Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > Press > SUSS MicroTec Announces 300 mm ProbeShield System Order: ProbeShield® Technology Chosen over Competition in Head-to-Head Comparison at Major Asian Me

Abstract:
SUSS MicroTec Test Systems has announced that it has received an order for the PA300PS with ProbeShield® Technology, the 300 mm wafer-level probe system for device characterization and reliability test, from a major Asian semiconductor memory manufacturer.

SUSS MicroTec Announces 300 mm ProbeShield System Order: ProbeShield® Technology Chosen over Competition in Head-to-Head Comparison at Major Asian Me

DRESDEN, Germany | Posted on September 4th, 2008

The decision follows a six-month, head-to-head comparison against the incumbent and major competition for wafer-level test solutions at the manufacturer's facilities. During this time, several benchmarking activities were undertaken. These consisted mainly of advanced tests of semiconductor devices, such as flicker noise, I-V, C-V and S-parameter measurements, which are used to extract critical parameters in the device design and process control phases. SUSS MicroTec's ProbeShield Technology consistently outperformed the competitive solutions, leading to its ultimate selection.

"The engineers at the manufacturer chose ProbeShield Technology due to the superior measurement results and significant time savings the advanced feature sets provide," said Rob Carter, Vice President of Marketing and Sales for SUSS MicroTec Test Systems. "They were particularly impressed with the unattended test capabilities that are provided with the unique Automated Thermal Management™ (ATM) and ReAlign™ functions."

The ATM and ReAlign features enable test procedures to run through the night and weekends at multiple temperature settings without operator intervention to re-align the probe tips to the test pads on the wafer each time temperature changes.

####

About SUSS MicroTec Test Systems
SUSS MicroTec Test Systems GmbH is a part of the SUSS MicroTec group listed in Deutsche Börse AG’s Prime Standard.

SUSS MicroTec is one of the world’s leading suppliers of process and testing solutions for markets such as 3D Integration, advanced packaging, MEMS, nanotechnology and compound semiconductor. SUSS MicroTec enables its customers to increase process performance while reducing cost of ownership and to meet the volume requirements of fast growing markets with high quality solutions.

SUSS MicroTec supports more than 8,000 installed mask aligners, coaters, bonders and probe systems with a global infrastructure for applications and service. Headquartered in Garching near Munich, Germany, SUSS MicroTec employs more than 730 employees worldwide.

All statements in this release other than historical facts are forward-looking statements within the meaning of U.S. Private Securities Litigation Reform Act of 1995. Words such as "believe", "expect", "intend", "anticipate", "estimate", "should", "may", "will", "plan" and similar words and terms used in relation to the enterprise are meant to indicate forward-looking statements of this kind. The company accepts no obligation toward the general public to update or correct forward-looking statements. All forward-looking statements are subject to various risks and uncertainties, as a result of which actual events may diverge numerically from expectations. The forward-looking statements reflect the view at the time they were made.

For more information, please click here

Contacts:
SUSS MicroTec Test Systems
Joshua M. Preston, Marketing Group Manager
Tel: +49 (0) 35240 73-0

Copyright © Business Wire 2008

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

A nano-roundabout for light December 10th, 2016

Keeping electric car design on the right road: A closer look at the life-cycle impacts of lithium-ion batteries and proton exchange membrane fuel cells December 9th, 2016

Further improvement of qubit lifetime for quantum computers: New technique removes quasiparticles from superconducting quantum circuits December 9th, 2016

Scientists track chemical and structural evolution of catalytic nanoparticles in 3-D: Up-close, real-time, chemical-sensitive 3-D imaging offers clues for reducing cost/improving performance of catalysts for fuel-cell-powered vehicles and other applications December 8th, 2016

Chip Technology

A nano-roundabout for light December 10th, 2016

Further improvement of qubit lifetime for quantum computers: New technique removes quasiparticles from superconducting quantum circuits December 9th, 2016

Chemical trickery corrals 'hyperactive' metal-oxide cluster December 8th, 2016

Leti IEDM 2016 Paper Clarifies Correlation between Endurance, Window Margin and Retention in RRAM for First Time: Paper Presented at IEDM 2016 Offers Ways to Reconcile High-cycling Requirements and Instability at High Temperatures in Resistive RAM December 6th, 2016

Announcements

A nano-roundabout for light December 10th, 2016

Keeping electric car design on the right road: A closer look at the life-cycle impacts of lithium-ion batteries and proton exchange membrane fuel cells December 9th, 2016

Further improvement of qubit lifetime for quantum computers: New technique removes quasiparticles from superconducting quantum circuits December 9th, 2016

Chemical trickery corrals 'hyperactive' metal-oxide cluster December 8th, 2016

New-Contracts/Sales/Customers

Cetim Facility Receives Bruker Contour CMM Dimensional Analysis System: New Optical Coordinate Measurement Technology Enables High-Precision 3D Scanning November 16th, 2016

Industrial Nanotech, Inc. Announces Plans to Spin Off New Product Line to Major Paint Compan November 9th, 2016

Leti Provides New Low-noise Image Technology to French SME PYXALIS; Will Be Demonstrated at Vision 2016 in Stuttgart November 3rd, 2016

DryWired's Liquid Nanotint to be the first nano-insulation in a Federal building: 250,000 federal buildings, most with uninsulated glass October 12th, 2016

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project