Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

android tablet pc

Home > Press > Toppan Printing Completes 32nm and 28nm Production Photomask Process through Toppan-IBM Joint Development

Toppan Printing Co., Ltd. (Toppan Printing; Head office: Chiyoda-ku, Tokyo; President & CEO: Naoki Adachi) has established a new and improved photomask manufacturing process in April 2009 at its photomask facility in Asaka, Japan, to support 32nm and 28nm semiconductor device production. This photomask process was achieved through Toppan's ongoing joint development project with IBM. The Toppan photomasks produced in Asaka are compatible with those produced at IBM's photomask facility in Essex Junction, Vt., and have been qualified by IBM.

Toppan Printing Completes 32nm and 28nm Production Photomask Process through Toppan-IBM Joint Development

Tokyo, Japan | Posted on April 21st, 2009

Photomasks are an integral component in the patterning and manufacturing of semiconductor devices. Today, the 32nm semiconductor process is in the last phase of development prior to volume production. Advanced devices, such as those used for communications and image processing, are expected to have better performance, lower power consumption and lower cost. To achieve these competing requirements, the technological advances of 32nm production have been combined with the productivity enhancements of the 28nm ground rules.

In order to respond to those requirements, 32nm and 28nm production photomask process has been completed at Toppan's Asaka facility. The introduction of this photomask process from Toppan will help chip manufacturers accelerate the development production of semiconductors in these next-generation technologies. As a leading photomask manufacturer, Toppan will continuously supply high-quality products to customers around the world in a timely manner.

Toppan-IBM Joint Development Project in Advanced Photomasks

Toppan's collaboration with IBM began in 2005 at the 45nm node, and has progressed to the highly specialized masks required to support Source Mask Optimization (SMO) at the 22nm node. SMO is the co-optimization of the illumination source and mask pattern. SMO results in a lithographic solution for building more advanced semiconductor devices than would be possible with conventional lithographic techniques, and is expected to extend immersion lithography through the 22nm node and beyond. Toppan Printing plans to launch volume production of SMO-applied photomasks in 2011, leveraging technical assets accumulated by the collaboration with IBM.

Through the joint development with the industry leader IBM, Toppan Printing, a partner of semiconductor manufacturing customers throughout the world, is committed to providing leading-edge photomasks that match market needs.

"This announcement marks a significant milestone in the successful, multi-year joint development collaboration between Toppan and IBM," said Michael Cadigan, general manager, IBM Semiconductor Solutions. "Photomasks are critical enabling technology for semiconductor manufacturing, and together our two companies have delivered an advanced mask-manufacturing technology that can help speed the development, volume production and time-to-market of 32nm- and-smaller devices."

"The four years of collaborative work between Toppan and IBM enabled us to achieve this milestone today," said Toshiro Masuda, deputy head of the Electronics Division and managing director of Toppan Printing. "Our collaboration with IBM now continues to the next technological challenge. Toppan will continue to support our semiconductor-manufacturing customers with advanced technologies and ready solutions. We will continue to enhance the semiconductor industry by providing photomasks utilizing this newly developed process."


About Toppan Printing Co., Ltd.
Toppan Printing is the world's premier photomask manufacturer. The company supports the global semiconductor industry, from the initial launch of the semiconductor manufacturing process through commercial production, by providing state-of-the-art photomask technology. Toppan is the only global photomask manufacturer providing the highest quality products in a timely manner to customers across Japan, the United States, Europe and Asia.

For more information, please click here

Loomis Group
Jennifer Anselmo

Jason Isberg

Copyright © Business Wire 2009

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Sopping up proteins with thermosponges: Researchers develop novel nanoparticle platform that proves effective in delivering protein-based drugs October 22nd, 2014

Brookhaven Lab Launches Computational Science Initiative:Leveraging computational science expertise and investments across the Laboratory to tackle "big data" challenges October 22nd, 2014

Bipolar Disorder Discovery at the Nano Level: Tiny structures found in brain synapses help scientists better understand disorder October 22nd, 2014

NIST offers electronics industry 2 ways to snoop on self-organizing molecules October 22nd, 2014

Chip Technology

NIST offers electronics industry 2 ways to snoop on self-organizing molecules October 22nd, 2014

Materials for the next generation of electronics and photovoltaics: MacArthur Fellow develops new uses for carbon nanotubes October 21st, 2014

Nitrogen Doped Graphene Characterized by Iranian, Russian, German Scientists October 21st, 2014

Crystallizing the DNA nanotechnology dream: Scientists have designed the first large DNA crystals with precisely prescribed depths and complex 3D features, which could create revolutionary nanodevices October 20th, 2014


NanoTechnology for Defense (NT4D) October 22nd, 2014

Mechanism behind nature's sparkles revealed October 22nd, 2014

TARA Biosystems and Harris & Harris Group Form Company to Improve Safety and Efficacy of New Therapies October 22nd, 2014

Researchers patent a nanofluid that improves heat conductivity October 22nd, 2014


European Commission opens the gate towards the implementation of Nanomedicine Translation Hub October 16th, 2014

IRLYNX and CEA-Leti to Streamline New CMOS-based Infrared Sensing Modules Dedicated to Human-activities Characterization October 15th, 2014

New VDMA Association "Electronics, Micro and Nano Technologies" founded: Inaugural Meeting in Frankfurt/Main, Germany October 15th, 2014

VDMA photonics steering committee with new members stronger than ever October 14th, 2014

The latest news from around the world, FREE

  Premium Products
Only the news you want to read!
 Learn More
University Technology Transfer & Patents
 Learn More
Full-service, expert consulting
 Learn More

Nanotechnology Now Featured Books


The Hunger Project

© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE