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Structured Materials Industries, Inc. (SMI) reports that it has received a Phase II SBIR from the DTRA to make FPGAs using a proprietary ferroelectric material. Structured Materials Industries, Inc. (SMI) has developed a new ferroelectric that is compatible with silicon interfaces using its own Metal Organic Chemical Vapor Deposition (MOCVD) tool technology. This film has been deposited as a replacement for the traditional silicon dioxide gate dielectric in a silicon metal-oxide-semiconductor process.
About Structured Materials Industries:
For more information, please click here.Contact:
Dr. Gary S. Tompa
Structured Materials Industries, Inc.
Unit 102/103, 201 Circle Drive N.
Piscataway, New Jersey 08854
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