Home > News > Growth of plasmonic gold nanostructures by electron beam induced deposition
September 23rd, 2007
Growth of plasmonic gold nanostructures by electron beam induced deposition
Metallic nanostructures are recently attracting increasing interest for their plasmonic properties, offering a great potential for sensing, spectroscopic, or nano-optical applications. In order to tap into the full potential of plasmonic nanostructures, however, techniques that allow for accurate control of their (3D) shape and position need to be developed.
In the work recently published by Graells et al. ("Growth of plasmonic gold nanostructures by electron beam induced deposition"), the ICFO team achieves high aspect-ratio gold structures that exhibit plasmonic properties. The technique they propose opens new perspectives in the fabrication of substantial height-base aspect ratio plasmonic nanostructures impossible to fabricate otherwise with conventional e-beam lithography. It may become particularly relevant for non-flat substrates and overcomes the main limitations of other nanostructuring techniques like lift-off.
Scientists reveal breakthrough in optical fiber communications December 21st, 2014
Atom-thick CCD could capture images: Rice University scientists develop two-dimensional, light-sensitive material December 20th, 2014
Nanoshaping method points to future manufacturing technology December 11th, 2014
Stacking two-dimensional materials may lower cost of semiconductor devices December 11th, 2014