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Home > News > IBM sees immersion at 22nm, pushes out EUV

February 24th, 2007

IBM sees immersion at 22nm, pushes out EUV

Abstract:
IBM Corp. Friday (Feb. 23) outlined its lithography roadmap, saying that it would extend 193-nm immersion lithography down to the 22-nm node for logic production. In other words, extreme ultraviolet (EUV) lithography could get pushed out again, as the technology is not expected to be ready for the early development work at the 22-nm node for logic, according to IBM's lithography guru.

Source:
eetimes.com

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