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Home > News > Growth of plasmonic gold nanostructures by electron beam induced deposition

September 23rd, 2007

Growth of plasmonic gold nanostructures by electron beam induced deposition

Metallic nanostructures are recently attracting increasing interest for their plasmonic properties, offering a great potential for sensing, spectroscopic, or nano-optical applications. In order to tap into the full potential of plasmonic nanostructures, however, techniques that allow for accurate control of their (3D) shape and position need to be developed.

In the work recently published by Graells et al. ("Growth of plasmonic gold nanostructures by electron beam induced deposition"), the ICFO team achieves high aspect-ratio gold structures that exhibit plasmonic properties. The technique they propose opens new perspectives in the fabrication of substantial height-base aspect ratio plasmonic nanostructures impossible to fabricate otherwise with conventional e-beam lithography. It may become particularly relevant for non-flat substrates and overcomes the main limitations of other nanostructuring techniques like lift-off.


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