Nanotechnology Now

Our NanoNews Digest Sponsors



Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > Press > SEMATECH and Canon ANELVA Partner to Develop Advanced Materials and Processes for Future Non-volatile Memory Devices

Abstract:
Collaboration to drive development of scalable materials for sub 40 nm memory nodes

SEMATECH and Canon ANELVA Partner to Develop Advanced Materials and Processes for Future Non-volatile Memory Devices

Austin, TX and Albany, NY | Posted on April 16th, 2009

SEMATECH, a global consortium of chipmakers, announced today that Canon ANELVA Corporation, a leading manufacturer of semiconductor equipment, has joined its Front End Processes (FEP) Program. The joint partnership will expand on current collaborative efforts to develop suitable materials and process techniques for future non-volatile memory (NVM) applications.

To further advance scaling of next-generation memory materials for sub 40 nm nodes, Canon ANELVA will collaborate with experts from SEMATECH's FEP program on the development of nanoscale, uniform dielectrics and metal films for non-volatile memory applications, using Canon ANELVA's physical vapor deposition (PVD) technology for memory-based applications. These dielectric and electrode materials are expected to improve data retention and the speed of program and erase in both charge trap and floating gate flash memory architectures.

"We are excited to work with the most advanced technologists in developing manufacturable solutions for tunnel oxide, charge trap materials, high-k and metal electrodes for advanced flash and other non-volatile memories," said Naoki Watanabe, General Manager, Engineering Division2, Electronic Devices Engineering Headquarters. "The collaboration combines Canon ANELVA's experience in precision materials, low damage PVD, and related equipment platforms and SEMATECH's strengths in the development of fundamental materials and advanced memory technologies."

Within the NVM semiconductor industry, shrinkage of device dimensions to reduce cost per function presents several critical issues for flash memory scaling, such as tunnel oxide integrity, capacitive coupling between control and floating gate, and cross talk between adjacent devices. SEMATECH and Canon ANELVA's collaboration will focus on developing a new set of materials to address these scaling challenges for flash memory.

"This collaborative effort reinforces SEMATECH's commitment to develop cutting-edge memory technologies utilizing advanced materials for continued performance improvement of semiconductor technologies," said Raj Jammy, vice president of emerging technologies, SEMATECH. "The joint research initiative with Canon ANELVA will aim to develop the various materials components needed for advanced NVM and evaluate the reliability of these materials."

The collaboration will be conducted between the research teams of SEMATECH's FEP device and reliability experts and Canon ANELVA's semiconductor equipment engineers.

SEMATECH's FEP program is aimed at developing new techniques for extending high-k dielectrics, metal gates, high mobility channels, and advanced memory technologies in collaboration with member companies, universities, national labs and supplier partners.

####

About SEMATECH
For 20 years, SEMATECH® (www.sematech.org) has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Today, we continue accelerating the next technology revolution with our nanoelectronics and emerging technology partners.



About Canon ANELVA

Canon ANELVA Corporation (www.canon-anelva.co.jp) was established in 1967 and has developed and sold many kinds of manufacturing equipments for multiple applications such as semiconductor, storage and flat panel displays, and vacuum components, with its unique ultra high vacuum technologies utilizing plasma and thin-film technologies. Canon ANELVA has lead and opened up various de-facto standard products as a pioneer in this field by unique technologies.

For more information, please click here

Contacts:
Erica McGill
SEMATECH | Media Relations
257 Fuller Road | Suite 2200 | Albany, NY | 12203
o: 518-649-1041 | m: 518-487-8256

Copyright © SEMATECH

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Raman Whispering Gallery Detects Nanoparticles September 1st, 2014

A new, tunable device for spintronics: An international team of scientists including physicist Jairo Sinova from the University of Mainz realises a tunable spin-charge converter made of GaAs August 29th, 2014

Nanoscale assembly line August 29th, 2014

New Vice President Takes Helm at CNSE CMOST: Catherine Gilbert To Lead CNSE Children’s Museum of Science and Technology Through Expansion And Relocation August 29th, 2014

Chip Technology

New analytical technology reveals 'nanomechanical' surface traits August 29th, 2014

Fonon Announces 3D Metal Sintering Technology: Emerging Additive Nano Powder Manufacturing Technology August 28th, 2014

RMIT delivers $30m boost to micro and nano-tech August 26th, 2014

Competition for Graphene: Berkeley Lab Researchers Demonstrate Ultrafast Charge Transfer in New Family of 2D Semiconductors August 26th, 2014

Memory Technology

Promising Ferroelectric Materials Suffer From Unexpected Electric Polarizations: Brookhaven Lab scientists find surprising locked charge polarizations that impede performance in next-gen materials that could otherwise revolutionize data-driven devices August 18th, 2014

Can our computers continue to get smaller and more powerful? University of Michigan computer scientist reviews frontier technologies to determine fundamental limits of computer scaling August 13th, 2014

An Inkjet-Printed Field-Effect Transistor for Label-Free Biosensing August 11th, 2014

Rice's silicon oxide memories catch manufacturers' eye: Use of porous silicon oxide reduces forming voltage, improves manufacturability July 10th, 2014

Announcements

Raman Whispering Gallery Detects Nanoparticles September 1st, 2014

Nanoscale assembly line August 29th, 2014

New analytical technology reveals 'nanomechanical' surface traits August 29th, 2014

New Vice President Takes Helm at CNSE CMOST: Catherine Gilbert To Lead CNSE Children’s Museum of Science and Technology Through Expansion And Relocation August 29th, 2014

Alliances/Partnerships/Distributorships

Leading European communications companies and research organizations have launched an EU project developing the future 5th Generation cellular mobile networks August 28th, 2014

JPK expands availability of instrumentation in the USA – appointing new distributors – launched a new web site to support the US market - AFM now available to US users August 26th, 2014

Sunblock poses potential hazard to sea life August 20th, 2014

SouthWest NanoTechnologies Appoints Matteson-Ridolfi for U.S. Distribution of its SMW™ Specialty Multiwall Carbon Nanotubes August 13th, 2014

Research partnerships

Leading European communications companies and research organizations have launched an EU project developing the future 5th Generation cellular mobile networks August 28th, 2014

New technique uses fraction of measurements to efficiently find quantum wave functions August 28th, 2014

The thunder god vine, assisted by nanotechnology, could shake up future cancer treatment: Targeted therapy for hepatocellular carcinoma using nanotechnology August 27th, 2014

Competition for Graphene: Berkeley Lab Researchers Demonstrate Ultrafast Charge Transfer in New Family of 2D Semiconductors August 26th, 2014

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More














ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE