Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > News > KLA-Tencor Introduces

June 24th, 2004

KLA-Tencor Introduces

Abstract:
KLA-Tencor today unveiled the AF-LM 300-the first true line monitoring solution for trench depth and surface planarity process control based on atomic force microscopy (AFM). Until now, traditional AFMs have lacked the throughput and reliability needed for many inline process monitoring applications.

Source:
PRNewswire

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Tools

Scientists from the University of Manchester and Diamond Light Source work with Deben to develop and test a new compression stage to study irradiated graphite at elevated temperatures August 15th, 2017

FRITSCH Milling and Sizing! Innovations at POWTECH 2017 - Hall 2 Stand 227 August 9th, 2017

Thermo Fisher Scientific Advances Cryo-EM Leadership to Drive Structural Biology Discoveries: New Thermo Scientific Krios G3i raises bar for performance, automation and time-to-results Breakthrough Thermo Scientific Glacios provides a cryo-EM entry path for a broader range of res August 8th, 2017

New Quattro Field Emission ESEM Emphasizes Versatility and Ease of Use: Thermo Scientific Quattro ESEM allows materials science researchers to study nanoscale structure in almost any material under a range of environmental conditions August 8th, 2017

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project