Partnership will enable next-generation wireless technologies for applications in IoT, 5G and automotive September 3rd, 2015

Software

High Precision, High Stability XYZ Microscope Stages, with Capacitive Feedback August 18th, 2015

Setting ground rules for nanotechnology research: Two new projects set the stage for nanotechnology research to move into Big Data August 18th, 2015

AIS Introduces Industry 4.0 Ready, Industrial Controls and Factory Automation HMI Touch-Panels, for Easy Visual, Control and Monitoring in Discrete and Process Automation Industries June 15th, 2015

New JEOL E-Beam Lithography System to Enhance Quantum NanoFab Capabilities May 6th, 2015

Chip Technology

GLOBALFOUNDRIES and Catena Partner to Provide Next-Generation RF Connectivity Solutions for Growing Wireless Markets: Catena Wi-Fi and Bluetooth RF technologies available on GLOBALFOUNDRIES 28nm Super Low Power Process technology September 3rd, 2015

For 2-D boron, it's all about that base: Rice University theorists show flat boron form would depend on metal substrates September 2nd, 2015

Phagraphene, a 'relative' of graphene, discovered September 2nd, 2015

Nanometrics to Participate in the Citi 2015 Global Technology Conference August 26th, 2015

Announcements

Multi-million pound project to use nanotechnology to improve safety September 4th, 2015

Magnetic wormhole connecting 2 regions of space created for the first time: The device could have applications in medicine, opening up ways to make MRIs more comfortable for patients September 4th, 2015

Making nanowires from protein and DNA September 3rd, 2015

Making fuel from light: Argonne research sheds light on photosynthesis and creation of solar fuel September 3rd, 2015

Printing/Lithography/Inkjet/Inks

Silk bio-ink could help advance tissue engineering with 3-D printers September 2nd, 2015

These microscopic fish are 3-D-printed to do more than swim: Researchers demonstrate a novel method to build microscopic robots with complex shapes and functionalities August 26th, 2015

New research may enhance display & LED lighting technology: Large-area integration of quantum dots and photonic crystals produce brighter and more efficient light August 9th, 2015

Spintronics: Molecules stabilizing magnetism: Organic molecules fixing the magnetic orientation of a cobalt surface/ building block for a compact and low-cost storage technology/ publication in Nature Materials July 25th, 2015

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







Car Brands
Buy website traffic