Nanotechnology Now

Our NanoNews Digest Sponsors





Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > Press > New Collaboration in the Nanoimprint Lithography Industry

Abstract:
NIL Technology and IMS Chips have started a collaboration to efficiently combine their capabilities related to electron beam lithography. Whereas NIL Technology possesses key competences within production of stamps for NIL through the operation of a state-of-the-art Gaussian shaped electron beam writer, IMS Chips, a center of competence for beam lithography has developed various patterning technologies for wafers, masks and stamps using a variable shape electron beam writer.

New Collaboration in the Nanoimprint Lithography Industry

Denmark | Posted on January 27th, 2009

The direct access to both Gaussian shaped and variable shaped electron beam lithography (EBL) puts the collaborators in a unique position to combine high speed and high resolution definition of nanostructures. Complex stamps for NIL can be produced with very high quality at competitive prices. The unique combination of these EBL technologies put NIL Technology and IMS Chips in the same league as less than a handful of other companies around the world who also use combined EBL.

Theodor Kamp Nielsen, CEO of NIL Technology and Mathias Irmscher, Head of Nanopatterning Division of IMS Chips, comment, "We see this collaboration as a giant step on our path to fulfil the present and future requirements from many companies working with NIL. They are moving towards more complex designs which require more and more complex NIL stamps and solutions. The combined use of both state-of-the-art EBL technologies enables us to continue supporting our customers with world-class solutions."

####

About NIL Technology
NIL Technology is a nanotechnology company located in Copenghagen, Denmark. NIL Technology is engaged in the fabrication of stamps for nanoimprint lithography (NIL), nanoimprint processing and electron beam lithography. NIL is a disruptive lithography technology listed on the International Technology Roadmap for Semiconductors (ITRS) as a lithography candidate for the 32 nm node and beyond. Our corporate objective is to become the leading supplier of nanoimprint lithography stamps. NIL Technology has unique competencies within nanoimprint lithography, nanoimprint lithography stamp production and electron beam lithography.

About IMS Chips

The Institute for Microelectronics Stuttgart (trade name IMS Chips), a foundation under civil law, provides the infrastructure and the know-how to develop together with industrial partners new electronical, micromechanical and optical components, devices and systems. For this purpose CMOS and mask fabrication processes are available in a 700 m2 clean room. Prototyping or low volume production of the developed components and devices can be done in the certified IMS Chips line. Due to the flexibility regarding substrate materials, substrate sizes and processes, a broad range of technologies has been established and qualified. One key competence of IMS Chips is the fabrication of templates for the Nano Imprint Lithography based on quartz or silicon substrates in different form factors.

For more information, please click here

Contacts:
NIL Technology ApS
Oersteds Plads
DTU – Building 347
DK-2800 Lyngby
Denmark

Contact NIL Technology ApS
Theodor Nielsen, CEO
Direct: +45 3171 9036

www.nilt.com

Contact IMS Chips
Mathias Irmscher, Head Nanopatterning Division
Direct: +49 711 21855 450

www.ims-chips.com

Contact IMS Chips
Marcus Pritschow, Manager Template Manufacturing
Direct: +49 711 21855 420

www.ims-chips.com

Copyright © NIL Technology

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Harris & Harris Group to Host Conference Call on Second-Quarter 2014 Financial Results on August 15, 2014 July 23rd, 2014

UCF Nanotech Spinout Developing Revolutionary Battery Technology: Power the Next Generation of Electronics with Carbon July 23rd, 2014

Deadline Announced for Registration in 7th Int'l Nanotechnology Festival in Iran July 23rd, 2014

A Crystal Wedding in the Nanocosmos July 23rd, 2014

Chip Technology

A Crystal Wedding in the Nanocosmos July 23rd, 2014

Nanometrics Announces Upcoming Investor Events July 22nd, 2014

Penn Study: Understanding Graphene’s Electrical Properties on an Atomic Level July 22nd, 2014

NUS scientists use low cost technique to improve properties and functions of nanomaterials: By 'drawing' micropatterns on nanomaterials using a focused laser beam, scientists could modify properties of nanomaterials for effective applications in photonic and optoelectric applicat July 22nd, 2014

Announcements

Harris & Harris Group to Host Conference Call on Second-Quarter 2014 Financial Results on August 15, 2014 July 23rd, 2014

UCF Nanotech Spinout Developing Revolutionary Battery Technology: Power the Next Generation of Electronics with Carbon July 23rd, 2014

Deadline Announced for Registration in 7th Int'l Nanotechnology Festival in Iran July 23rd, 2014

A Crystal Wedding in the Nanocosmos July 23rd, 2014

Alliances/Partnerships/Distributorships

Organometallics welcomes new editor-in-chief: Paul Chirik, Ph.D. July 22nd, 2014

Haydale and Goodfellow Announce Major Distribution Agreement for Functionalised Graphene Materials July 21st, 2014

SentiMag® Now Available in Australia and New Zealand July 21st, 2014

Martini Tech Inc. becomes the exclusive distributor for Yoshioka Seiko Co. porous chucks for Europe and North America July 20th, 2014

Printing/Lithography/Inkjet/Inks

Martini Tech Inc. becomes the exclusive distributor for Yoshioka Seiko Co. porous chucks for Europe and North America July 20th, 2014

University of Illinois researchers demonstrate novel, tunable nanoantennas July 14th, 2014

Haydale Announces Collaboration Agreement with Swansea University’s Welsh Centre for Printing and Coatings (WCPC) July 12th, 2014

Leti to Present Technological Platforms Targeting Industry’s Needs for the Future at Semicon West Workshop: Presentation at STS Session to Focus on Leti Advanced Lithography Programs for 1x Nodes and on Silicon Photonics at TechXPot June 25th, 2014

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More














ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE