Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > Press > Toppan Printing Completes 32nm and 28nm Production Photomask Process through Toppan-IBM Joint Development

Abstract:
Toppan Printing Co., Ltd. (Toppan Printing; Head office: Chiyoda-ku, Tokyo; President & CEO: Naoki Adachi) has established a new and improved photomask manufacturing process in April 2009 at its photomask facility in Asaka, Japan, to support 32nm and 28nm semiconductor device production. This photomask process was achieved through Toppan's ongoing joint development project with IBM. The Toppan photomasks produced in Asaka are compatible with those produced at IBM's photomask facility in Essex Junction, Vt., and have been qualified by IBM.

Toppan Printing Completes 32nm and 28nm Production Photomask Process through Toppan-IBM Joint Development

Tokyo, Japan | Posted on April 21st, 2009

Photomasks are an integral component in the patterning and manufacturing of semiconductor devices. Today, the 32nm semiconductor process is in the last phase of development prior to volume production. Advanced devices, such as those used for communications and image processing, are expected to have better performance, lower power consumption and lower cost. To achieve these competing requirements, the technological advances of 32nm production have been combined with the productivity enhancements of the 28nm ground rules.

In order to respond to those requirements, 32nm and 28nm production photomask process has been completed at Toppan's Asaka facility. The introduction of this photomask process from Toppan will help chip manufacturers accelerate the development production of semiconductors in these next-generation technologies. As a leading photomask manufacturer, Toppan will continuously supply high-quality products to customers around the world in a timely manner.

Toppan-IBM Joint Development Project in Advanced Photomasks

Toppan's collaboration with IBM began in 2005 at the 45nm node, and has progressed to the highly specialized masks required to support Source Mask Optimization (SMO) at the 22nm node. SMO is the co-optimization of the illumination source and mask pattern. SMO results in a lithographic solution for building more advanced semiconductor devices than would be possible with conventional lithographic techniques, and is expected to extend immersion lithography through the 22nm node and beyond. Toppan Printing plans to launch volume production of SMO-applied photomasks in 2011, leveraging technical assets accumulated by the collaboration with IBM.

Through the joint development with the industry leader IBM, Toppan Printing, a partner of semiconductor manufacturing customers throughout the world, is committed to providing leading-edge photomasks that match market needs.

"This announcement marks a significant milestone in the successful, multi-year joint development collaboration between Toppan and IBM," said Michael Cadigan, general manager, IBM Semiconductor Solutions. "Photomasks are critical enabling technology for semiconductor manufacturing, and together our two companies have delivered an advanced mask-manufacturing technology that can help speed the development, volume production and time-to-market of 32nm- and-smaller devices."

"The four years of collaborative work between Toppan and IBM enabled us to achieve this milestone today," said Toshiro Masuda, deputy head of the Electronics Division and managing director of Toppan Printing. "Our collaboration with IBM now continues to the next technological challenge. Toppan will continue to support our semiconductor-manufacturing customers with advanced technologies and ready solutions. We will continue to enhance the semiconductor industry by providing photomasks utilizing this newly developed process."

####

About Toppan Printing Co., Ltd.
Toppan Printing is the world's premier photomask manufacturer. The company supports the global semiconductor industry, from the initial launch of the semiconductor manufacturing process through commercial production, by providing state-of-the-art photomask technology. Toppan is the only global photomask manufacturer providing the highest quality products in a timely manner to customers across Japan, the United States, Europe and Asia.

For more information, please click here

Contacts:
Loomis Group
Jennifer Anselmo
415-882-9494


Jason Isberg
415-882-9494

Copyright © Business Wire 2009

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Leti Develops World’s First Micro-Coolers for CERN Particle Detectors: Leti Design, Fabrication and Packaging Expertise Extends to Very Large Scientific Instruments December 11th, 2017

UCLA chemists synthesize narrow ribbons of graphene using only light and heat: Tiny structures could be next-generation solution for smaller electronic devices December 8th, 2017

Untangling DNA: Researchers filter the entropy out of nanopore measurements December 8th, 2017

Device makes power conversion more efficient: New design could dramatically cut energy waste in electric vehicles, data centers, and the power grid December 8th, 2017

Chip Technology

UCLA chemists synthesize narrow ribbons of graphene using only light and heat: Tiny structures could be next-generation solution for smaller electronic devices December 8th, 2017

Device makes power conversion more efficient: New design could dramatically cut energy waste in electric vehicles, data centers, and the power grid December 8th, 2017

Leti Integrates Hybrid III-V Silicon Lasers on 200mm Wafers with Standard CMOS Process December 6th, 2017

Leti Breakthroughs Point Way to Significant Improvements in SoC Memories December 6th, 2017

Announcements

Leti Develops World’s First Micro-Coolers for CERN Particle Detectors: Leti Design, Fabrication and Packaging Expertise Extends to Very Large Scientific Instruments December 11th, 2017

UCLA chemists synthesize narrow ribbons of graphene using only light and heat: Tiny structures could be next-generation solution for smaller electronic devices December 8th, 2017

Untangling DNA: Researchers filter the entropy out of nanopore measurements December 8th, 2017

Device makes power conversion more efficient: New design could dramatically cut energy waste in electric vehicles, data centers, and the power grid December 8th, 2017

Alliances/Trade associations/Partnerships/Distributorships

JPK Instruments announce partnership with Swiss company, Cytosurge AG. The partnership makes Cytosurge’s FluidFM® technology available on the JPK NanoWizard® AFM platform December 8th, 2017

Nano Global, Arm Collaborate on Artificial Intelligence Chip to Drive Health Revolution by Capturing and Analyzing Molecular Data in Real Time November 21st, 2017

EC Project Aims at Creating and Commercializing Cyber-Physical-System Solutions November 14th, 2017

GLOBALFOUNDRIES, Fudan Team to Deliver Next Generation Dual Interface Smart Card November 14th, 2017

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project