Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > Press > SEMATECH to Show Advances in EUV Lithography at SPIE 2010

Abstract:
Critical issues and potential solutions in preparing extreme ultraviolet lithography (EUVL) for high-volume manufacturing will be explored by SEMATECH technologists at the SPIE Advanced Lithography 2010 conferences Feb. 21-25 in San Jose, CA.

SEMATECH to Show Advances in EUV Lithography at SPIE 2010

Albany, NY and Austin, TX | Posted on February 17th, 2010

The SEMATECH Lithography Program is based at the College of Nanoscale Science and Engineering's (CNSE) Albany NanoTech Complex.

"SEMATECH has had an extraordinary year in lithography, and we plan to demonstrate our successes at SPIE," said Bryan Rice, Lithography Director. "We'll show how we are consistently leading the industry in enabling EUV mask and resist/materials infrastructure as well as EUVL manufacturing feasibility and affordability."

A leading topic will be EUVL mask infrastructure, an area in which SEMATECH has proposed a new industry consortium. Advances in EUV resist development - including SEMATECH's success with its 0.3 numerical aperture (NA) microexposure tools (MET) at CNSE and the University of California at Berkeley - also will be featured. Other SEMATECH papers will cover particle removal and inspection for EUV masks, and metrology techniques for optical defect inspection and double patterning.

SEMATECH and ISMI presentations at SPIE include, by subject, date and time:

EUVL Mask Infrastructure

Wednesday, Feb. 24

· 8:40 a.m.: E-beam correction methodology for compensation of mask nonflatness in EUVL pilot line

· 4:50 p.m.: An inspection and defect review strategy for EUV pilot line and high-volume manufacturing

Resist

Monday, Feb. 22

· 2:50 p.m.: Characterization of promising resist platforms for sub-30-nm HP manufacturability and EUV-CAR extendibility study

· 5:40 p.m. Thin EUV resist and underlayer stacks: correlating Tg, surface polarity, density, and image quality

Tuesday, Feb. 23

· 8:40 a.m.: Development of an inorganic-based photoresist for DUV, EUV, and e-beam imaging

Thursday, Feb. 25

· 10:30 a.m.: The SEMATECH Berkeley MET pushing EUV development beyond 22 nm half pitch

Particle Removal and Mask Inspection

Tuesday, Feb. 23

· 2 p.m.: A study of defects on EUV mask using blank inspection, patterned mask inspection, and wafer inspection

· 3:00 p.m.: Particle removal challenges of EUV patterned masks for the sub-22-nm HP node

Wednesday, Feb. 24

· 6 p.m.: Particle protection capability of SEMI compliant EUV dual pod

Metrology, Inspection, and Process Control

Tuesday, Feb. 23

· 8:40 a.m.: The limits and extensibility of optical patterned defect inspection

· 11:10 a.m.: LER/LWR detection using dark-field spectroscopic methods

· 6 p.m.: CD-SEM utility with double patterning (poster session)

· 6 p.m.: Reconstruct FinFET cross section using CD-SAXS (poster session)

Thursday, Feb. 24

· 8:30 a.m.: Electron-beam-induced photoresist shrinkage influence on 2D profiles[1]

· 2:10 p.m.: Reference material (RM) 8820: a versatile new NIST standard for nanometrology

Other Topics

Wednesday, Feb. 24

· 6 p.m.: Modeling carbonization of extreme-ultraviolet optics

· 6 p.m.: Characterization of contamination on the illumination optics of the SEMATECH extreme-ultraviolet micro-field exposure tool

####

About SEMATECH
For 20 years, SEMATECH®, the international consortium of leading semiconductor manufacturers, has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Today, we continue accelerating the next technology revolution with our nanoelectronics and emerging technology partners.

For more information, please click here

Contacts:
Anne Englander
512 356-7155

Copyright © SEMATECH

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

UTSA study describes new minimally invasive device to treat cancer and other illnesses: Medicine diffusion capsule could locally treat multiple ailments and diseases over several weeks December 3rd, 2016

Novel Electrode Structure Provides New Promise for Lithium-Sulfur Batteries December 3rd, 2016

Research Study: MetaSOLTM Shatters Solar Panel Efficiency Forecasts with Innovative New Coating: Coating Provides 1.2 Percent Absolute Enhancement to Triple Junction Solar Cells December 2nd, 2016

Deep insights from surface reactions: Researchers use Stampede supercomputer to study new chemical sensing methods, desalination and bacterial energy production December 2nd, 2016

Chip Technology

Quantum obstacle course changes material from superconductor to insulator December 1st, 2016

Bumpy surfaces, graphene beat the heat in devices: Rice University theory shows way to enhance heat sinks in future microelectronics November 29th, 2016

Scientists shrink electron gun to matchbox size: Terahertz technology has the potential to enable new applications November 25th, 2016

Uncovering the secrets of friction on graphene: Sliding on flexible graphene surfaces has been uncharted territory until now November 23rd, 2016

Announcements

UTSA study describes new minimally invasive device to treat cancer and other illnesses: Medicine diffusion capsule could locally treat multiple ailments and diseases over several weeks December 3rd, 2016

Novel Electrode Structure Provides New Promise for Lithium-Sulfur Batteries December 3rd, 2016

Research Study: MetaSOLTM Shatters Solar Panel Efficiency Forecasts with Innovative New Coating: Coating Provides 1.2 Percent Absolute Enhancement to Triple Junction Solar Cells December 2nd, 2016

Deep insights from surface reactions: Researchers use Stampede supercomputer to study new chemical sensing methods, desalination and bacterial energy production December 2nd, 2016

Events/Classes

IEDM: Leti CEO Marie Semeria to Give Opening-day Keynote on Impact of ‘Hyperconnectivity’ and IoT: Speech to Portray Key Role Nonprofit Research and Technology Organizations Play in Making Technology More Efficient and Ensuring Safety and Security November 29th, 2016

Leti and Grenoble Partners Demonstrate World’s 1st Qubit Device Fabricated in CMOS Process: Paper by Leti, Inac and University of Grenoble Alpes Published in Nature Communications November 28th, 2016

Cutting-edge nanotechnologies are breaking into industries November 18th, 2016

IEDM: CEO Marie Semeria to Deliver Opening Day Keynote at IEDM 2016; Institute to Present 13 Papers November 17th, 2016

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project