Nanotechnology Now

Our NanoNews Digest Sponsors



Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > Press > Applied Materials’ UVision 3 Sets Benchmark for Brightfield Inspection Sensitivity and Productivity

Applied Materials' UVision 3 system delivers 40% faster throughput than any brightfield inspection tool and the 20nm sensitivity needed for advanced immersion lithography. (Photo: Business Wire)
Applied Materials' UVision 3 system delivers 40% faster throughput than any brightfield inspection tool and the 20nm sensitivity needed for advanced immersion lithography. (Photo: Business Wire)

Abstract:
Applied Materials, Inc. today unveiled its Applied UVision® 3 system, the industry's highest productivity DUV1 Brightfield wafer inspection tool with the critical-defect detection sensitivity required for 45 nanometer (nm) FEOL2 and immersion lithography. Delivering significant advancements to Applied's breakthrough UVision technology, this next-generation system triples the number of laser beams scanning the wafer to provide 40% faster throughput than any competitive system. Two new imaging modes extend sensitivity to 20nm, and a new flexible automatic defect classification engine enables quick access to defects of interest and faster yield learning.

Applied Materials’ UVision 3 Sets Benchmark for Brightfield Inspection Sensitivity and Productivity

SANTA CLARA, CA | Posted on November 26th, 2007

"The UVision 3 system's multi-beam DUV laser architecture allows extendibility beyond the resolution limits of traditional optical inspection," said Dr. Gilad Almogy, vice president and general manager of Applied Materials' Process Diagnostics and Control group. "With this enhanced system, leading-edge memory and immersion lithography manufacturers can run volume production at engineering tool sensitivity with a shorter cycle time to generate meaningful data. We have shipped multiple UVision 3 systems to leading customers where they have validated its exceptional sensitivity at groundbreaking DUV Brightfield throughputs."

By coupling unique laser DUV architecture with a sensitive photo-multiplier tube (PMT) and variable polarization, the UVision 3 system also meets the challenges of 32nm memory development. New Brightfield imaging modes, both in the illumination and collection path, address the contrast versatility required for immersion lithography. In addition, the system's innovative algorithms of high defect accuracy and stitch-to-stitch detection enable enhanced sensitivity on periphery areas, a key advantage not addressed by any other Brightfield system.

UVision 3 is an integral part of Applied Material's advanced lithography-enabling technologies for 45nm and below double patterning and advanced FEOL applications. For more information on the Applied UVision system, visit http://appliedmaterials.com/products/uvision_4.html .

1 DUV=deep ultraviolet

2 FEOL=front end of line

####

About Applied Materials, Inc.
Applied Materials, Inc. (Nasdaq:AMAT) is the global leader in Nanomanufacturing Technology™ solutions with a broad portfolio of innovative equipment, service and software products for the fabrication of semiconductor chips, flat panel displays, solar photovoltaic cells, flexible electronics and energy efficient glass. At Applied Materials, we apply Nanomanufacturing Technology to improve the way people live.

For more information, please click here

Contacts:
Applied Materials, Inc.
Betty Newboe
408-563-0647
(editorial/media)

Randy Bane
408-986-7977
(financial community)

Copyright © Business Wire 2007

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Chip Technology

Nanometrics Announces Upcoming Investor Events November 19th, 2014

A novel method for identifying the body’s ‘noisiest’ networks November 19th, 2014

Researchers create & control spin waves, lifting prospects for enhanced info processing November 17th, 2014

VDMA Electronics Production Equipment: Growth track for 2014 and 2015 confirmed: Business climate survey shows robust industry sector November 14th, 2014

Announcements

Renishaw receives Queen's Award for spectroscopy developments November 25th, 2014

JPK reports on the use of AFM and the CellHesion module to study plant cells at the University of Queensland November 25th, 2014

Vegetable oil ingredient key to destroying gastric disease bacteria: In mice, therapeutic nanoparticles dampen H. pylori bacteria and inflammation that lead to ulcers and gastric cancer November 25th, 2014

Research yields material made of single-atom layers that snap together like Legos November 25th, 2014

Tools

Renishaw receives Queen's Award for spectroscopy developments November 25th, 2014

JPK reports on the use of AFM and the CellHesion module to study plant cells at the University of Queensland November 25th, 2014

A*STAR SIMTech wins international award for breaking new ground in actuators: SIMTech invention can be used in an array of industries, and is critical for next generation ultra-precision systems November 24th, 2014

Professional AFM Images with a Three Step Click SmartScan by Park Systems Revolutionizes Atomic Force Microscopy by Automatizing the Imaging Process November 24th, 2014

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More












ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE