Nanotechnology Now

Our NanoNews Digest Sponsors





Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > Press > Cadence Custom Lithography Technology Addresses 22-Nanometer Semiconductor Manufacturing: Custom Source Mask Optimization Solution Delivers Superior P

Abstract:
Cadence Design Systems, Inc. (NASDAQ: CDNS), the leader in global electronic design innovation, today announced the availability of software that optimizes custom lithographic source illumination, a new capability in its integrated source mask optimization (SMO) technology family for IC manufacturing at 22 nanometers and beyond. Optimized custom litho source illumination delivers the superior process window and improved two-dimensional image fidelity required for 22-nanometer semiconductor manufacturing.

Cadence Custom Lithography Technology Addresses 22-Nanometer Semiconductor Manufacturing: Custom Source Mask Optimization Solution Delivers Superior P

San Jose, CA | Posted on October 8th, 2008

Cadence® collaborated with Tessera Technologies, Inc. (NASDAQ: TSRA) to incorporate the custom source illumination manufacturing awareness into its SMO software technology family. The new capability is integrated into the Cadence resolution enhancement technology (RET) flow for both single- and double-patterning lithography, and it delivers exceptional ease of use and automation to accelerate both technology development and production ramps.

"The flexibility to take full advantage of diffractive optical elements is essential to achieving high yields at the 22nm node," said Michael Bereziuk, executive vice president of Imaging & Optics at Tessera. "Tessera is pleased to work with Cadence to provide solutions to the SMO challenge that utilize our full design expertise and ten years of experience with off-axis illumination."

The collaboration between Cadence and Tessera focuses on Tessera's DigitalOptics™ technologies, which enable one of the broadest range of control available today, providing conventional, gray-tone, and free-form litho source illumination. Effective source mask optimization requires that the full degrees of freedom and actual constraints of the illumination design are incorporated into the design algorithms. Incorporating these more advanced models into the Cadence SMO software provides powerful new capabilities to the entire user community.

At 22 nanometers and below, conventional computational lithography techniques such as model-based OPC and the existing range of RETs are not sufficient to deliver the required silicon pattern fidelity. The Cadence source mask optimization technology enables more accurate computational lithography assessments and tradeoffs that improve pattern fidelity and enable increased product yield. This is accomplished by taking into account the RET/OPC recipes and models, mask manufacturability rules, polarization pattern in the lens pupil, Jones matrix of the projection lens, optical parameters of the resist stack, resist diffusion, and other key factors.

A key differentiation of the Cadence technology is its ability to optimize the litho source illumination based on the printability of two-dimensional layout structures through a process window, rather than just through critical dimension (CD) requirements of the design. The Cadence source mask optimization solution is also applicable to both conventional and free-form illumination patterns.

"We're going beyond traditional DFM to a co-optimized design and manufacturing approach with this collaboration," said Dr. Dipu Pramanik, vice president of silicon signoff and optimization at Cadence. "This collaboration with Tessera will help our customers quickly achieve their computational lithography implementation and technology entitlement goals thereby reducing their overall cost of ownership."

####

About Cadence Design Systems, Inc.
Cadence enables global electronic design innovation and plays an essential role in the creation of today's integrated circuits and electronics. Customers use Cadence software and hardware, methodologies, and services to design and verify advanced semiconductors, consumer electronics, networking and telecommunications equipment, and computer systems. Cadence reported 2007 revenues of approximately $1.6 billion, and has approximately 5,100 employees. The company is headquartered in San Jose, Calif., with sales offices, design centers, and research facilities around the world to serve the global electronics industry.

Cadence is a registered trademark and the Cadence logo is a trademark of Cadence Design Systems, Inc. in the United States and other countries. DigitalOptics is a trademark of Tessera Inc. All other trademarks are the property of their respective owners.

For more information, please click here

Contacts:
Dan Holden
Cadence Design Systems, Inc.
408-944-7457

Copyright © Marketwire

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

'Exotic' material is like a switch when super thin April 18th, 2014

Innovative strategy to facilitate organ repair April 18th, 2014

Oxford Instruments Asylum Research Introduces the MFP-3D InfinityTM AFM Featuring Powerful New Capabilities and Stunning High Performance April 18th, 2014

Conductive Inks: booming to $2.8 billion by 2024 April 17th, 2014

Software

Lumerical files a provisional patent that extends the standard eigenmode expansion propagation technique to better address waveguide component design. Lumerical’s EME propagation tool will address a wide set of waveguide applications in silicon photonics and integrated optics April 16th, 2014

New Integrated Raman Spectroscopy & Imaging Software from CRAIC Technologies: CRAIC Technologies introduces Lambdafire-R™ integrated Raman microspectroscopy & imaging software for Windows 8 ® March 26th, 2014

First methodology to analyse nanometer line pattern images March 18th, 2014

Agilent Technologies to Demonstrate New PXI Functional Test System at IPC APEX EXPO March 17th, 2014

Chip Technology

'Exotic' material is like a switch when super thin April 18th, 2014

Scientists open door to better solar cells, superconductors and hard-drives: Research enhances understanding of materials interfaces April 14th, 2014

Obducat has launched a new generation of SINDRE® Nano Imprint production system April 11th, 2014

Scientists in Singapore develop novel ultra-fast electrical circuits using light-generated tunneling currents April 10th, 2014

Announcements

'Exotic' material is like a switch when super thin April 18th, 2014

Innovative strategy to facilitate organ repair April 18th, 2014

Oxford Instruments Asylum Research Introduces the MFP-3D InfinityTM AFM Featuring Powerful New Capabilities and Stunning High Performance April 18th, 2014

Transparent Conductive Films and Sensors Are Hot Segments in Printed Electronics: Start-ups in these fields show above-average momentum, while companies working on emissive displays such as OLED are fading, Lux Research says April 17th, 2014

Printing/Lithography/Inkjet

Conductive Inks: booming to $2.8 billion by 2024 April 17th, 2014

Transparent Conductive Films and Sensors Are Hot Segments in Printed Electronics: Start-ups in these fields show above-average momentum, while companies working on emissive displays such as OLED are fading, Lux Research says April 17th, 2014

Obducat has launched a new generation of SINDRE® Nano Imprint production system April 11th, 2014

Printed Electronics Europe - Plastic Logic shows a flexible OLED display for wearable devices April 11th, 2014

NanoNews-Digest
The latest news from around the world, FREE







  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More














ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE