Home > Press > Air Liquide Electronics ramps-up first mass production ruthenium CVD/ALD solution
Air Liquide Electronics is proud to announce a major capacity expansion of TORUS™ manufacturing at its ALOHA TM facility in Fremont, California. This expansion will enable Air Liquide to support the increase in demand for this precursor as it moves into mass production at device manufacturers. First of its class, TORUS ™ provides a high quality and cost- effective solution for deposition of ruthenium-based thin films in high volume manufacturing applications.
Air Liquide Electronics ramps-up first mass production ruthenium CVD/ALD solution
Seoul, Korea and Fremont, CA | Posted on January 22nd, 2009
Ruthenium is a noble metal that has been considered for many years as an electrode material in DRAM capacitors. It has been deemed mandatory to enable further device scaling and integration of the future generations of high-k materials. Ruthenium is also used in Giant Magneto-resistive (GMR) and Tunneling Magneto-resistive (TMR) sensors in advanced hard drives. So far, most attempts to use ruthenium based organo-metallic precursors have been hampered, among other things, by the imperfect surface coverage of ultra thin films, and by the price of conventional ruthenium precursors, thereby making the cost of the metallization step unacceptably high. In this respect, TORUS™ offers a true innovation. It provides an ideal technical solution to ruthenium metallization challenges at the lowest cost of ownership.
TORUS™ is based on a carefully tuned proprietary formulation containing an inorganic ruthenium compound. Its high surface reactivity results in high precursor efficiency which allows for low cost per wafer. This exceptional process performance has been demonstrated by Seoul National University. Its upcoming publication* will illustrate that highly pure Ruthenium films with low resistivity, small grain size, perfect step coverage, and superior thermal stability, can be obtained with TORUS™. ALOHA TM, Air Liquide's product line for ALD and CVD materials, has released several TORUS™ proprietary formulations, customized for different applications and delivery methods.
"I am very pleased to see this product moving into mass production," said Francisco Martins, Air Liquide Group vice president of Electronics. "After the adoption of ZyALD TM, our proprietary ZrO2
high-k precursor, by several leading IDMs and foundries, the ramp up of TORUS TM confirms ALOHA's position as an enabling partner to our customers and to the whole electronics industry. We will continue to be fully committed to leading-edge R&D and the launch of revolutionary materials driven by the evolution of this innovativeindustry."
* Author(s): Han, Jeong Hwan; Lee, Sang Woon; Choi, Gyu Jin; Lee, Sang Young; Hwang, Cheol Seong;
Dussarrat, Christian; Gatineau, Julien. To be published in Chemistry of Materials.
About Air Liquide
With more than 40,000 employees in 75 countries, Air Liquide is a world leader in industrial and medical gases and related services. The Group offers innovative solutions based on constantly enhanced technologies and produces air gases (oxygen, nitrogen, argon, rare gases…) and many other gases including hydrogen. The Group contributes to the manufacturing of many everyday products: bubbles in sparkling beverages, protective atmosphere for packed foods, oxygen for hospitals and homecare patients, ultra-pure gases for the semiconductor industry, hydrogen to desulfurize fuels...
Air Liquide is committed to sustainable development and helps to protect life. Founded in 1902, Air Liquide has successfully developed a long-term relationship with its shareholders built on trust and transparency and guided by the principles of corporate governance. Since the publication of its first consolidated financial statements in 1971, Air Liquide has posted strong and steady earnings growth. Sales in 2007 totaled 11,801 million euros, with sales outside France accounting for almost 80%. Air Liquide is listed on the Paris stock exchange and is a component of the CAC 40 and Eurostoxx 50 indices (ISIN code FR 0000120073).
Air Liquide Electronics
With 3,000 employees and €944 million revenue in 2007, Air Liquide Electronics
has activities in ultra-pure and specialty gases, new molecules, related equipment and customized services. The Electronics division management is based in Tokyo to enhance its proximity to the semiconductor, TFT-LCD and PV markets in Asia.
Air Liquide Electronics U.S. LP is the subsidiary of AmericanAir Liquide Holdings, Inc. responsible for serving the semiconductor industry in the U.S. by
providing ultra pure gases, liquids and advanced molecules used in the
fabrication of silicon chips as well as providing specialized equipment and
related gas and chemical management services. Through its division, Balazs
Analytical Services, Air Liquide Electronics also provides state-of-the-art analytical and laboratory services. American Air Liquide Holdings, Inc. is the subsidiary of Air Liquide Group responsible for its North American operations.
For more information, please click here
Air Liquide Group Electronics
+33 (0)1 40 62 53 42
Air Liquide Electronics U.S. LP
+1 972 995 7552
Air Liquide USALLC
+1 713 624 8023
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