Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > Press > Metryx and IMEC Enter Joint Development Program for Sub-32nm Metrology

Abstract:
Metryx Limited, a supplier of mass metrology equipment to the semiconductor manufacturing industry, today announced that it has entered into a joint development program with leading research institute IMEC. The program is designed to evaluate and develop mass metrology at both the application and tool level for sub-32nm process manufacturing. The signed collaboration follows the installation at IMEC of Metryx's Mentor SF3 300 mm tool and a Mentor OC23 200mm tool, announced earlier this year.

Metryx and IMEC Enter Joint Development Program for Sub-32nm Metrology

BRISTOL, UK | Posted on January 7th, 2008

"The measurement of mass change at the atomic level, from one process step to another, has gained, and continues to gain, rapid market acceptance for a variety of manufacturing applications in IC fabs around the world," said Dr. Adrian Kiermasz, President and CEO of Metryx Ltd. "As we continue to scale down line widths to the sub-32nm level, observing the mass characteristics and the changes of a wafer's mass becomes even more critical. Collaborating with IMEC provides us with an excellent platform to demonstrate the effectiveness and versatility of the technology across a number of process applications."

Metryx's Mentor metrology tools monitor the mass of any wafer following a process step to quickly determine whether device manufacture process steps are operating consistently using passive data collection (PDC) and normal distribution analysis. The ability to quickly and accurately identify any process drift allows the process to be corrected or stopped immediately, saving scrap and preventing yield loss. The tools can be used to monitor a number of applications including shallow trench isolation, etch, deposition and CMP for both metal and dielectric layers.

"Mass metrology gives us extremely good insight into both process development and process stability," said Serge Vanhaelemeersch, Director of Advanced Materials and Process Steps at IMEC. "At the sub-32nm level, any slight variation in a deposition or etch process can be highlighted immediately and with a great deal of accuracy. With such precision, we know whether we are right or wrong at a very early stage, which could significantly reduce development time and scrap."

The Mentor tool can be used as an inline metrology tool and, because it is non-destructive, can be used directly on device wafers. The tool offers atomic level repeatability, low cost of ownership and high return on investment. The small-footprint Mentor is capable of throughput of up to 60 wafers per hour to enable nanotechnology mass measurement of production wafers, as well as test and blanket wafers, independent of substrate size or material.

####

About Metryx Limited
Metryx is a semiconductor equipment manufacturer specializing in unique nanotechnology mass measurement techniques. Based in Bristol, England, Metryx non-destructive 200mm and 300mm metrology tools offer atomic layer accuracy making them ideal for material characterization and device manufacture process control.

For more information, please click here

Contacts:
Metryx, Limited
Adrian Kiermasz
+44 (0)1275 859 988
e:
or
Impress Public Relations
Dave Richardson
+1-415-994-1423 (Press)
e:

Copyright © Business Wire 2008

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Sirrus's Issued Patent Portfolio Continues To Accelerate July 18th, 2018

FEFU scientists reported on toxicity of carbon and silicon nanotubes and carbon nanofibers: Nanoparticles with a wide range of applying, including medicine, damage cells of microalgae Heterosigma akashivo badly. July 18th, 2018

In borophene, boundaries are no barrier: Rice U., Northwestern researchers make and test atom-thick boron's unique domains July 17th, 2018

Tuning into quantum: Scientists unlock signal frequency control of precision atom qubits July 16th, 2018

Chip Technology

Tuning into quantum: Scientists unlock signal frequency control of precision atom qubits July 16th, 2018

Nanometrics to Announce Second Quarter Financial Results on July 31, 2018 July 12th, 2018

Leti and Soitec Launch a New Substrate Innovation Center to Develop Engineered Substrate Solutions: Industry-inclusive hub promotes early collaboration and learning from substrate to system level July 11th, 2018

GLOBALFOUNDRIES Surpasses $2 Billion in Design Win Revenue on 22FDX Technology : With 50 client designs and growing, 22FDX proves its value as a cost-effective solution for power-sensitive applications July 9th, 2018

Announcements

Sirrus's Issued Patent Portfolio Continues To Accelerate July 18th, 2018

FEFU scientists reported on toxicity of carbon and silicon nanotubes and carbon nanofibers: Nanoparticles with a wide range of applying, including medicine, damage cells of microalgae Heterosigma akashivo badly. July 18th, 2018

In borophene, boundaries are no barrier: Rice U., Northwestern researchers make and test atom-thick boron's unique domains July 17th, 2018

Tuning into quantum: Scientists unlock signal frequency control of precision atom qubits July 16th, 2018

Alliances/Trade associations/Partnerships/Distributorships

Leti and Oscaro Partner on Letis New Low-Power, Low-Cost Transceiver to Track Parcels July 12th, 2018

Leti and Soitec Launch a New Substrate Innovation Center to Develop Engineered Substrate Solutions: Industry-inclusive hub promotes early collaboration and learning from substrate to system level July 11th, 2018

Leti & Partners Launch Pilot Program to Assess New Perception Sensors for Autonomous Vehicles July 5th, 2018

Powering the 21st Century with Integrated Photonics: UCSB-Led Team Selected for Demonstration of a Novel Waveguide Platform Which is Transparent Throughout the MWIR and LWIR Spectral Bands June 19th, 2018

Research partnerships

FEFU scientists reported on toxicity of carbon and silicon nanotubes and carbon nanofibers: Nanoparticles with a wide range of applying, including medicine, damage cells of microalgae Heterosigma akashivo badly. July 18th, 2018

In borophene, boundaries are no barrier: Rice U., Northwestern researchers make and test atom-thick boron's unique domains July 17th, 2018

Nano-kirigami: 'Paper-cut' provides model for 3D intelligent nanofabrication July 13th, 2018

Leti and Soitec Launch a New Substrate Innovation Center to Develop Engineered Substrate Solutions: Industry-inclusive hub promotes early collaboration and learning from substrate to system level July 11th, 2018

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project