Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > News > Toshiba Validates Imprint Lithography for <32 nm

October 16th, 2007

Toshiba Validates Imprint Lithography for <32 nm

Molecular Imprints Inc. (MII, Austin, Texas) today announced that Toshiba Semiconductor Co. (Tokyo) has validated the use of MII's imprint lithography technology for 22 nm node CMOS devices.

Using MII's Imprio 250 system, the memory manufacturer was able to print 18 nm isolated features and 24 nm dense features with <1 nm critical dimension uniformity (CDU) and <2 nm line edge roughness (LER). The Toshiba demonstrations also showed improved defectivity and overlay results for imprint lithography. Defectivity levels of as low as <0.3 defects per cm2 are approaching those of immersion lithography, and device overlay results were also within Toshiba's required specifications. "It's a very clear demonstration that we've got lithographic capability for 32 nm and below," said Mark Melliar-Smith, MII's CEO.


Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Chip Technology

Error-free into the quantum computer age December 15th, 2017

Columbia engineers create artificial graphene in a nanofabricated semiconductor structure: Researchers are the first to observe the electronic structure of graphene in an engineered semiconductor; finding could lead to progress in advanced optoelectronics and data processing December 13th, 2017

UCLA chemists synthesize narrow ribbons of graphene using only light and heat: Tiny structures could be next-generation solution for smaller electronic devices December 8th, 2017

Device makes power conversion more efficient: New design could dramatically cut energy waste in electric vehicles, data centers, and the power grid December 8th, 2017


CubeSat Structures Competition Opens Space Design to Students of the World December 16th, 2017

Record high photoconductivity for new metal-organic framework material December 15th, 2017

Error-free into the quantum computer age December 15th, 2017

Leti Will Demonstrate First 3D Anti-Crash Solution for Embedding in Drones: Fitted on a Mass-Market Microcontroller, 360Fusion Software Technology Detects any Dynamic Obstacle and Helps Guide Drones Away from Collisions December 15th, 2017


Printing Flexible Graphene Supercapacitors December 1st, 2017

Math gets real in strong, lightweight structures: Rice University researchers use 3-D printers to turn century-old theory into complex schwarzites November 16th, 2017

Creation of coherent states in molecules by incoherent electrons October 21st, 2017

Graphene based terahertz absorbers: Printable graphene inks enable ultrafast lasers in the terahertz range September 13th, 2017

The latest news from around the world, FREE

  Premium Products
Only the news you want to read!
 Learn More
University Technology Transfer & Patents
 Learn More
Full-service, expert consulting
 Learn More

Nanotechnology Now Featured Books


The Hunger Project