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Home > News > KLA-Tencor Introduces

June 24th, 2004

KLA-Tencor Introduces

Abstract:
KLA-Tencor today unveiled the AF-LM 300-the first true line monitoring solution for trench depth and surface planarity process control based on atomic force microscopy (AFM). Until now, traditional AFMs have lacked the throughput and reliability needed for many inline process monitoring applications.

Source:
PRNewswire

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