Nanotechnology Now

Our NanoNews Digest Sponsors





Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > Press > SEMATECH to Show Advances in EUV Lithography at SPIE 2010

Abstract:
Critical issues and potential solutions in preparing extreme ultraviolet lithography (EUVL) for high-volume manufacturing will be explored by SEMATECH technologists at the SPIE Advanced Lithography 2010 conferences Feb. 21-25 in San Jose, CA.

SEMATECH to Show Advances in EUV Lithography at SPIE 2010

Albany, NY and Austin, TX | Posted on February 17th, 2010

The SEMATECH Lithography Program is based at the College of Nanoscale Science and Engineering's (CNSE) Albany NanoTech Complex.

"SEMATECH has had an extraordinary year in lithography, and we plan to demonstrate our successes at SPIE," said Bryan Rice, Lithography Director. "We'll show how we are consistently leading the industry in enabling EUV mask and resist/materials infrastructure as well as EUVL manufacturing feasibility and affordability."

A leading topic will be EUVL mask infrastructure, an area in which SEMATECH has proposed a new industry consortium. Advances in EUV resist development - including SEMATECH's success with its 0.3 numerical aperture (NA) microexposure tools (MET) at CNSE and the University of California at Berkeley - also will be featured. Other SEMATECH papers will cover particle removal and inspection for EUV masks, and metrology techniques for optical defect inspection and double patterning.

SEMATECH and ISMI presentations at SPIE include, by subject, date and time:

EUVL Mask Infrastructure

Wednesday, Feb. 24

· 8:40 a.m.: E-beam correction methodology for compensation of mask nonflatness in EUVL pilot line

· 4:50 p.m.: An inspection and defect review strategy for EUV pilot line and high-volume manufacturing

Resist

Monday, Feb. 22

· 2:50 p.m.: Characterization of promising resist platforms for sub-30-nm HP manufacturability and EUV-CAR extendibility study

· 5:40 p.m. Thin EUV resist and underlayer stacks: correlating Tg, surface polarity, density, and image quality

Tuesday, Feb. 23

· 8:40 a.m.: Development of an inorganic-based photoresist for DUV, EUV, and e-beam imaging

Thursday, Feb. 25

· 10:30 a.m.: The SEMATECH Berkeley MET pushing EUV development beyond 22 nm half pitch

Particle Removal and Mask Inspection

Tuesday, Feb. 23

· 2 p.m.: A study of defects on EUV mask using blank inspection, patterned mask inspection, and wafer inspection

· 3:00 p.m.: Particle removal challenges of EUV patterned masks for the sub-22-nm HP node

Wednesday, Feb. 24

· 6 p.m.: Particle protection capability of SEMI compliant EUV dual pod

Metrology, Inspection, and Process Control

Tuesday, Feb. 23

· 8:40 a.m.: The limits and extensibility of optical patterned defect inspection

· 11:10 a.m.: LER/LWR detection using dark-field spectroscopic methods

· 6 p.m.: CD-SEM utility with double patterning (poster session)

· 6 p.m.: Reconstruct FinFET cross section using CD-SAXS (poster session)

Thursday, Feb. 24

· 8:30 a.m.: Electron-beam-induced photoresist shrinkage influence on 2D profiles[1]

· 2:10 p.m.: Reference material (RM) 8820: a versatile new NIST standard for nanometrology

Other Topics

Wednesday, Feb. 24

· 6 p.m.: Modeling carbonization of extreme-ultraviolet optics

· 6 p.m.: Characterization of contamination on the illumination optics of the SEMATECH extreme-ultraviolet micro-field exposure tool

####

About SEMATECH
For 20 years, SEMATECH®, the international consortium of leading semiconductor manufacturers, has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Today, we continue accelerating the next technology revolution with our nanoelectronics and emerging technology partners.

For more information, please click here

Contacts:
Anne Englander
512 356-7155

Copyright © SEMATECH

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Measuring the Smallest Magnets July 28th, 2014

WITec to host the 11th Confocal Raman Imaging Symposium from September 29th - October 1st in Ulm, Germany July 28th, 2014

FEI adds Phase Plate Technology and Titan Halo TEM to its Structural Biology Product Portfolio: New solutions provide the high-quality imaging and contrast necessary to analyze the 3D structure of molecules and molecular complexes July 28th, 2014

Production of Toxic Gas Sensor Based on Nanorods July 28th, 2014

Chip Technology

A*STAR and industry form S$200M semiconductor R&D July 25th, 2014

A Crystal Wedding in the Nanocosmos July 23rd, 2014

Nanometrics Announces Upcoming Investor Events July 22nd, 2014

Penn Study: Understanding Graphene’s Electrical Properties on an Atomic Level July 22nd, 2014

Announcements

Measuring the Smallest Magnets July 28th, 2014

WITec to host the 11th Confocal Raman Imaging Symposium from September 29th - October 1st in Ulm, Germany July 28th, 2014

FEI adds Phase Plate Technology and Titan Halo TEM to its Structural Biology Product Portfolio: New solutions provide the high-quality imaging and contrast necessary to analyze the 3D structure of molecules and molecular complexes July 28th, 2014

Production of Toxic Gas Sensor Based on Nanorods July 28th, 2014

Events/Classes

WITec to host the 11th Confocal Raman Imaging Symposium from September 29th - October 1st in Ulm, Germany July 28th, 2014

FEI adds Phase Plate Technology and Titan Halo TEM to its Structural Biology Product Portfolio: New solutions provide the high-quality imaging and contrast necessary to analyze the 3D structure of molecules and molecular complexes July 28th, 2014

NNCO Announces an Interactive Webinar: Progress Review on the Coordinated Implementation of the National Nanotechnology Initiative 2011 Environmental, Health, and Safety Research Strategy July 23rd, 2014

Harris & Harris Group to Host Conference Call on Second-Quarter 2014 Financial Results on August 15, 2014 July 23rd, 2014

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More














ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE