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Home > News > Industrial scale nanotechnology fabrication techniques take shape

November 12th, 2007

Industrial scale nanotechnology fabrication techniques take shape

Abstract:
Fundamental nanotechnology research in laboratories advances rapidly, as witnessed by the hundreds of new research papers that get published every month. The big bottleneck in getting these new technologies from the lab translated into commercial products is the lack of suitable large-scale fabrication techniques. Almost all laboratory experiments involve elaborate set-ups and are quite tricky processes that require a lot of skill and expertise on part of the researchers. To a large degree, nanotechnology today is more an art than a basis for industrial technologies. Think about a 15th century monk spending 10 years painstakingly writing and painting a single bible - that's where nanotechnology is today; but where we need to get to is something that resembles modern high speed printing machines where you print thousands of books an hour. Take for instance nanowires. Researchers have used nanowires to create transistors like those used in memory devices and prototype sensors for gases or biomolecules. A common approach in the lab is to grow nanowires like blades of grass on a suitable substrate, mow them off and mix them in a fluid to transfer them to a test surface, using some method to give them a preferred orientation. When the carrier fluid dries, the nanowires are left behind like tumbled jackstraws. Using scanning probe microscopy or similar tools, researchers hunt around for a convenient, isolated nanowire to work on, or place electrical contacts without knowing the exact positions of the nanowires. It's not a technique suitable for mass production. However, researchers have now developed a technique that allows them to selectively grow nanowires on sapphire wafers in specific positions and orientations accurately enough to attach contacts and layer other circuit elements, all with conventional lithography techniques. This fabrication method requires a minimum number of steps and is compatible with today's microelectronics industry.

Source:
nanowerk.com

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