Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > News > Toshiba Validates Imprint Lithography for <32 nm

October 16th, 2007

Toshiba Validates Imprint Lithography for <32 nm

Molecular Imprints Inc. (MII, Austin, Texas) today announced that Toshiba Semiconductor Co. (Tokyo) has validated the use of MII's imprint lithography technology for 22 nm node CMOS devices.

Using MII's Imprio 250 system, the memory manufacturer was able to print 18 nm isolated features and 24 nm dense features with <1 nm critical dimension uniformity (CDU) and <2 nm line edge roughness (LER). The Toshiba demonstrations also showed improved defectivity and overlay results for imprint lithography. Defectivity levels of as low as <0.3 defects per cm2 are approaching those of immersion lithography, and device overlay results were also within Toshiba's required specifications. "It's a very clear demonstration that we've got lithographic capability for 32 nm and below," said Mark Melliar-Smith, MII's CEO.


Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Chip Technology

Novel 'converter' heralds breakthrough in ultra-fast data processing at nanoscale: Invention bagged four patents and could potentially make microprocessor chips work 1,000 times faster October 20th, 2017

MIPT scientists revisit optical constants of ultrathin gold films October 20th, 2017

Bringing the atomic world into full color: Researchers turn atomic force microscope measurements into color images October 19th, 2017

Spin current detection in quantum materials unlocks potential for alternative electronics October 15th, 2017


A step closer to understanding quantum mechanics: Swansea Universityís physicists develop a new quantum simulation protocol October 22nd, 2017

Creation of coherent states in molecules by incoherent electrons October 21st, 2017

Strange but true: turning a material upside down can sometimes make it softer October 20th, 2017

Leti Coordinating Project to Develop Innovative Drivetrains for 3rd-generation Electric Vehicles: CEA Techís Contribution Includes Litenís Knowhow in Magnetic Materials and Simulation And Letiís Expertise in Wide-bandgap Semiconductors October 20th, 2017


Creation of coherent states in molecules by incoherent electrons October 21st, 2017

Graphene based terahertz absorbers: Printable graphene inks enable ultrafast lasers in the terahertz range September 13th, 2017

Researchers printed graphene-like materials with inkjet August 17th, 2017

Simultaneous Design and Nanomanufacturing Speeds Up Fabrication: Method enhances broadband light absorption in solar cells August 5th, 2017

The latest news from around the world, FREE

  Premium Products
Only the news you want to read!
 Learn More
University Technology Transfer & Patents
 Learn More
Full-service, expert consulting
 Learn More

Nanotechnology Now Featured Books


The Hunger Project