Home > News > Unaxis unveils production solution enabling 45nm
April 28th, 2006
Unaxis unveils production solution enabling 45nm
Abstract:
The latest process innovations demonstrate sub-3nm CD uniformity in Cr etch and 2 degree phase uniformity for advanced Quartz mask - enabling the manufacture of 45nm photomasks.
Source:
euroasiasemiconductor.com
Related News Press |
Chip Technology
New chip opens door to AI computing at light speed February 16th, 2024
HKUST researchers develop new integration technique for efficient coupling of III-V and silicon February 16th, 2024
NRL discovers two-dimensional waveguides February 16th, 2024
Nanoelectronics
Interdisciplinary: Rice team tackles the future of semiconductors Multiferroics could be the key to ultralow-energy computing October 6th, 2023
Key element for a scalable quantum computer: Physicists from Forschungszentrum Jülich and RWTH Aachen University demonstrate electron transport on a quantum chip September 23rd, 2022
Reduced power consumption in semiconductor devices September 23rd, 2022
Atomic level deposition to extend Moore’s law and beyond July 15th, 2022
Announcements
What heat can tell us about battery chemistry: using the Peltier effect to study lithium-ion cells March 8th, 2024
Nanoscale CL thermometry with lanthanide-doped heavy-metal oxide in TEM March 8th, 2024
The latest news from around the world, FREE | ||
Premium Products | ||
Only the news you want to read!
Learn More |
||
Full-service, expert consulting
Learn More |
||