Nanotechnology Now

Our NanoNews Digest Sponsors





Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > Press > SEMATECH Announces Breakthroughs in High Mobility Channels, Scaled High-k Gate Stacks, and Future Non-Volatile Memories

Abstract:
Experts to Present Significant Progress on Key Next Generation Technologies at VLSI-TSA

SEMATECH Announces Breakthroughs in High Mobility Channels, Scaled High-k Gate Stacks, and Future Non-Volatile Memories

HSINCHU, Taiwan | Posted on April 26th, 2009

Experts from SEMATECH's Front End Processes (FEP) program will present breakthrough research results in advanced logic and future non-volatile technologies at the International Symposium on VLSI Technology, System and Applications (VLSI-TSA) on April 27-29, 2009 at the Ambassador Hotel in Hsinchu, Taiwan. The papers report progress in areas such as next generation high-k/metal gate (HKMG) materials, advanced flash memory, planar and non-planar CMOS technologies and HKMG defect metrology.

"Through collaborative research, our goal is to develop and characterize cutting-edge new materials and device structures that enable scaling logic, memory, and emerging technologies," said Raj Jammy, SEMATECH's vice president of emerging technologies. "SEMATECH's work has always blended innovation with practical solutions to move the industry forward. We are happy to be sharing our results with an august community of technologists assembled in Taiwan, which plays an increasingly significant role in propelling the semiconductor industry towards future generations."

Monday, April 27

* La-doped Metal/High-K nMOSFET for Sub-32nm HP and LSTP Application - Investigates the suitability of nMOSFETs with the La-doped high-k/metal gate stack to see its suitability for sub-32nm low standby power (LSTP) and high performance applications.
* Extending spectroscopic ellipsometry for identification of electrically active defects in Si/SiO2/high-k/metal gate stacks - Explores a new method using spectroscopic ellipsometry to non-invasively identify oxygen vacancy defects in the bottom interfacial SiO2 layer of the scaled high-k/metal gate stacks.
* Reliability Assessment of Low Vt Metal High-k Gate Stacks for High Performance Applications - Describes of reliability characterization techniques and models targeting HKMG lifetime predictions.
* Additive Mobility Enhancement and Off-State Current Reduction in SiGe Channel pMOSFETs with Optimized Si Cap and High-k Metal Gate Stacks - Demonstrates high mobility pMOSFETs with high quality epitaxial SiGe films selectively grown on Si (100) substrates.

Wednesday, April 29

* Band Engineered Tunnel Oxides for Improved TANOS-type Flash Program/Erase with Good Retention and 100K Cycle Endurance - Demonstrates, for the first time, that band-engineered tunnel oxides integrated with a high-k/metal gate can improve program, erase, and endurance in charge-trapped flash memory devices.
* High Mobility SiGe Shell-Si Core Omega Gate PFETs - Explores the use of Omega gate-type pFETs with a SiGe shell (high mobility channel) on a Si core.

Serving as the bridge between R&D and manufacturing, SEMATECH drives pre-competitive cooperation and collaboration to accelerate the commercialization of nanoelectronics and nanotechnology. SEMATECH's FEP engineers are focused on developing new techniques for extending high-k dielectrics, metal gates, high mobility channels, and advanced memory technologies in collaboration with member companies, universities, national labs, and supplier partners.

The International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA) is sponsored by the Institute of Electrical and Electronics Engineers (IEEE), a leading professional association for the advancement of technology, in association with Taiwan's Industrial Technology Research Institute (ITRI). VLSI-TSA is one of many industry forums SEMATECH uses to collaborate with scientists and engineers from corporations, universities, and other research institutions.

####

About SEMATECH
For 20 years, SEMATECH® (www.sematech.org), the global consortium of leading semiconductor manufacturers, has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Today, we continue accelerating the next technology revolution with our nanoelectronics and emerging technology partners.

For more information, please click here

Contacts:
SEMATECH
Erica McGill
518-649-1041

Copyright © Business Wire 2009

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Measuring the Smallest Magnets July 28th, 2014

WITec to host the 11th Confocal Raman Imaging Symposium from September 29th - October 1st in Ulm, Germany July 28th, 2014

FEI adds Phase Plate Technology and Titan Halo TEM to its Structural Biology Product Portfolio: New solutions provide the high-quality imaging and contrast necessary to analyze the 3D structure of molecules and molecular complexes July 28th, 2014

Production of Toxic Gas Sensor Based on Nanorods July 28th, 2014

Chip Technology

A*STAR and industry form S$200M semiconductor R&D July 25th, 2014

A Crystal Wedding in the Nanocosmos July 23rd, 2014

Nanometrics Announces Upcoming Investor Events July 22nd, 2014

Penn Study: Understanding Graphene’s Electrical Properties on an Atomic Level July 22nd, 2014

Memory Technology

Rice's silicon oxide memories catch manufacturers' eye: Use of porous silicon oxide reduces forming voltage, improves manufacturability July 10th, 2014

University of Illinois study advances limits for ultrafast nano-devices July 10th, 2014

Leti to Present Technological Platforms Targeting Industry’s Needs for the Future at Semicon West Workshop: Presentation at STS Session to Focus on Leti Advanced Lithography Programs for 1x Nodes and on Silicon Photonics at TechXPot June 25th, 2014

6TH CEA-LETI WORKSHOP ON INNOVATIVE MEMORY TECHNOLOGIES includes invited talks by Infineon, IBM, Schlumberger, Thales, Cisco and STMicroelectronics: June 24 Event to Explore NVM Application Horizons from Automotive to Oil & Gas: Responses from Innovative Technologies & Design June 12th, 2014

Announcements

Measuring the Smallest Magnets July 28th, 2014

WITec to host the 11th Confocal Raman Imaging Symposium from September 29th - October 1st in Ulm, Germany July 28th, 2014

FEI adds Phase Plate Technology and Titan Halo TEM to its Structural Biology Product Portfolio: New solutions provide the high-quality imaging and contrast necessary to analyze the 3D structure of molecules and molecular complexes July 28th, 2014

Production of Toxic Gas Sensor Based on Nanorods July 28th, 2014

Events/Classes

WITec to host the 11th Confocal Raman Imaging Symposium from September 29th - October 1st in Ulm, Germany July 28th, 2014

FEI adds Phase Plate Technology and Titan Halo TEM to its Structural Biology Product Portfolio: New solutions provide the high-quality imaging and contrast necessary to analyze the 3D structure of molecules and molecular complexes July 28th, 2014

NNCO Announces an Interactive Webinar: Progress Review on the Coordinated Implementation of the National Nanotechnology Initiative 2011 Environmental, Health, and Safety Research Strategy July 23rd, 2014

Harris & Harris Group to Host Conference Call on Second-Quarter 2014 Financial Results on August 15, 2014 July 23rd, 2014

Alliances/Partnerships/Distributorships

A*STAR and industry form S$200M semiconductor R&D July 25th, 2014

Organometallics welcomes new editor-in-chief: Paul Chirik, Ph.D. July 22nd, 2014

Haydale and Goodfellow Announce Major Distribution Agreement for Functionalised Graphene Materials July 21st, 2014

SentiMag® Now Available in Australia and New Zealand July 21st, 2014

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More














ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE