Nanotechnology Now

Our NanoNews Digest Sponsors





Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > Press > SEMATECH Achieves World-Class Defect Reductions in EUV Mask Blanks to Enable High-volume Manufacturing

Abstract:
Technologists at SEMATECH have Successfully Demonstrated Extremely Low Defect Levels for the Deposition of Critical Films, Meeting the 22 nm Defect Requirements for EUV Mask Blanks.

SEMATECH Achieves World-Class Defect Reductions in EUV Mask Blanks to Enable High-volume Manufacturing

Albany, NY | Posted on August 14th, 2012

SEMATECH announced today that researchers have reached a significant milestone in reducing tool-generated defects from multi-layer deposition of mask blanks used for extreme ultraviolet lithography (EUVL), bringing that technology a step closer to high-volume manufacturing.

Following a two-year effort to improve deposition tool hardware, process parameters and substrate cleaning techniques, technologists deposited EUV multilayers with as few as eight defects per mask at 50 nm sensitivity (SiO2 equivalent), which includes 6 substrate defects, one handling defect and one defect from the multi-layer deposition process. This result was achieved on a 40 bi-layer film stack with an Ru cap and measured over the mask blank quality area of 132 x 132 mm2.

Furthermore, SEMATECH has developed novel cleaning processes which have significantly improved substrate cleaning yield on quality substrates, yielding an integrated process capable of manufacturing EUV mask blanks with less than 20 total defects at 45 nm sensitivity. The achievements in mask defect reduction and increase in yield for high quality blanks are attributed to a significant improvement in substrate cleaning, handling, and deposition.

Defects are generally formed by decoration of substrate defects by the multilayer deposition process and, to a lesser extent, by the deposition process itself and have prevented the quality of mask blanks from keeping pace with roadmap requirements for the production of pilot line and high-volume manufacturing EUV reticles. Reducing the defects in the extreme ultraviolet (EUV) mask blank multilayer deposition system is one of the most critical technology gaps the industry needs to address to enable cost effective insertion of this technology at the 22 nm half-pitch. For successful introduction, integrated EUV blanks must meet a defectivity level of less than 0.003 defects/cm2 at 25 nm sensitivity.

"SEMATECH continues to produce results that the industry needs to show that EUVL is manufacturable," said Stefan Wurm, SEMATECH's Lithography director. "SEMATECH's Mask Blank Defect Reduction program continues to demonstrate practical results for mask blank defect reduction, more efficient deposition and cleaning processes, effective reticle handling, and other areas that can support high-volume EUVL manufacturing at the 22 nm half-pitch node."

"EUVL requires a low defect density reflective mask blank, which is considered to be one of the top two critical technology gaps for commercialization of the technology," said Frank Goodwin, manager of SEMATECH's Mask Blank Defect Reduction program. "The goal of our work is to enable model-based prediction and data driven analysis of defect performance for targeted process improvement and component learning to feed into the new deposition tool design."

Substrate and mask blank defect levels have steadily improved across the industry, but more slowly than expected. To accelerate progress, SEMATECH's Mask Blank Defect Reduction program has developed world-class knowledge on the composition of very small defects, through sophisticated defect analysis capabilities and processes that include the use of leading-edge analytical tools such as the Titan TEM and an Auger tool for mask surface analysis. SEMATECH's Mask Blank Defect Reduction program is supported by the Mask Blank Development Center, located at the College of Nanoscale Science and Engineering (CNSE), State University of New York, Albany, to develop defect-free EUV blanks.

####

About SEMATECH
SEMATECH®, the international consortium of leading semiconductor device, equipment, and materials manufacturers, this year celebrates 25 years of excellence in accelerating the commercialization of technology innovations into manufacturing solutions. Through our unwavering commitment to foster collaboration across the nanoelectronics industry, we help our members and partners address critical industry transitions, drive technical consensus, pull research into the industry mainstream, improve manufacturing productivity, and reduce risk and time to market. Information about SEMATECH can be found at www.sematech.org or follow us on Twitter @sematechnews.

For more information, please click here

Contacts:
Erica McGill
SEMATECH
Media Relations
257 Fuller Road | Suite 2200
Albany, NY | 12203
o: 518-649-1041

Copyright © SEMATECH

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Iran to Hold 3rd Int'l Engineering Materials, Metallurgy Conference October 25th, 2014

Haydale Secures Exclusive Development and Supply Agreement with Tantec A/S: New reactors to be built and commissioned by Tantec A/S represent another step forward towards the commercialisation of graphene October 24th, 2014

QuantumWise guides the semiconductor industry towards the atomic scale October 24th, 2014

SUNY Polytechnic Institute Invites the Public to Attend its Popular Statewide 'NANOvember' Series of Outreach and Educational Events October 23rd, 2014

Chip Technology

QuantumWise guides the semiconductor industry towards the atomic scale October 24th, 2014

Strengthening thin-film bonds with ultrafast data collection October 23rd, 2014

NIST offers electronics industry 2 ways to snoop on self-organizing molecules October 22nd, 2014

Materials for the next generation of electronics and photovoltaics: MacArthur Fellow develops new uses for carbon nanotubes October 21st, 2014

Announcements

Iran to Hold 3rd Int'l Engineering Materials, Metallurgy Conference October 25th, 2014

Haydale Secures Exclusive Development and Supply Agreement with Tantec A/S: New reactors to be built and commissioned by Tantec A/S represent another step forward towards the commercialisation of graphene October 24th, 2014

QuantumWise guides the semiconductor industry towards the atomic scale October 24th, 2014

Strengthening thin-film bonds with ultrafast data collection October 23rd, 2014

Research partnerships

NYU Researchers Break Nano Barrier to Engineer the First Protein Microfiber October 23rd, 2014

Nanoparticle technology triples the production of biogas October 23rd, 2014

RF Heating of Magnetic Nanoparticles Improves the Thawing of Cryopreserved Biomaterials October 23rd, 2014

Brookhaven Lab Launches Computational Science Initiative:Leveraging computational science expertise and investments across the Laboratory to tackle "big data" challenges October 22nd, 2014

Printing/Lithography/Inkjet/Inks

3DXNano™ ESD Carbon Nanotube 3D Printing Filament - optimized for demanding 3D printing applications in the semi-con and electronics industry October 16th, 2014

Aculon NanoClear Stencil Solution Wins 2014 Global Technology Award at SMTAI October 12th, 2014

Fast, cheap nanomanufacturing: Arrays of tiny conical tips that eject ionized materials could fabricate nanoscale devices cheaply October 4th, 2014

'Greener,' low-cost transistor heralds advance in flexible electronics September 24th, 2014

NanoNews-Digest
The latest news from around the world, FREE





  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More














ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE