Nanotechnology Now

Our NanoNews Digest Sponsors





Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > Press > Metryx and IMEC Enter Joint Development Program for Sub-32nm Metrology

Abstract:
Metryx Limited, a supplier of mass metrology equipment to the semiconductor manufacturing industry, today announced that it has entered into a joint development program with leading research institute IMEC. The program is designed to evaluate and develop mass metrology at both the application and tool level for sub-32nm process manufacturing. The signed collaboration follows the installation at IMEC of Metryx's Mentor SF3 300 mm tool and a Mentor OC23 200mm tool, announced earlier this year.

Metryx and IMEC Enter Joint Development Program for Sub-32nm Metrology

BRISTOL, UK | Posted on January 7th, 2008

"The measurement of mass change at the atomic level, from one process step to another, has gained, and continues to gain, rapid market acceptance for a variety of manufacturing applications in IC fabs around the world," said Dr. Adrian Kiermasz, President and CEO of Metryx Ltd. "As we continue to scale down line widths to the sub-32nm level, observing the mass characteristics and the changes of a wafer's mass becomes even more critical. Collaborating with IMEC provides us with an excellent platform to demonstrate the effectiveness and versatility of the technology across a number of process applications."

Metryx's Mentor metrology tools monitor the mass of any wafer following a process step to quickly determine whether device manufacture process steps are operating consistently using passive data collection (PDC) and normal distribution analysis. The ability to quickly and accurately identify any process drift allows the process to be corrected or stopped immediately, saving scrap and preventing yield loss. The tools can be used to monitor a number of applications including shallow trench isolation, etch, deposition and CMP for both metal and dielectric layers.

"Mass metrology gives us extremely good insight into both process development and process stability," said Serge Vanhaelemeersch, Director of Advanced Materials and Process Steps at IMEC. "At the sub-32nm level, any slight variation in a deposition or etch process can be highlighted immediately and with a great deal of accuracy. With such precision, we know whether we are right or wrong at a very early stage, which could significantly reduce development time and scrap."

The Mentor tool can be used as an inline metrology tool and, because it is non-destructive, can be used directly on device wafers. The tool offers atomic level repeatability, low cost of ownership and high return on investment. The small-footprint Mentor is capable of throughput of up to 60 wafers per hour to enable nanotechnology mass measurement of production wafers, as well as test and blanket wafers, independent of substrate size or material.

####

About Metryx Limited
Metryx is a semiconductor equipment manufacturer specializing in unique nanotechnology mass measurement techniques. Based in Bristol, England, Metryx’ non-destructive 200mm and 300mm metrology tools offer atomic layer accuracy making them ideal for material characterization and device manufacture process control.

For more information, please click here

Contacts:
Metryx, Limited
Adrian Kiermasz
+44 (0)1275 859 988
e:
or
Impress Public Relations
Dave Richardson
+1-415-994-1423 (Press)
e:

Copyright © Business Wire 2008

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Haydale and Goodfellow Announce Major Distribution Agreement for Functionalised Graphene Materials July 21st, 2014

Relaunch of the Nanoscribe Website New design, optimized research, and impressive gallery of applications July 21st, 2014

Dongbu HiTek Unveils Low-Voltage BCDMOS Process for Efficient Power Management in Smart Phones and Tablet Computers July 21st, 2014

Iran to Host 1st Asian Congress on Nanostructures on Kish Island July 21st, 2014

Chip Technology

Dongbu HiTek Unveils Low-Voltage BCDMOS Process for Efficient Power Management in Smart Phones and Tablet Computers July 21st, 2014

Oregon chemists eye improved thin films with metal substitution: Solution-based inorganic process could drive more efficient electronics and solar devices July 21st, 2014

Carbyne morphs when stretched: Rice University calculations show carbon-atom chain would go metal to semiconductor July 21st, 2014

Martini Tech Inc. becomes the exclusive distributor for Yoshioka Seiko Co. porous chucks for Europe and North America July 20th, 2014

Announcements

Oxford Instruments Asylum Research Opens an Atomic Force Microscopy Demonstration Lab in Mumbai, India July 21st, 2014

Steam from the sun: New spongelike structure converts solar energy into steam July 21st, 2014

More than glitter: Scientists explain how gold nanoparticles easily penetrate cells, making them useful for delivering drugs July 21st, 2014

Iran to Host 1st Asian Congress on Nanostructures on Kish Island July 21st, 2014

Alliances/Partnerships/Distributorships

Haydale and Goodfellow Announce Major Distribution Agreement for Functionalised Graphene Materials July 21st, 2014

SentiMag® Now Available in Australia and New Zealand July 21st, 2014

Martini Tech Inc. becomes the exclusive distributor for Yoshioka Seiko Co. porous chucks for Europe and North America July 20th, 2014

National Space Society Calls For Less US Dependence On Russian Space Technology July 15th, 2014

Research partnerships

More than glitter: Scientists explain how gold nanoparticles easily penetrate cells, making them useful for delivering drugs July 21st, 2014

Tiny laser sensor heightens bomb detection sensitivity July 19th, 2014

Labs characterize carbon for batteries: Rice, Lawrence Livermore scientists calculate materials’ potential for use as electrodes July 14th, 2014

Researchers discover boron 'buckyball' July 14th, 2014

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More














ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE