Nanotechnology Now

Our NanoNews Digest Sponsors
Heifer International

Wikipedia Affiliate Button

Home > Press > SEMATECH Reports Significant Progress in EUV Resist Outgas Testing: Technologists from SEMATECH and JSR demonstrate outgas test results that further enable EUV lithography for high-volume manufacturing readiness

Abstract:
SEMATECH announced today that promising progress has been made in qualifying outgassing specifications for extreme ultraviolet (EUV) lithography. As the first to certify a resist family using witness sample-based resist outgas testing, this achievement has the potential to realize substantial cost savings by significantly improving the resist learning cycle.

SEMATECH Reports Significant Progress in EUV Resist Outgas Testing: Technologists from SEMATECH and JSR demonstrate outgas test results that further enable EUV lithography for high-volume manufacturing readiness

Albany, NY | Posted on December 3rd, 2014

The reduction of EUV resist outgassing to minimize or prevent possible contamination of EUV exposure tools is critical to the development of EUV resists. Therefore, it is vital that resist chemistries meet stringent outgassing specifications before being used in an EUV scanner. Today, however, the resist learning cycle is excessively long and inefficient due in part to the lengthy outgas tests that resist material formulations must undergo before being subjected to exposure in a production EUV scanner.

In a joint collaboration with the JSR Corporation, SEMATECH has experimentally proven an improved evaluation method that reduces the amount of testing of commercial EUV resists from every formulation to just three samples per family. The results confirm that the concentration of the major components in a resist can be varied without the need for requalification, which can result in a potential savings of few hundred outgas tests for each resist family.

"In mutual effort to develop leading-edge resists and materials, and accelerate optimized processes for EUV high-volume manufacturing, JSR and SEMATECH have made significant progress in identifying solutions for key outgassing issues," said Tooru Kimura, General Manager of Semiconductor Materials Laboratory at JSR. "Through sophisticated process capabilities, the goal of our work is to discover new materials for the next generation EUV exposure tools that further stimulates resist development by enabling a more efficient way for outgas testing."

"In order to ensure the affordable evolution of state-of-the-art lithography technologies, it is critical to predict a material's outgassing level and understand the link between performance and resist outgassing," said Kevin Cummings, SEMATECH's Director of Lithography. "SEMATECH has been working with JSR over the last several months to make sure all test procedures meet industry guidelines for outgas testing. Now we are able to reduce the sample tests per each resist family for all resist suppliers, further enabling the infrastructure that will afford cost-effective EUV manufacturing."

Over the past decade, SEMATECH has reduced resist and materials development cycle time by providing the industry access to successive generations of small field exposure tools. SEMATECH's projects have succeeded in measuring the outgassing characteristics in hundreds of EUV resists and materials formulations, and delivering thousands of EUV exposure shifts to member companies to evaluate tens of thousands of materials formulations.

####

About SEMATECH
For over 25 years, SEMATECH®, the international consortium of leading semiconductor device, equipment, and materials manufacturers, has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Through our unwavering commitment to foster collaboration across the nanoelectronics industry, we help our members and partners address critical industry transitions, drive technical consensus, pull research into the industry mainstream, improve manufacturing productivity, and reduce risk and time to market. Information about SEMATECH can be found at www.sematech.org. Twitter: www.twitter.com/sematech

About JSR Corporation

Tokyo based JSR Corporation is an advanced manufacturer in polymer chemistry, it operates a wide range of global businesses ranging from the petrochemical business, including the manufacture of synthetic rubber, to the cutting-edge information and electronic materials business, including the manufacture of semiconductor materials and liquid crystal display materials. For more information, visit www.jsr.co.jp.

For more information, please click here

Contacts:
Erica McGill
Marketing Communications
O: 518-649-1041

Copyright © SEMATECH

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

NUS researchers develop stretchable, self-healing and illuminating material for ‘invincible’ light-emitting devices: Promising applications include damage-proof flexible display screens and illuminating electronic skin for autonomous soft robots May 31st, 2020

The concept of creating «brain-on-chip» revealed: A team of scientists is working to create brain-like memristive systems providing the highest degree of adaptability for implementing compact and efficient neural interfaces, new-generation robotics, artificial intelligence, perso May 29th, 2020

SUTD developed a simple method to print planar microstructures of polysiloxane: The new method, embedded ink writing (EIW), enables direct writing of polysiloxane which helps in the fabrication of microfluidic devices, flexible wearables, and soft actuators May 29th, 2020

Researchers develop experimental rapid COVID-19 test using nanoparticle technique: Advanced nanotechnology provides 'naked eye' visual detection of virus in 10 minutes May 29th, 2020

Chip Technology

Configurable circuit technology poised to expand silicon photonic applications: Chips can be programmed after fabrication for use in communication, computing or biomedical applications May 29th, 2020

A stitch in time: How a quantum physicist invented new code from old tricks: Error suppression opens pathway to universal quantum computing May 22nd, 2020

Oriented hexagonal boron nitride foster new type of information carrier May 22nd, 2020

Observation of intervalley transitions can boost valleytronic science and technology: UC Riverside-led research shows these transitions can emit light May 15th, 2020

Announcements

NUS researchers develop stretchable, self-healing and illuminating material for ‘invincible’ light-emitting devices: Promising applications include damage-proof flexible display screens and illuminating electronic skin for autonomous soft robots May 31st, 2020

Configurable circuit technology poised to expand silicon photonic applications: Chips can be programmed after fabrication for use in communication, computing or biomedical applications May 29th, 2020

SUTD developed a simple method to print planar microstructures of polysiloxane: The new method, embedded ink writing (EIW), enables direct writing of polysiloxane which helps in the fabrication of microfluidic devices, flexible wearables, and soft actuators May 29th, 2020

Researchers develop experimental rapid COVID-19 test using nanoparticle technique: Advanced nanotechnology provides 'naked eye' visual detection of virus in 10 minutes May 29th, 2020

Alliances/Trade associations/Partnerships/Distributorships

BNNano and Ruhl Strategic Partners Align for Nanotube Market Growth Ruhl to Leverage Strategic Acumen and Ecosystem Network of Advanced Materials & Technology Companies to Accelerate Growth for BNNano March 9th, 2020

New European Project to Fast-Track Adoption Of Cyber-Physical Systems (CPS) by SMEs: DigiFed to Demonstrate Potential of CPS Digital Technologies in Hardware Security, Human-Machine Interaction, and Autonomy for Small & Midsized Companies January 29th, 2020

American Chemical Society names Philip Proteau as new editor-in-chief of the Journal of Natural Products January 24th, 2020

American Chemical Society names Dr. James Milne head of its Publications Division January 24th, 2020

Printing/Lithography/Inkjet/Inks/Bio-printing/Dyes

Large scale integrated circuits produced in printing press: All-printed large-scale integrated circuits based on organic electrochemical transistors November 15th, 2019

Highest-throughput 3D printer is future of manufacturing: Rapid manufacturing on-demand could put warehouses, molds into the past October 17th, 2019

Physicists make graphene discovery that could help develop superconductors: Rutgers-led research could reduce energy use, improve electronic devices August 1st, 2019

New record: 3D-printed optical-electronic integration June 18th, 2019

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project