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Home > News > Mapper Receives Subsidy From EU's 'Magic' Program

March 1st, 2008

Mapper Receives Subsidy From EU's 'Magic' Program

Abstract:
Mapper Lithography (Delft, Netherlands) said it has received a 3.5M (US$5.3M) subsidy from a new 12M (US$18.1M) European Union program called maskless lithography for IC manufacturing (MAGIC).

Mapper, founded in 2001, is developing a direct write system that uses parallel electron beams to write patterns directly without a mask. According to the company, the machine uses light to direct the electron beams individually and incorporates a MEMS lens arrays to accurately focus the parallel electron beams.

The company said its prototype machine is able to write 32 nm patterns. In the next phase, the company will expand its staff by ~60 people this year from the current 120, focusing on developing a 300 mm wafer-capable system.

Source:
semiconductor.net

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