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November 29th, 2007
Micro- and nanolithography practitioners will share their up-to-the-minute research results and latest innovations at the SPIE Advanced Lithography conference in San Jose, CA, February 24-29. Topics range from state-of-the-art lithographic tools and technologies, resists, metrology, and materials characterization, to design and process integration, and will include extending these technologies versus switching to emerging alternatives.
The SPIE Advanced Lithography event provides a rich networking opportunity for the international community and is known as a forum for technical presentations. More than 700 papers will be presented in five technical conferences. Papers of interest include topics on nanoimprint, electron-beam direct write, parallel e-beam systems, extreme-UV systems, directed self assembly, molecular resists, EUV resists, double patterning, and high-index immersion lithography.
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