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Home > News > Unaxis unveils production solution enabling 45nm

April 28th, 2006

Unaxis unveils production solution enabling 45nm

Abstract:
The latest process innovations demonstrate sub-3nm CD uniformity in Cr etch and 2 degree phase uniformity for advanced Quartz mask - enabling the manufacture of 45nm photomasks.

Source:
euroasiasemiconductor.com

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