Nanotechnology Now

Our NanoNews Digest Sponsors





Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > News > KLA-Tencor Introduces

June 24th, 2004

KLA-Tencor Introduces

Abstract:
KLA-Tencor today unveiled the AF-LM 300-the first true line monitoring solution for trench depth and surface planarity process control based on atomic force microscopy (AFM). Until now, traditional AFMs have lacked the throughput and reliability needed for many inline process monitoring applications.

Source:
PRNewswire

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Tools

EPFL Research on the use of AFM based nanoscale IR spectroscopy for the study of single amyloid molecules wins poster competition at Swiss Physics Society meeting July 22nd, 2014

The Hiden EQP Plasma Diagnostic with on-board MCA July 22nd, 2014

Nanometrics Announces Upcoming Investor Events July 22nd, 2014

Bruker Awarded Fourth PeakForce Tapping Patent: AFM Mode Uniquely Combines Highest Resolution Imaging and Material Property Mapping July 22nd, 2014

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More














ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE