Home > Press > Additional speakers add new dimensions to Particle Summit program
Abstract:
October 20-21, 2010; The Charles Hotel, Cambridge, MA
Additional speakers add new dimensions to Particle Summit program
Malvern, UK | Posted on August 25th, 2010
Organisers of the two-day Particle Summit, which takes place near Boston in October (October 20-21, 2010; The Charles Hotel, Cambridge MA), have announced two further speakers for the event, adding to an already packed program:
Dr. Joerg Bolze from analytical X-ray company PANalytical will discuss ‘Nanoparticle Size Distribution Determination By Small-Angle X-Ray Scattering on a Multi-Purpose X-Ray Diffractometer Platform'. He will include a short introduction to the SAXS technique together with application examples illustrating its potential and limitations for liquid nanoparticle dispersions, nano-powders, and nanocomposites.
Alon Vaisman from Malvern Instruments will present ‘Particle Sizing - a Proven Technology for Process Control', in which he will describe how implementing on-line laser diffraction and real-time process control can maximize efficiency and eliminate out-of-spec production.
These additions to the program bring the number of speakers over the two days to 17, who between them will cover a wide range of particle characterization topics and technologies.
The event, which is sponsored by Malvern Instruments, also features an optional pre-conference workshop on October 19 where participants can learn or refresh their knowledge of the basic principles of particle characterization.
For a full program and registration information, visit www.particlesummit.org
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About Malvern Instruments
Malvern Instruments is a market leader in measuring performance controlling material properties. These include particle size, particle shape, zeta potential, molecular weight, size and conformation, rheological properties and chemical distribution. Malvern delivers the systems, support and expertise that ensure the analytical integrity and productivity needed to drive research, development and manufacturing.
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