Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > Press > Molecular Imprints Announces the Imprio 1100 Precision Imprint Lithography System

Abstract:
Molecular Imprints, Inc. (MII), the leader in nano-imprint lithography, unveiled the latest addition to its Imprio line of imprint lithography tools today at the Strategies in Light trade conference. The Imprio 1100 Precision Imprint Lithography System is a high throughput, whole wafer imprinter designed to enable next generation devices in a broad array of applications, including Light Emitting Diodes (LEDs), high density disk substrates for Hard Disk Drives (HDD), and optical components requiring fine resolution patterning and three dimensional features. MII has sold and installed two of its new Imprio 1100 systems and expects several additional sales and system placements in 2007.

Molecular Imprints Announces the Imprio 1100 Precision Imprint Lithography System

Austin, TX | Posted on February 13th, 2007

The high-brightness LED market, one of several market applications for MII's new Imprio 1100, is predicted to double over the next 5 years driven by continued advances in the creation, extraction and collection of light. Many of the most promising new technologies, for example, quantum dots for light generation, substrate patterning for light extraction and photonic crystals for light collection, require the ability to pattern nanometer-scale features. The Imprio 1100 delivers cost effective patterning of sub-50nm features on the fragile, non-flat substrates commonly encountered in the compound semiconductor industry. The same high resolution processes can also be used to pattern larger features like laser diode ridges and diffractive optical elements with unprecedented pattern fidelity and CD control.

The Imprio 1100 Precision Imprint Lithography System represents the next generation in fully automated nanoimprint lithography combining the resolution and CD control of e-beam lithography with the throughput, overlay and operating simplicity of a mask aligner. The system can be configured to accept the most commonly used substrate types and is ideal for advanced development, pilot production or full production depending on the options selected. MII's proven, step and flash imprint lithography (S-FILTM) processes, template fabrication support, template replication capability, and application expertise combine to produce a cost effective imprint lithography solution with best in class cost of ownership.

"MII has made tremendous progress over the last 18 months adapting the S-FIL process, originally developed for step and repeat imprint lithography on CMOS wafers, to the specific needs of the compound semiconductor industry. MII can now provide turnkey lithographic processes capable of high throughput and long process life on the fragile, non-flat surfaces of compound semiconductor wafers." said Mark Melliar-Smith, CEO of Molecular Imprints. "In addition, the I-1100's conformal S-FIL technology is providing an enabling technology for similar high resolution applications like the patterning of discrete track and bit patterned media for hard disk drive development and precision grating structures for optical components."

####

About Molecular Imprints
Molecular Imprints, Inc. (MII) develops and manufactures nano-imprint lithography systems for high resolution and 3-dimensional pattern replication. The company has commercialized a proprietary step-and-flash imprint lithography (S-FIL) technology, which is a room temperature, low pressure, drop-on-demand imprint process that has demonstrated sub-20 nanometer resolution. Molecular Imprints provides lithography systems using S-FIL technology that enable leading edge manufacturing of nanotechnology, solid state lighting, semiconductors, micro optical components, and magnetic data storage devices. For more information, visit http://www.molecularimprints.com .

For more information, please click here

Contacts:
Headquarters
Physical address: 1807 West Braker Lane, Building C-100, Austin TX 78758-3605
Mailing address: PO Box 81485, Austin TX 78708-1485
Email link: Info
Tel: 1-512-339-7760
Fax: 1-512-339-3799

Copyright © Molecular Imprints, Inc.

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Chip Technology

U.S. Air Force Research Lab Taps IBM to Build Brain-Inspired AI Supercomputing System: Equal to 64 million neurons, new neurosynaptic supercomputing system will power complex AI tasks at unprecedented speed and energy efficiency June 23rd, 2017

Alloying materials of different structures offers new tool for controlling properties June 19th, 2017

GLOBALFOUNDRIES®, ON Semiconductor Deliver the Industry’s Lowest Power Bluetooth® Low Energy SoC Family: 55nm LPx RF-enabled platform, with SST’s highly reliable embedded SuperFlash®, provides low power and cost for IoT and “Connected” Health and Wellness Devices June 19th, 2017

New prospects for universal memory -- high speed of RAM and the capacity of flash: Thin films created at MIPT could be the basis for future development of ReRAM June 17th, 2017

Announcements

U.S. Air Force Research Lab Taps IBM to Build Brain-Inspired AI Supercomputing System: Equal to 64 million neurons, new neurosynaptic supercomputing system will power complex AI tasks at unprecedented speed and energy efficiency June 23rd, 2017

Rice U. chemists create 3-D printed graphene foam June 22nd, 2017

Tiny bubbles provide tremendous propulsion in new microparticles research-Ben-Gurion U. June 21st, 2017

Enhanced photocatalytic activity by Cu2O nanoparticles integrated H2Ti3O7 nanotubes June 21st, 2017

Tools

Researchers developed nanoparticle based contrast agent for dual modal imaging of cancer June 21st, 2017

Oxford Instruments congratulates Lancaster University for inaugurating the IsoLab, built for studying quantum systems June 20th, 2017

Changing the color of laser light on the femtosecond time scale: How BiCoO3 achieves second harmonic generation June 14th, 2017

Leti Announces Two New Tools for Improving Transportation Comfort, Safety and Efficiency: Wearable Device Measures Stress Responses for Travelers, Pilots and Truck Drivers, While Smartphone App Provides Transit Agencies Broad Data on Transport Modes June 13th, 2017

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project