Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > News > Nanometrics Announces Integration of NanoOCD

February 17th, 2004

Nanometrics Announces Integration of NanoOCD

Abstract:
Nanometrics, Inc. today announced that it has entered into an integrated metrology agreement with Lam Research Corporation. Under the agreement, Lam has integrated a Nanometrics' NanoOCD/DUV 9010b film thickness mapping module into a CMP tool for post copper CMP erosion, oxide thickness and residue measurements. The NanoOCD/DUV 9010b has been qualified by Lam for monitoring of dielectric film thickness, erosion and copper residue.

Source:
Businesswire

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Tools

New method enables high-resolution measurements of magnetism February 7th, 2018

Nanometrics Selected for Fab-Wide Process Control Metrology by Domestic China 3D-NAND Manufacturer: Latest Fab Win Includes Comprehensive Suite for Substrate, Thin Film and Critical Dimension Metrology February 7th, 2018

A new radiation detector made from graphene: A new bolometer exploits the thermoelectric properties of graphene February 6th, 2018

Measuring the temperature of two-dimensional materials at the atomic level February 3rd, 2018

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project