- About Us
- Career Center
- Nano-Social Network
- Nano Consulting
- My Account
February 20th, 2006
IBM Research has come up with a way to draw lines in silicon 29.9 nanometers apart with existing chipmaking machines, far closer than on today's chips, a development that could help cut the cost of making chips in the future.
The breakthrough revolves around an enhanced, experimental version of immersion lithography. In immersion lithography, silicon wafers are immersed in purified water. Laser light shining through an intricate mask throws a microscopic shadow pattern onto the wafer, which then becomes permanent through chemical processes similar to the process in which a negative becomes a photographic print. The more intricate the pattern, the smaller the circuits.
|Related News Press|
Nanometrics to Participate in the Citi 2015 Global Technology Conference August 26th, 2015
A little light interaction leaves quantum physicists beaming August 25th, 2015
'Quantum dot' technology may help light the future August 19th, 2015
Better together: Graphene-nanotube hybrid switches August 3rd, 2015
Draw out of the predicted interatomic force August 30th, 2015
A new technique to make drugs more soluble August 28th, 2015