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Home > News > IMEC AND KLA-Tencor Partner in Sub-65-nm Lithography

October 7th, 2004

IMEC AND KLA-Tencor Partner in Sub-65-nm Lithography

Abstract:
KLA-Tencor and IMEC, Europe's leading independent nanoelectronics and nanotechnology research center based in Belgium, today announced that they have entered into a joint-development project (JDP) to accelerate the adoption of optical critical dimension (CD) metrology technology for next-generation
(65-nm and below) semiconductor applications.

Source:
prnewswire

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