- About Us
- Career Center
- Nano-Social Network
- Nano Consulting
- My Account
Revolutionary Advances in Ease of Use-and-Quantitative Analysis
Veeco Instruments Inc. (Nasdaq: VECO), the leading provider of atomic force microscope (AFM) instrumentation to the Research and Industrial communities, announced today the introduction of two patent-pending AFM scan modes, ScanAsyst™ and PeakForce™ QNM™. Together, these proprietary advances provide unique, new capabilities for AFM quantitative analysis and ease of use on Veeco's Dimension® Icon®, BioScope™ Catalyst™, and the newly announced MultiMode® 8 Scanning Probe Microscopes. Veeco is showcasing ScanAsyst and PeakForce QNM at the MRS Fall Meeting in Boston, MA, December 1st through 4th.
"Our new ScanAsyst and PeakForce QNM Quantitative NanoMechanical Property Mapping modes make nanoscale AFM imaging and analysis faster, easier, and more quantitative," commented David Rossi, Vice President and General Manager of Veeco's AFM Business. "Making AFMs easier and quantitative opens new inroads to important research in materials, energy, life sciences, pharmaceuticals, and other arenas where nanoscale interactions and processes are key to breakthrough discoveries, but where researchers were limited by the capabilities of yesterday's AFM technology."
ScanAsyst is the world's first AFM image-optimization scan mode, providing new levels of ease-of-use in acquiring reliable, high-quality nanoscale data. Using intelligent algorithms that continuously monitor image quality and make appropriate parameter adjustments, this revolutionary, patent-pending scan mode delivers faster, more consistent results, automatically, and regardless of operator skill level. ScanAsyst dramatically improves image setup with automatic optimization of parameters and ideally suits a broad range of material and life science applications, with operation in both air and fluid.
PeakForce QNM is an entirely new, Veeco-developed operating mode that uses patent-pending PeakForce Tapping technology to record very fast force response curves at every single pixel in the image. This imaging mode enables unprecedented quantitative nanomechanical property mapping of both modulus and adhesion on a wide variety of materials, while simultaneously imaging sample topography at high resolution. In addition to more accurate and repeatable results, the mode's direct, ultra-low-force control of the probe tip during scanning helps protect delicate tips and samples, yielding longer probe lifetimes, fewer probe exchanges, and improved sample integrity and measurement consistency.
To the extent that this news release discusses expectations or otherwise makes statements about the future, such statements are forward-looking and are subject to a number of risks and uncertainties that could cause actual results to differ materially from the statements made. These factors include the risks discussed in the Business Description and Management's Discussion and Analysis sections of Veeco's Annual Report on Form 10-K for the year ended December 31, 2008 and in our subsequent quarterly reports on Form 10-Q, current reports on Form 8-K and press releases. Veeco does not undertake any obligation to update any forward-looking statements to reflect future events or circumstances after the date of such statements.
About Veeco Instruments
Veeco Instruments Inc. manufactures enabling solutions for customers in the HB-LED, solar, data storage, semiconductor, scientific research and industrial markets. We have leading technology positions in our three businesses: LED & Solar Process Equipment, Data Storage Process Equipment, and Metrology Instruments. Veeco’s manufacturing and engineering facilities are located in New York, New Jersey, California, Colorado, Arizona, Minnesota and Massachusetts. Global sales and service offices are located throughout the U.S., Europe, Japan and APAC.
For more information, please click here
Veeco Instruments Inc.
SVP Investor Relations & Corp. Comm.
VP Strategic Marketing & Business Development
Copyright © Veeco InstrumentsIf you have a comment, please Contact us.
Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.
|Related News Press|
News and information
Call for NanoArt and Art-Science-Technology Papers June 9th, 2016
Novel gene therapy shows potential for lung repair in asthma May 18th, 2016