Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > News > Group claims breakthrough in EUV

December 9th, 2005

Group claims breakthrough in EUV

Abstract:
EUV lithography is a likely next-generation chip processing technology, based on 13-nm wavelength illumination, allowing chip makers to print features sizes of 32-nm and below on integrated circuits.

Source:
EETimes

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Chip Technology

Physicists develop new recipes for design of fast single-photon gun Physicists develop high-speed single-photon sources for quantum computers of the future September 21st, 2017

GLOBALFOUNDRIES and Soitec Enter Into Long-term Supply Agreement on FD-SOI Wafers: Strategic milestone to help guarantee a secure, high-volume supply of FD-SOI technology September 20th, 2017

GLOBALFOUNDRIES Announces Availability of mmWave and RF/Analog on Leading FDX™ FD-SOI Technology Platform: Technology solution delivers ‘connected intelligence’ to next generation high-volume wireless and IoT applications with lower power and significantly reduced cost September 20th, 2017

GLOBALFOUNDRIES Delivers Custom 14nm FinFET Technology for IBM Systems: Jointly developed 14HP process is world’s only technology that leverages both FinFET and SOI September 20th, 2017

Nanoelectronics

GLOBALFOUNDRIES Introduces New 12nm FinFET Technology for High-Performance Applications September 20th, 2017

Bit data goes anti-skyrmions September 1st, 2017

Ames Laboratory scientists move graphene closer to transistor applications August 30th, 2017

GLOBALFOUNDRIES Demonstrates 2.5D High-Bandwidth Memory Solution for Data Center, Networking, and Cloud Applications: Solution leverages 2.5D packaging with low-latency, high-bandwidth memory PHY built on FX-14™ ASIC design system August 9th, 2017

Announcements

Physicists develop new recipes for design of fast single-photon gun Physicists develop high-speed single-photon sources for quantum computers of the future September 21st, 2017

GLOBALFOUNDRIES Delivers Custom 14nm FinFET Technology for IBM Systems: Jointly developed 14HP process is world’s only technology that leverages both FinFET and SOI September 20th, 2017

GLOBALFOUNDRIES Introduces New 12nm FinFET Technology for High-Performance Applications September 20th, 2017

Copper catalyst yields high efficiency CO2-to-fuels conversion: Berkeley Lab scientists discover critical role of nanoparticle transformation September 20th, 2017

Tools

Graphene based terahertz absorbers: Printable graphene inks enable ultrafast lasers in the terahertz range September 13th, 2017

Chemical hot spots: Scanning tunneling microscopy measurements identify active sites on catalyst surfaces September 7th, 2017

Phenom-World selects Deben to supply a tensile stage as an accessory to their range of desktop SEMs August 29th, 2017

New results reveal high tunability of 2-D material: Berkeley Lab-led team also provides most precise band gap measurement yet for hotly studied monolayer moly sulfide August 26th, 2017

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project