Nanotechnology Now







Heifer International

Wikipedia Affiliate Button


DHgate

Home > Press > SEMATECH Advances Device Processing Techniques to Enable III-V Manufacturing: Results show significant progress in developing a low-cost process technology to deposit III-Vs on top of silicon

Abstract:
SEMATECH announced today that researchers have made significant advances in post-epitaxial growth backside clean processing that will prepare III-V technology for high-volume manufacturing. The research leading to these accomplishments was conducted at SEMATECH's facilities at the College of Nanoscale Science and Engineering (CNSE) in Albany, NY.

SEMATECH Advances Device Processing Techniques to Enable III-V Manufacturing: Results show significant progress in developing a low-cost process technology to deposit III-Vs on top of silicon

Albany, NY | Posted on June 27th, 2013

Following a two-year effort to improve process parameters and validating III-V on 200 mm Si VLSI process flows, technologists have identified the key mechanisms to enable a robust backside cleaning process and made significant progress in reducing the likelihood of process cross-contamination that could impact a high-volume manufacturing line. This important milestone was presented during SEMATECH's Surface Preparation and Cleaning Conference held recently in Austin, Texas.

Furthermore, SEMATECH has developed systematic experiments to identify the key mechanisms of backside contamination, which were then used to engineer robust backside clean process using standard high-volume manufacturing toolsets. At the same time, researchers assessed the environmental, safety and health (ESH) risks of applying and processing compound semiconductor films on silicon dioxide wafers.

"In order to drive cost-effective compliance solutions, SEMATECH is developing new testing and analysis methodologies to evaluate ESH impacts of novel materials," said Hsi-An Kwong, SEMATECH's ESH Technology Center program manager. "After conducting a process analysis of III-V manufacturing line, we were able to identify potential ESH risks, including generation of arsine and arsenic compounds, and develop protocols to help mitigate the impact to environment and safety."

Supported by the conventional Si CMOS processing capabilities of CNSE, SEMATECH researchers are now working jointly with chipmakers, equipment and materials suppliers and universities on the ESH and contamination challenges of processing III-V materials in a 300 mm fab in order to enable safe implementation of III-V technology for high-volume manufacturing.

III-V compound semiconductors are considered valid candidates as building blocks for the implementation of high-performance, low-power logic devices beyond the 10 nm technology node. To be truly competitive, III-V based technology must be monolithically integrated with Si in order to benefit from the existing Si-based semiconductor processing. For successful introduction into a Si manufacturing line, hetero-integrated III-V on Si wafers must be processed with a backside clean and capping processes.

"Through the success of our research and development efforts, SEMATECH is developing manufacturable solutions and practical implementation approaches to enable the fabrication of logic devices and systems on chips with diverse and improved functionalities," said Paul Kirsch, director of Front End Processes (FEP) at SEMATECH.

For over half a century, silicon-based materials have been the basic layers used in the manufacturing of CMOS transistors; however, these staple materials, as well as materials derived from silicon such as insulators and contact metals, are reaching their limits as the industry looks to lower power dissipation in CMOS devices and as scaling approaches the physical limits of silicon transistors. SEMATECH's FEP program is exploring innovative materials, new transistor structures and alternative non-volatile memories to address key aspects of system-level performance, power, variability and cost to help accelerate innovation in the continued scaling of logic and memory applications.

"The backside clean step is a key component of successful introduction of III-V material to a 300 mm high-volume manufacturing line," said Chris Hobbs, SEMATECH's FEP program manager. "Success at this step is critical to ensure contamination control through subsequent toolsets."

####

About SEMATECH
For over 25 years, SEMATECH®, the international consortium of leading semiconductor device, equipment, and materials manufacturers, has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Through our unwavering commitment to foster collaboration across the nanoelectronics industry, we help our members and partners address critical industry transitions, drive technical consensus, pull research into the industry mainstream, improve manufacturing productivity, and reduce risk and time to market. Information about SEMATECH can be found at www.sematech.org. Twitter: www.twitter.com/sematech

For more information, please click here

Contacts:
Erica McGill
SEMATECH
Marketing Communications
O: 518-649-1041

Copyright © SEMATECH

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Evidence mounts for quantum criticality theory: Findings bolster theory that quantum fluctuations drive strange electronic phenomena January 30th, 2015

Everything You Need To Know About Nanopesticides January 30th, 2015

DNA nanoswitches reveal how life's molecules connect: An accessible new way to study molecular interactions could lower cost and time associated with discovering new drugs January 30th, 2015

Crystal light: New light-converting materials point to cheaper, more efficient solar power: University of Toronto engineers study first single crystal perovskites for new solar cell and LED applications January 30th, 2015

Chip Technology

Creating new materials with quantum effects for electronics January 29th, 2015

Advantest to Exhibit at SEMICON Korea in Seoul, South Korea February 4-6 Showcasing Broad Portfolio of Semiconductor Products, Technologies and Solutions January 29th, 2015

Nanometrics to Present at the Stifel 2015 Technology, Internet and Media Conference January 27th, 2015

New pathway to valleytronics January 27th, 2015

Announcements

Evidence mounts for quantum criticality theory: Findings bolster theory that quantum fluctuations drive strange electronic phenomena January 30th, 2015

Everything You Need To Know About Nanopesticides January 30th, 2015

DNA nanoswitches reveal how life's molecules connect: An accessible new way to study molecular interactions could lower cost and time associated with discovering new drugs January 30th, 2015

Crystal light: New light-converting materials point to cheaper, more efficient solar power: University of Toronto engineers study first single crystal perovskites for new solar cell and LED applications January 30th, 2015

Events/Classes

Hiden Gas Analysers at PITTCON 2015 | Visit us on Booth No. 1127 January 29th, 2015

Advantest to Exhibit at SEMICON Korea in Seoul, South Korea February 4-6 Showcasing Broad Portfolio of Semiconductor Products, Technologies and Solutions January 29th, 2015

Pittcon News: Renishaw adds to the comprehensive imaging options available with its inVia confocal Raman microscope January 27th, 2015

Nanometrics to Present at the Stifel 2015 Technology, Internet and Media Conference January 27th, 2015

Alliances/Partnerships/Distributorships

The Original Frameless Shower Doors Installs DFI's FuseCube™ to Offer Hydrophobic Protective Coating as a Standard Feature: First DFI FuseCube™ Installed on the East Coast to Enable Key Differentiator for the Original Frameless Shower Doors January 29th, 2015

Entanglement on a chip: Breakthrough promises secure communications and faster computers January 27th, 2015

Smart keyboard cleans and powers itself -- and can tell who you are January 21st, 2015

DNA 'glue' could someday be used to build tissues, organs January 14th, 2015

Research partnerships

Evidence mounts for quantum criticality theory: Findings bolster theory that quantum fluctuations drive strange electronic phenomena January 30th, 2015

DNA nanoswitches reveal how life's molecules connect: An accessible new way to study molecular interactions could lower cost and time associated with discovering new drugs January 30th, 2015

Made-in-Singapore rapid test kit detects dengue antibodies from saliva: IBN's MedTech innovation simplifies diagnosis of infectious diseases January 29th, 2015

Carbon nanoballs can greatly contribute to sustainable energy supply January 27th, 2015

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More










ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2015 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE