Nanotechnology Now

Our NanoNews Digest Sponsors


Heifer International

Wikipedia Affiliate Button


DHgate

Home > Press > Metryx and IMEC Enter Joint Development Program for Sub-32nm Metrology

Abstract:
Metryx Limited, a supplier of mass metrology equipment to the semiconductor manufacturing industry, today announced that it has entered into a joint development program with leading research institute IMEC. The program is designed to evaluate and develop mass metrology at both the application and tool level for sub-32nm process manufacturing. The signed collaboration follows the installation at IMEC of Metryx's Mentor SF3 300 mm tool and a Mentor OC23 200mm tool, announced earlier this year.

Metryx and IMEC Enter Joint Development Program for Sub-32nm Metrology

BRISTOL, UK | Posted on January 7th, 2008

"The measurement of mass change at the atomic level, from one process step to another, has gained, and continues to gain, rapid market acceptance for a variety of manufacturing applications in IC fabs around the world," said Dr. Adrian Kiermasz, President and CEO of Metryx Ltd. "As we continue to scale down line widths to the sub-32nm level, observing the mass characteristics and the changes of a wafer's mass becomes even more critical. Collaborating with IMEC provides us with an excellent platform to demonstrate the effectiveness and versatility of the technology across a number of process applications."

Metryx's Mentor metrology tools monitor the mass of any wafer following a process step to quickly determine whether device manufacture process steps are operating consistently using passive data collection (PDC) and normal distribution analysis. The ability to quickly and accurately identify any process drift allows the process to be corrected or stopped immediately, saving scrap and preventing yield loss. The tools can be used to monitor a number of applications including shallow trench isolation, etch, deposition and CMP for both metal and dielectric layers.

"Mass metrology gives us extremely good insight into both process development and process stability," said Serge Vanhaelemeersch, Director of Advanced Materials and Process Steps at IMEC. "At the sub-32nm level, any slight variation in a deposition or etch process can be highlighted immediately and with a great deal of accuracy. With such precision, we know whether we are right or wrong at a very early stage, which could significantly reduce development time and scrap."

The Mentor tool can be used as an inline metrology tool and, because it is non-destructive, can be used directly on device wafers. The tool offers atomic level repeatability, low cost of ownership and high return on investment. The small-footprint Mentor is capable of throughput of up to 60 wafers per hour to enable nanotechnology mass measurement of production wafers, as well as test and blanket wafers, independent of substrate size or material.

####

About Metryx Limited
Metryx is a semiconductor equipment manufacturer specializing in unique nanotechnology mass measurement techniques. Based in Bristol, England, Metryx’ non-destructive 200mm and 300mm metrology tools offer atomic layer accuracy making them ideal for material characterization and device manufacture process control.

For more information, please click here

Contacts:
Metryx, Limited
Adrian Kiermasz
+44 (0)1275 859 988
e:
or
Impress Public Relations
Dave Richardson
+1-415-994-1423 (Press)
e:

Copyright © Business Wire 2008

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Simple attraction: Researchers control protein release from nanoparticles without encapsulation: U of T Engineering discovery stands to improve reliability and fabrication process for treatments to conditions such as spinal cord damage and stroke May 28th, 2016

Scientists illuminate a hidden regulator in gene transcription: New super-resolution technique visualizes important role of short-lived enzyme clusters May 27th, 2016

Doubling down on Schrödinger's cat May 27th, 2016

Deep Space Industries and SFL selected to provide satellites for HawkEye 360’s Pathfinder mission: The privately-funded space-based global wireless signal monitoring system will be developed by Deep Space Industries and UTIAS Space Flight Laboratory May 26th, 2016

Chip Technology

Gigantic ultrafast spin currents: Scientists from TU Wien (Vienna) are proposing a new method for creating extremely strong spin currents. They are essential for spintronics, a technology that could replace today's electronics May 25th, 2016

Diamonds closer to becoming ideal semiconductors: Researchers find new method for doping single crystals of diamond May 25th, 2016

Dartmouth team creates new method to control quantum systems May 24th, 2016

Attosecond physics: A switch for light-wave electronics May 24th, 2016

Announcements

Simple attraction: Researchers control protein release from nanoparticles without encapsulation: U of T Engineering discovery stands to improve reliability and fabrication process for treatments to conditions such as spinal cord damage and stroke May 28th, 2016

Scientists illuminate a hidden regulator in gene transcription: New super-resolution technique visualizes important role of short-lived enzyme clusters May 27th, 2016

Doubling down on Schrödinger's cat May 27th, 2016

Deep Space Industries and SFL selected to provide satellites for HawkEye 360’s Pathfinder mission: The privately-funded space-based global wireless signal monitoring system will be developed by Deep Space Industries and UTIAS Space Flight Laboratory May 26th, 2016

Alliances/Trade associations/Partnerships/Distributorships

The CEA Announces Expanded Collaboration with Intel to Advance Cutting-edge Research and Innovation in Key Digital Areas May 17th, 2016

Solliance realizes first up-scaled Perovskite based PV modules with 10% efficiency: Holst Centre, imec and ECN pave the road to upscaling Perovskite PV modules May 10th, 2016

Industrial Nanotech, Inc. Expands Distribution Network in US and Internationally May 9th, 2016

Albertan Science Lab Opens in India May 7th, 2016

Research partnerships

Finding a new formula for concrete: Researchers look to bones and shells as blueprints for stronger, more durable concrete May 26th, 2016

The next generation of carbon monoxide nanosensors May 26th, 2016

Revealing the nature of magnetic interactions in manganese oxide: New technique for probing local magnetic interactions confirms 'superexchange' model that explains how the material gets its long-range magnetic order May 25th, 2016

Light can 'heal' defects in new solar cell materials: Defects in some new electronic materials can be removed by making ions move under illumination May 24th, 2016

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







Car Brands
Buy website traffic