Nanotechnology Now - News Story: "ASML pushes EUV for sub 22nm lithography"

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September 13th, 2006

ASML pushes EUV for sub 22nm lithography

Abstract:
ASML has reiterated its positive outlook for extreme ultraviolet (EUV) as the mainstream lithography light source when going to deep submicron production.

Source:
digitimes.com

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