Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > Press > Metryx and IMEC Enter Joint Development Program for Sub-32nm Metrology

Abstract:
Metryx Limited, a supplier of mass metrology equipment to the semiconductor manufacturing industry, today announced that it has entered into a joint development program with leading research institute IMEC. The program is designed to evaluate and develop mass metrology at both the application and tool level for sub-32nm process manufacturing. The signed collaboration follows the installation at IMEC of Metryx's Mentor SF3 300 mm tool and a Mentor OC23 200mm tool, announced earlier this year.

Metryx and IMEC Enter Joint Development Program for Sub-32nm Metrology

BRISTOL, UK | Posted on January 7th, 2008

"The measurement of mass change at the atomic level, from one process step to another, has gained, and continues to gain, rapid market acceptance for a variety of manufacturing applications in IC fabs around the world," said Dr. Adrian Kiermasz, President and CEO of Metryx Ltd. "As we continue to scale down line widths to the sub-32nm level, observing the mass characteristics and the changes of a wafer's mass becomes even more critical. Collaborating with IMEC provides us with an excellent platform to demonstrate the effectiveness and versatility of the technology across a number of process applications."

Metryx's Mentor metrology tools monitor the mass of any wafer following a process step to quickly determine whether device manufacture process steps are operating consistently using passive data collection (PDC) and normal distribution analysis. The ability to quickly and accurately identify any process drift allows the process to be corrected or stopped immediately, saving scrap and preventing yield loss. The tools can be used to monitor a number of applications including shallow trench isolation, etch, deposition and CMP for both metal and dielectric layers.

"Mass metrology gives us extremely good insight into both process development and process stability," said Serge Vanhaelemeersch, Director of Advanced Materials and Process Steps at IMEC. "At the sub-32nm level, any slight variation in a deposition or etch process can be highlighted immediately and with a great deal of accuracy. With such precision, we know whether we are right or wrong at a very early stage, which could significantly reduce development time and scrap."

The Mentor tool can be used as an inline metrology tool and, because it is non-destructive, can be used directly on device wafers. The tool offers atomic level repeatability, low cost of ownership and high return on investment. The small-footprint Mentor is capable of throughput of up to 60 wafers per hour to enable nanotechnology mass measurement of production wafers, as well as test and blanket wafers, independent of substrate size or material.

####

About Metryx Limited
Metryx is a semiconductor equipment manufacturer specializing in unique nanotechnology mass measurement techniques. Based in Bristol, England, Metryx’ non-destructive 200mm and 300mm metrology tools offer atomic layer accuracy making them ideal for material characterization and device manufacture process control.

For more information, please click here

Contacts:
Metryx, Limited
Adrian Kiermasz
+44 (0)1275 859 988
e:
or
Impress Public Relations
Dave Richardson
+1-415-994-1423 (Press)
e:

Copyright © Business Wire 2008

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Strength of hair inspires new materials for body armor January 18th, 2017

Self-assembling particles brighten future of LED lighting January 18th, 2017

Dressing a metal in various colors: DGIST research developed a technology to coat metal with several nanometers of semiconducting materials January 17th, 2017

Nanoparticle exposure can awaken dormant viruses in the lungs January 17th, 2017

Chip Technology

Dressing a metal in various colors: DGIST research developed a technology to coat metal with several nanometers of semiconducting materials January 17th, 2017

Seeing the quantum future... literally: What if big data could help you see the future and prevent your mobile phone from breaking before it happened? January 16th, 2017

NUS researchers achieve major breakthrough in flexible electronics: New classes of printable electrically conducting polymer materials make better electrodes for plastic electronics and advanced semiconductor devices January 14th, 2017

Nanoscale Modifications can be used to Engineer Electrical Contacts for Nanodevices January 13th, 2017

Announcements

Strength of hair inspires new materials for body armor January 18th, 2017

Self-assembling particles brighten future of LED lighting January 18th, 2017

Dressing a metal in various colors: DGIST research developed a technology to coat metal with several nanometers of semiconducting materials January 17th, 2017

Nanoparticle exposure can awaken dormant viruses in the lungs January 17th, 2017

Alliances/Trade associations/Partnerships/Distributorships

GLOBALFOUNDRIES Expands Partner Program to Speed Time-to-Market of FDX™ Solutions: Increased support affirms FDXcelerator™ Program’s vital role in promoting broader deployment of GLOBALFOUNDRIES’ FDX™ portfolio December 15th, 2016

Infrared instrumentation leader secures exclusive use of Vantablack coating December 5th, 2016

Leti and Grenoble Partners Demonstrate World’s 1st Qubit Device Fabricated in CMOS Process: Paper by Leti, Inac and University of Grenoble Alpes Published in Nature Communications November 28th, 2016

Mechanism for sodium storage in 2-D material: Tin selenide is an effective host for storing sodium ions, making it a promising material for sodium ion batteries October 27th, 2016

Research partnerships

Chemistry on the edge: Experiments at Berkeley Lab confirm that structural defects at the periphery are key in catalyst function January 13th, 2017

Recreating conditions inside stars with compact lasers: Scientists offer a new path to creating the extreme conditions found in stars, using ultra-short laser pulses irradiating nanowires January 12th, 2017

Zeroing in on the true nature of fluids within nanocapillaries: While exploring the behavior of fluids at the nanoscale, a group of researchers at the French National Center for Scientific Research discovered a peculiar state of fluid mixtures contained in microscopic channels January 11th, 2017

New active filaments mimic biology to transport nano-cargo: A new design for a fully biocompatible motility engine transports colloidal particles faster than diffusion with active filaments January 11th, 2017

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project