Home > Press > SEMATECH to Describe Supplier Alliances, Technical Challenges at SEMICON West
SEMATECH's new and continuing alliances with semiconductor equipment and materials suppliers will highlight the consortium's set of expert talks on key industry challenges and opportunities during SEMICON West next month.
SEMATECH to Describe Supplier Alliances, Technical Challenges at SEMICON West
SAN FRANCISCO , CA | Posted on July 10th, 2007
The lineup includes an appearance by Raj Jammy, SEMATECH's Front End Processes director, as an expert panelist at DuPont's seminar, "Technology Partnerships and Tools for the Future." Jammy will join with four other technologists in addressing key issues for the IC value chain, in an event beginning at 3 p.m. Wednesday, July 18 in Moscone Center's South Hall, Rooms 236-238.
SEMATECH has long recognized the importance of effective collaboration with industry suppliers, whose equipment and materials are fundamental to chip manufacturing. From providing access to the advanced equipment line within ATDF and opening interactive test centers for new technologies, to launching new engagement platforms for supplier-oriented R&D and creating targeted membership options, SEMATECH strives to build a global community of experts devoted to solving our industry's most critical challenges.
Additionally, Jammy will appear on the Device Scaling TechXPOT Stage with four other ranking technologists representing SEMATECH and its subsidiaries, ATDF and International SEMATECH Manufacturing Initiative (ISMI). Their talks—covering front-end scaling, a new product for enhancing fab productivity, extreme ultraviolet lithography, e°©manufacturing, and nanoscale metrology—are detailed below.
"Process Advancements for continued CMOS Device Scaling in Front-end,"
Raj Jammy, director of Front End Processes (FEP), SEMATECH
10:30 a.m. Tuesday, July 17
Jammy will address trends in CMOS scaling and the impact of key process elements on performance — including increasing reliance on new materials and architectures, the development of non-planar alternatives, and the need to reduce operating voltages — and how these trends can be addressed through heterogeneous integration and system level improvements.
"ATDF Delivers 45nm NanopatternTM Test Wafer"
12:10 p.m. July 17
David Baker, new products manager, ATDF
Baker will accept SEMI's Technology Innovation Award for the novel NanopatternTM wafer, a testing device which enables resistance testing of polysilicon-on-oxide features that simulate 45 nm gate structures for cleans, deposition and metrology test applications. Baker also will detail the product's advantages, performance, and value proposition for customers.
"FEP Metrology: Nano and Sub-Nanoscale Challenges and Achievements"
Pat Lysaght, FEP Senior Member Technical Staff, SEMATECH
12:30 p.m. July 17
Lysaght will discuss how SEMATECH and national laboratories are collaborating to address the urgent need for high spatial resolution physical characterization in order to develop accurate mechanistic models that represent measured electrical performance. This effort positions SEMATECH for future participation in the emerging Nano Science Centers beginning operation in 2007 and 2008 at the five national labs in the U.S.
"e-Manufacturing: Enabling High Volume Manufacturing
for Future Technology Nodes"
Steve Fulton, manager of Equipment Integration and Automation, ISMI
11:10 a.m. July 18
Fulton will describe how the introduction of new and emerging materials and processes required by continued device scaling add complexity and pose significant challenges to remain competitive in high volume manufacturing. e-Manufacturing enables the use of emerging information technologies and factory systems to provide automated, data driven, decisions and productivity optimization.
"EUVL - What is Needed for Manufacturability"
Michael Lercel, director of Lithography, SEMATECH
4:20 p.m. July 18
Asserting that the feasibility of extreme ultraviolet lithography (EUVL) has been successfully demonstrated, Lercel will describe the challenges of bringing the next-generation technology to manufacturability. His talk will include assessments of source power, mask blank defects, optics lifetime, cost of ownership, and other attributes of EUV, which appears to be emerging as the most cost-effective replacement for optical lithography.
For 20 years, SEMATECH® ( http://www.sematech.org ) has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Today, we continue accelerating the next technology revolution with our nanoelectronics and emerging technology partners.
For more information, please click here
If you have a comment, please Contact
Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.
'Exotic' material is like a switch when super thin April 18th, 2014
Scientists open door to better solar cells, superconductors and hard-drives: Research enhances understanding of materials interfaces April 14th, 2014
Obducat has launched a new generation of SINDRE® Nano Imprint production system April 11th, 2014
Scientists in Singapore develop novel ultra-fast electrical circuits using light-generated tunneling currents April 10th, 2014
'Exotic' material is like a switch when super thin April 18th, 2014
Innovative strategy to facilitate organ repair April 18th, 2014
Oxford Instruments Asylum Research Introduces the MFP-3D InfinityTM AFM Featuring Powerful New Capabilities and Stunning High Performance April 18th, 2014
Transparent Conductive Films and Sensors Are Hot Segments in Printed Electronics: Start-ups in these fields show above-average momentum, while companies working on emissive displays such as OLED are fading, Lux Research says April 17th, 2014
INSCX™ exchange to present Exchange trade reporting mechanism for engineered nanomaterials (NMs) to UK regulation agencies, insurers and upstream/downstream users April 17th, 2014
'Life Redesigned: The Emergence of Synthetic Biology' Lecture at Brookhaven Lab on Wednesday, April 30: Biomedical Engineer James Collins to Speak for BSA Distinguished Lecture Series April 16th, 2014
ECHA Planning Workshop on Regulatory Challenges in the Risk Assessment of Nanomaterials April 16th, 2014
Engineers develop new materials for hydrogen storage April 15th, 2014
Virus structure inspires novel understanding of onion-like carbon nanoparticles April 10th, 2014
Peer Reviewed and Approved for Science by the the Washington Academy of Sciences April 3rd, 2014
New JEOL-Nikon MiXcroscopy Correlative Imaging Solution March 27th, 2014
Quantum Dots Take Center Stage at Inaugural Event: QD Vision Co-Founder and CTO Dr. Seth Coe-Sullivan to Chair First Quantum Dots Forum, March 26, 2014, San Diego, CA March 25th, 2014