- About Us
- Career Center
- Nano-Social Network
- Nano Consulting
- My Account
International SEMATECH Manufacturing Initiative (ISMI), the consortium dedicated to helping improve the productivity and cost performance of semiconductor manufacturing operations, today announced the keynote speakers for the 8th Annual Symposium on Manufacturing Effectiveness, hosted by ISMI on October 19-20 at the Hilton Austin Airport in Austin, Texas. Speakers will include Paul Fego, vice president and manager of worldwide manufacturing at Texas Instruments, and John Scoville, senior director of application engineering at Applied Materials.
Paul Fego will open the Symposium on Manufacturing Effectiveness on October 19 with his keynote, "Building Blocks for an Efficient and Effective Manufacturing Model," which will focus on how semiconductor manufacturing can meet next-generation challenges, including high volume manufacturing, cost effectiveness and on-time delivery. From wafer fabrication through packaging, assembly and test, Fego will cover the entire chain of events that must happen to make a factory work well and deliver on time.
On October 20, Applied Materials' John Scoville will give the opening keynote, "Predictability as a Key Component of Productivity: The Move Towards Smart Yield." Scoville will identify the goals that must be addressed in order to achieve a full and continuously optimized vision of the future that includes simulation in lock-step with reality, and achieving fab control of all systems according to common productivity and cost-reduction targets.
"Manufacturing Week is designed to provide a wide spectrum of manufacturing, technical and business content and networking opportunities that will focus on cost-efficient solutions to maximize fab productivity," said Richard Young, SEMATECH's vice president of manufacturing. "These industry leaders will share their insights on leading productivity trends, and their best practices related to reducing costs and improving fab and tool efficiency."
ISMI's Manufacturing Week, from October 17-21, features the ISMI Symposium on Manufacturing Effectiveness, the pre-eminent event for semiconductor engineers and managers to meet face-to-face and collaborate on all aspects of manufacturing productivity, including the latest in cost-cutting methodologies, real-time data management, manufacturing methods, and advances in equipment and fab design.
Along with a wide-range of short courses and workshops and an exhibition showcasing the latest tools and solutions from some of the industry's top suppliers, Manufacturing Week will cover some of the most exciting areas of opportunity for our industry, including factory and equipment productivity, AEC/APC, cost reduction, green manufacturing, emerging ESH regulations, nanomaterials biosafety, factory modeling, and statistical methods. To register for this event or for general information about ISMI's Manufacturing Week, please visit www.cvent.com/d/5dqy9c.
ISMI is a global alliance of the world’s major semiconductor manufacturers, dedicated to reducing cost per wafer and ultimately cost per die, through cooperative programs focused on environmental, safety and health, 450mm wafer size transition, manufacturing technology, benchmarking and best practices. ISMI is a wholly-owned subsidiary of SEMATECH.
For over 20 years, SEMATECH® (www.sematech.org), the international consortium of leading semiconductor manufacturers, has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Today, we continue accelerating the next technology revolution with our nanoelectronics and emerging technology partners.
About Manufacturing Week:
Manufacturing Week is an annual conference designed to accelerate collaboration and problem solving in the chip manufacturing community by bringing key stakeholders together to share information and methodologies for increasing productivity and reducing manufacturing expenses through advances in equipment, processes, resources, fab design, and manufacturing methods. For more information visit: www.cvent.com/d/5dqy9c.
For more information, please click here
Copyright © Business WireIf you have a comment, please Contact us.
Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.
|Related News Press|
News and information
A compact, efficient single photon source that operates at ambient temperatures on a chip: Highly directional single photon source concept is expected to lead to a significant progress in producing compact, cheap, and efficient sources of quantum information bits for future appls May 3rd, 2016
Cooling graphene-based film close to pilot-scale production April 30th, 2016
Exploring phosphorene, a promising new material April 29th, 2016
Nuclear pores captured on film: Using an ultra fast-scanning atomic force microscope, researchers from the University of Basel have filmed 'living' nuclear pore complexes at work for the first time May 3rd, 2016
Researchers create a first frequency comb of time-bin entangled qubits: Discovery is a significant step toward multi-channel quantum communication and higher capacity quantum computers April 28th, 2016
Introducing the RE標ORK Bio-inspired Robotics Summit in Berlin April 27th, 2016