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Home > News > Litho magnification ratio unlikely to change at 32 nm

September 30th, 2005

Litho magnification ratio unlikely to change at 32 nm

Abstract:
Lithography photomasks are likely to continue to rely on the current standard 4X magnification and 26-millimeter field size through the 32-nanometer node, according to a consensus of semiconductor equipment suppliers and manufactures at a recent Sematech-sponsored workshop.

Source:
EETimes

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