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January 7th, 2008
Micro- and nanolithography practitioners will share their up-to-the-minute research results and latest innovations at the SPIE Advanced Lithography conference in San Jose, CA, USA, in February. Topics range from state-of-the-art lithographic tools and technologies, resists, metrology, and materials characterization, to design and process integration, including progress of extending these technologies or switching to emerging alternatives. The event will be held 24-29 February 2008 in the San Jose Convention Center.
SPIE Advanced Lithography provides a rich networking opportunity for the international community and is known as a forum for high-quality technical presentations. More than 700 papers will be presented in five technical conferences. Of high interest are papers on nanoimprint, electron-beam direct write, parallel e-beam systems, extreme-UV systems, directed self assembly, molecular resists, EUV resists, double patterning, and high-index immersion lithography.
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