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April 3rd, 2007
Less than six months after taking delivery of the first full-field, extreme-ultraviolet alpha demo tool (EUV ADT), the College of Nanoscale Science and Engineering at the University at Albany (UAlbany) has produced the first exposed images while using it in a development environment.
The $65 million EUV ADT, developed by Netherlands-based ASML Holding NV, a supplier of advanced lithography tools, will be essential in development of the infrastructure for EUV lithography and is considered the most likely technology for insertion into manufacturing as early as the 32-nm computer chip device node, based on cost-effectiveness and ability to extend to future nodes, according to ASML.
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