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Home > News > RIT Researchers Develop Next-Gen Image-Resolution Technology

January 26th, 2004

RIT Researchers Develop Next-Gen Image-Resolution Technology

A team of researchers at Rochester Institute of Technology has developed the ability to use optical microlithography to produce semiconductor device geometry as small as 38 nanometers. The team, led by Bruce Smith, Intel Professor of Microelectronic Engineering and associate dean of the Kate Gleason College of Engineering, used a prototype liquid immersion nanolithography tool developed at RIT.


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