- About Us
- Nano-Social Network
- Nano Consulting
- My Account
November 29th, 2007
Lithography and nanotechnology to highlight SPIE Advanced Lithography program
Micro- and nanolithography practitioners will share their up-to-the-minute research results and latest innovations at the SPIE Advanced Lithography conference in San Jose, CA, February 24-29. Topics range from state-of-the-art lithographic tools and technologies, resists, metrology, and materials characterization, to design and process integration, and will include extending these technologies versus switching to emerging alternatives.
The SPIE Advanced Lithography event provides a rich networking opportunity for the international community and is known as a forum for technical presentations. More than 700 papers will be presented in five technical conferences. Papers of interest include topics on nanoimprint, electron-beam direct write, parallel e-beam systems, extreme-UV systems, directed self assembly, molecular resists, EUV resists, double patterning, and high-index immersion lithography.
|Related News Press|
National Conference on Nanomaterials, (NCN-2017) April 21st, 2017
Nanomechanics, Inc. Unveils New Product at ICMCTF Show April 25th: Nanoindentation experts will launch the new Gemini that measures the interaction of two objects that are sliding across each other – not merely making contact April 21st, 2017
Forge Nano 2017: 1st Quarter Media Update April 20th, 2017
New stem cell technique shows promise for bone repair January 25th, 2017
NUS researchers achieve major breakthrough in flexible electronics: New classes of printable electrically conducting polymer materials make better electrodes for plastic electronics and advanced semiconductor devices January 14th, 2017