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Home > News > Nanoimprint litho makes its mark at SPIE

April 17th, 2005

Nanoimprint litho makes its mark at SPIE

Abstract:
At the SPIE Microlithography conference in California, vendors rolled out tools that are said to have higher throughput, better alignment and astounding resolution—below 10nm—at price points far below those of optical scanners. Nanoimprint tools sell for as little as $100,000, compared with $18 million to $25 million for the latest 193nm optical machines.

Source:
* EETimes

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