Nanotechnology Now







Heifer International

Wikipedia Affiliate Button


DHgate

Home > News > Emerging Lithography And Nanotechnology Highlight SPIE Advanced Lithography Program

January 7th, 2008

Emerging Lithography And Nanotechnology Highlight SPIE Advanced Lithography Program

Abstract:
Micro- and nanolithography practitioners will share their up-to-the-minute research results and latest innovations at the SPIE Advanced Lithography conference in San Jose, CA, USA, in February. Topics range from state-of-the-art lithographic tools and technologies, resists, metrology, and materials characterization, to design and process integration, including progress of extending these technologies or switching to emerging alternatives. The event will be held 24-29 February 2008 in the San Jose Convention Center.

SPIE Advanced Lithography provides a rich networking opportunity for the international community and is known as a forum for high-quality technical presentations. More than 700 papers will be presented in five technical conferences. Of high interest are papers on nanoimprint, electron-beam direct write, parallel e-beam systems, extreme-UV systems, directed self assembly, molecular resists, EUV resists, double patterning, and high-index immersion lithography.

Source:
metrologyworld.com

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Entanglement on a chip: Breakthrough promises secure communications and faster computers January 27th, 2015

Nanoshuttle wear and tear: It's the mileage, not the age January 26th, 2015

Detection of Heavy Metals in Samples with Naked Eye January 26th, 2015

Engineering self-assembling amyloid fibers January 26th, 2015

Chip Technology

Entanglement on a chip: Breakthrough promises secure communications and faster computers January 27th, 2015

Electronic circuits with reconfigurable pathways closer to reality January 26th, 2015

The latest fashion: Graphene edges can be tailor-made: Rice University theory shows it should be possible to tune material's properties January 24th, 2015

New method to generate arbitrary optical pulses January 21st, 2015

Announcements

Entanglement on a chip: Breakthrough promises secure communications and faster computers January 27th, 2015

Iranian Researchers Boost Solar Cells Efficiency Using Anti-Aggregates January 26th, 2015

Detection of Heavy Metals in Samples with Naked Eye January 26th, 2015

Engineering self-assembling amyloid fibers January 26th, 2015

Events/Classes

Toyocolor to Launch New Carbon Nanotube Materials at nano tech 2015 January 24th, 2015

NANOPOSTER 2015 - 5th Virtual Nanotechnology Conference - call for abstracts January 24th, 2015

PEN Inc. New Product Development Highlighted for Emerging Nanotechnology Enterprises: Scott Rickert, PEN Chairman, Addresses Webinar for National Nanotechnology Coordination Office January 22nd, 2015

Teijin to Participate in Nano Tech 2015 January 22nd, 2015

Printing/Lithography/Inkjet/Inks

Toyocolor to Launch New Carbon Nanotube Materials at nano tech 2015 January 24th, 2015

Teijin to Participate in Nano Tech 2015 January 22nd, 2015

A new step towards using graphene in electronic applications January 14th, 2015

Nanoshaping method points to future manufacturing technology December 11th, 2014

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More










ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2015 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE