Nanotechnology Now

Our NanoNews Digest Sponsors



Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > Press > SUSS MicroTec launches 300mm Coat/Develop Cluster enhanced for 3D Integration

Frontview ACS300 Gen2 modular coat/bake/develop system from SUSS MicroTec (Photo: Business Wire)
Frontview ACS300 Gen2 modular coat/bake/develop system from SUSS MicroTec (Photo: Business Wire)

Abstract:
At Semicon Korea 2009, SUSS MicroTec (FWB:SMH)(GER:SMH) unveiled the second generation of its ACS300, a modular system for coating, baking and developing of wafers up to 300mm. The ACS300 Gen2 offers unmatched configuration flexibility at market-leading cost of ownership. The system architecture and process modules are specifically adapted to the needs of the advanced packaging and 3D integration industry, which requires very thick photo resist layers of up to 100 microns and more. Combining best in class coat and develop uniformity with exceptional edge bead performance makes the ACS300 Gen2 the preferred solution for various special spin coating applications such photosensitive polymers like polyimide, PBO or Cyclotene™ (BCB).

SUSS MicroTec launches 300mm Coat/Develop Cluster enhanced for 3D Integration

MUNICH, Germany | Posted on January 19th, 2009

The ACS300 Gen2 continues the success of the preceding model, ACS300Plus with developments driving equipment cost down, extending overall equipment efficiency and scaling down of the footprint.

"Addressing the specific requirements for wafer level packaging and 3D integration the new ACS300 is equipped with various packaging specific features, which makes it specifically suited for applications like solder bumping, gold bumping or redistribution layers," said Rolf Wolf, General Manager of SUSS MicroTec Lithography Division. "The next generation ACS300 will definitively help SUSS MicroTec to continue and further expand its market leading position in the field of advanced packaging, and extending it into 3D processing."

####

About SUSS MicroTec
SUSS MicroTec is a leading supplier of process and test solutions for markets such as 3D Integration, Advanced Packaging, MEMS, Nanotechnology and Compound Semiconductor. High-quality solutions enable customers to increase process performance while reducing cost of ownership.

SUSS MicroTec supports more than 8,000 installed mask aligners, coaters, bonders and probe systems with a global infrastructure for applications and service. SUSS MicroTec is headquartered in Garching near Munich, Germany.

All statements in this release other than historical facts are forward-looking statements within the meaning of U.S. Private Securities Litigation Reform Act of 1995. The company accepts no obligation toward the general public to update or correct forward-looking statements. All forward-looking statements are subject to various risks and uncertainties, as a result of which actual events may diverge numerically from expectations. The forward-looking statements reflect the view at the time they were made.

For more information, please click here

Contacts:
SUSS MicroTec
Brigitte Wehrmann
Marketing Communications Manager
SUSS MicroTec Lithography Division
Tel: +49 (0) 89 32007-237

Copyright © Business Wire 2009

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Iranian Experts Clean Uranium-Contaminated Water by Nano-Particles November 23rd, 2014

Novel Method Found for Connection of Metallic Alloys to Polymers November 23rd, 2014

New research project supports internationalisation in nano-research: Launch of new “Baltic Sea Network” November 22nd, 2014

3rd Iran-Proposed Nano Standard Approved by International Standard Organization November 22nd, 2014

Chip Technology

Nanometrics Announces Upcoming Investor Events November 19th, 2014

A novel method for identifying the body’s ‘noisiest’ networks November 19th, 2014

Researchers create & control spin waves, lifting prospects for enhanced info processing November 17th, 2014

VDMA Electronics Production Equipment: Growth track for 2014 and 2015 confirmed: Business climate survey shows robust industry sector November 14th, 2014

Announcements

Iranian Experts Clean Uranium-Contaminated Water by Nano-Particles November 23rd, 2014

Novel Method Found for Connection of Metallic Alloys to Polymers November 23rd, 2014

New research project supports internationalisation in nano-research: Launch of new “Baltic Sea Network” November 22nd, 2014

3rd Iran-Proposed Nano Standard Approved by International Standard Organization November 22nd, 2014

Tools

Iranian Experts Clean Uranium-Contaminated Water by Nano-Particles November 23rd, 2014

Leica Microsystems Presents Universal Hybrid Detector for Single Molecule Detection and Imaging at SfN and ASCB: Leica HyD SMD - the Optimal Detector for Precise and Reliable SMD data November 20th, 2014

Nanometrics Announces Upcoming Investor Events November 19th, 2014

Two sensors in one: Nanoparticles that enable both MRI and fluorescent imaging could monitor cancer, other diseases November 18th, 2014

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More












ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE