Nanotechnology Now

Our NanoNews Digest Sponsors





Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > Press > Toppan Photomasks and CEA-Leti Announce Collaboration to Study Double Patterning

Abstract:
Toppan Photomasks, Inc. and CEA-Leti, a leading global technology research and development organization, announced today they have signed a joint development agreement to explore double patterning techniques for extending 193nm lithography to next-generation semiconductors.

Toppan Photomasks and CEA-Leti Announce Collaboration to Study Double Patterning

ROUND ROCK, TX and GRENOBLE, France | Posted on September 18th, 2007

Added to the ITRS in 2006, double patterning is a resolution enhancement technique (RET) that effectively doubles the pitch, the most difficult resolution limit of any lithography. It is viewed as a leading technology option for extending 193nm immersion lithography to the 32nm node without requiring the industry to invest in costly new tools. The technique also is viewed as a bridge to EUV technology, which is not expected to be available for volume production until approximately 2013.

CEA-Leti has formed a consortium to address the challenges to making double patterning available to chip makers, and Toppan's participation in the consortium reflects its commitment to helping its partners achieve their internal technology goals and to supporting the ITRS.

"Understanding the challenges of double patterning such as CD and placement control and the additional requirements this technology places on mask manufacturing is key to successfully implementing a double patterning strategy for our customers," said Franklin Kalk, executive vice president and chief technology officer of Toppan Photomasks. "Our partnership with CEA-Leti combines our OPC models, OPC application to patterns and advanced mask manufacturing with a leading-edge research institute's proven expertise to assure that photomask technology for double patterning is available when our customers are ready for it."

"This partnership with Toppan is a critical part of our consortium's efforts to develop all aspects of double patterning and it underscores our commitment to work with leading global technology companies to provide chipmakers with superior advanced lithography technology," said Olivier Demolliens, head of the Nanotec Division at CEA-Leti.

The Toppan-CEA Leti partnership, one of several double-patterning development projects that Toppan is participating in, will leverage the industry-leading capabilities of Toppan's global network of manufacturing and research facilities. The photomask fabrication and analysis will be done at Toppan's facility in Dresden, Germany.

####

About Toppan Photomasks, Inc.
Toppan Photomasks, Inc. is a wholly owned subsidiary of Toppan Printing Co., Ltd. a diversified global company with revenue in excess of $13 billion in fiscal 2007. Toppan Photomasks is part of the Toppan Group of photomask companies. As the world’s premier photomask provider, the Toppan Group operates the industry’s most advanced and largest network of manufacturing facilities and offers a comprehensive range of photomask technologies and research and development capabilities to meet the increasingly sophisticated and divergent product-and service requirements of the global semiconductor industry. Toppan Photomasks is headquartered in Round Rock, Texas.

About Toppan Printing

Founded in 1900, Toppan Printing has branched into seven diverse business fields, including security cards, commercial printing, publications printing, packaging, industrial materials, electronics and optronics. In the fiscal year ended March 31, 2007, Toppan posted revenues of ¥1,557,8 billion (more than US$13 billion), and ended the year with approximately 36,000 employees. For more information visit http://www.toppan.co.jp .

About CEA-Leti

Located in Grenoble, CEA-Leti (Electronics and Information Technology Laboratory of the French Atomic Energy Commission) is at the leading edge of European research in microelectronics, microtechnology and nanotechnology. It employs nearly 1,000 people and files approximately 200 patents per year. With 28 start-ups created or in the course of creation, it is one of the most important partners of the industrial world. Instigator of the MINATEC® pole of innovation, CEA-Leti is also one of its principal partners, besides the INP Grenoble (Grenoble Institute of Technology) and local authorities. The CEA (French Atomic Energy Commission), a public organization for technological research, carries out its missions in the domains of energy, information and health technologies and defense, building on the foundations of fundamental research at the highest level. Strengthened by the competence of its 15,000 researchers and collaborators, it is recognized internationally and constitutes a strong source of original ideas for public authorities, institutions and industries in France and in Europe. For more information visit http://www-leti.cea.fr .

For more information, please click here

Contacts:
Toppan Photomasks, Inc., Round Rock
Tom Blake
512-310-6562

or
CEA
Véronique Charreyron
+33 (0) 4 38 78 91 96

Copyright © Business Wire 2007

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Chip Technology

Harris & Harris Group Notes the Receipt of Proceeds From the Sale of Molecular Imprints' Semiconductor Business to Canon April 22nd, 2014

Progress made in developing nanoscale electronics: New research directs charges through single molecules April 21st, 2014

'Exotic' material is like a switch when super thin April 18th, 2014

Scientists open door to better solar cells, superconductors and hard-drives: Research enhances understanding of materials interfaces April 14th, 2014

Announcements

Berkeley Lab Researchers Demonstrate First Size-based Chromatography Technique for the Study of Living Cells April 22nd, 2014

PETA science consortium to present hazard testing strategy at nanotoxicology meeting: High tech field ripe for use of sophisticated non-animal testing strategies April 22nd, 2014

Harris & Harris Group Notes the Receipt of Proceeds From the Sale of Molecular Imprints' Semiconductor Business to Canon April 22nd, 2014

National Space Society Congratulates SpaceX on the Success of CRS-3 and the First Flight of the Falcon 9R April 22nd, 2014

Alliances/Partnerships/Distributorships

Global leader in solar cell manufacturing eyes New York for major expansion outside of Japan: CNSE and Solar Frontier Explore $700 Million Investment, Job Creation in New York State April 22nd, 2014

ASM International Repositions Brand and Introduces New Logo; Looks to Future of Materials Science Innovation: New logo celebrates organization’s history and provides fresh elements for future growth April 21st, 2014

Virus structure inspires novel understanding of onion-like carbon nanoparticles April 10th, 2014

Peer Reviewed and Approved for Science by the the Washington Academy of Sciences April 3rd, 2014

Research partnerships

University of Waterloo Visits China to Strengthen Bonds With Research Partners April 21st, 2014

Novel stapled peptide nanoparticle combination prevents RSV infection, study finds April 17th, 2014

Scientists Capture Ultrafast Snapshots of Light-Driven Superconductivity: X-rays reveal how rapidly vanishing 'charge stripes' may be behind laser-induced high-temperature superconductivity April 16th, 2014

Scalable CVD process for making 2-D molybdenum diselenide: Rice, NTU scientists unveil CVD production for coveted 2-D semiconductor April 8th, 2014

NanoNews-Digest
The latest news from around the world, FREE







  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More














ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE